Optical/crystal comprehensive film thickness monitoring method
A technology of crystal control and film thickness, which is applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problem of large error and reduce the effect of influence
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[0036] The present invention will be further described in conjunction with embodiment and accompanying drawing below.
[0037] see first figure 2 , figure 2 It is a schematic structural diagram of the coating device of the film thickness monitoring method for improving optical performance of the present invention. As can be seen from the figure, the coating device used in the present invention comprises a light control-crystal control comprehensive film thickness monitoring system composed of a light source emission system 18, a monitoring sheet system 14, a signal receiving system 19, a lock-in amplifier 12 and a crystal controller 26. system, and a computer 30 with a control program, a damper switch control circuit 20. Lock-in amplifier 12, crystal control instrument 26, monochromator 7 are connected with the first serial port 29, the second serial port 32, the third serial port 37 of the computer 30 with the RS232 serial port of carrying and control program respectively...
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