The invention discloses an optical /
crystal comprehensive film thickness monitoring method for accurately controlling a
film coating device to prepare a high-performance
optical thin film. The method comprises the following steps: inputting
film coating parameters to a computer before
film coating; providing a film
coating monitoring table of a coated film
system according to the input film
coating parameters by the computer, wherein the film
coating parameters include monitoring
wavelength of the corresponding layer film, the theory extreme value or
crystal control coefficient; and coating the film. The optical /
crystal comprehensive film thickness monitoring method provided by the invention integrates advantages of a photoelectricity extreme method and a
quartz crystal oscillation method, and can overcome the defects that a tool factor of a
quartz crystal oscillator is easily influenced by film layer deposition parameters when the photoelectricity extreme method and the
quartz crystal oscillation method are used individually, and the error is great when a non-structured membrane
system is monitored by the photoelectricity extreme method. The method can be used for monitoring a structured membrane
system and the non-structured membrane system, lowers the film thickness monitoring error effectively, improves the spectrum performance of the film, and has favorable
repeatability.