187 results about "Batch fabrication" patented technology

A method and apparatus for substance monitoring. One application is an easy to handle continuous glucose monitor using a group of hollow out-of-plane silicon microneedles to sample substances in interstitial fluid from the epidermal skin layer. The glucose of the interstitial fluid permeates a dialysis membrane and reaches a sensor. Using MEMS technology, for example, allows well-established batch fabrication at low cost.

This disclosure relates to a high volume manufacturing system for processing and measuring workpieces in a semiconductor processing sequence without leaving the system's controlled environment (e.g., sub-atmospheric pressure). The systems process chambers are connected to each other via transfer chambers used to move the workpieces, in the controlled environment, between the process chambers. The transfer chambers include a measurement module capable of measuring workpiece attributes before and / or after process treatments. The measurement module may include an inspection system mounted above, below, or inside the transfer chamber.

A method of making alkali-metal vapor cells by first forming microscale-wax micropackets with alkali metals inside allows fabrication of vapor cells at low cost and in a batch fabricated manner. Alkali metals are enclosed in a chemically inert wax to preform alkali metal-wax micropackets, keeping the alkali metals from reacting with the ambient surroundings during the vapor cell fabrication. This enables the deposition of precise amounts of pure alkali metal inside the vapor cells. Laser ablation of the alkali metal-wax micropackets provides a simple and effective way of releasing the enclosed metal. The method reduces the cost of making chip-scale atomic clocks and allows shipping of alkali vapor packets without contamination issues, thereby creating a technology for alkali-metal vendors to provide small packets of alkali metals.

Processing techniques are disclosed for batch fabrication of microstructures comprising an oxide mask on a substrate with submicron openings formed therein, and microstructures having deep-submicron, high aspect-ratio etched trenches, using conventional optical photolithography. Exemplary high aspect-ratio etched-trench microstructures that may be produced include single crystal resonators and sensors.

A method of batch fabrication using established photolithographic techniques allowing nanoparticles or nanodevices to be fabricated and mounted into a macroscopic device in a repeatable, reliable manner suitable for large-scale mass production. Nanoparticles can be grown on macroscopic “modules” which can be easily manipulated and shaped to fit standard mounts in various devices.

The present invention relates to a Microelectro mechanical system structure. More specifically the invention relates to utilize a sacrificial layer to fabricate an air bearing structure, followed by forming an aperture, and reducing the aperture to nano-scale by electroplating. And then, by using of two thick film photoresist films for twice electroplating fabrication, for fabricate metal microcoils having high aspect ratio structure and interconnection metal line, to achieve efficiencies of utilizing area and reducing resistance. Moreover, proceed lithography depends on different portions and exposure dose. Then form a single photoresist film to have a specific dimension and thickness structure, finally, by using reflow process, forming a magneto-optic (MO) pickup head comprises of Supersphere Solid Immersion Lens (SSIL), nano-aperture, microcoils and air bearing by using an integrated fabrication, with advantages such as no high cost device and precise apparatus are required in the process of fabrication, mass production in batch fabrication, without step of assembly, for high-density data storage and rewritable record.

This disclosure relates to a method for using a high volume manufacturing system for processing and measuring workpieces in a semiconductor processing sequence without leaving the system's controlled environment (e.g., sub-atmospheric pressure). The system includes an active interdiction control system to implement corrective processing within the system when a non-conformity is detected. The corrective processing method can include a remedial process sequence to correct the non-conformity or compensate for the non-conformity during subsequent process. The non-conformity may be associated with fabrication measurement data, process parameter data, and / or platform performance data.

The invention relates to a cantilever beam acceleration transducer manufactured by micro-machining on a single side of a single silicon chip and a manufacturing method. The acceleration transducer is characterized in that: an accelerometer is manufactured by micro-mechanical single side machining through the single silicon chip, so that stress caused by the bonding process of a plurality of chips and different materials is avoided. In order to realize a single side-machined cantilever beam sensitive structure, the cantilever beam structure is released by transversely etching the bottom of the cantilever beam by an anisotropic corrosion method after deep structural etching. The structure provides air squeeze-film damping and mechanical overload protection in a sensitive direction, solves the problem of the absence of air squeeze-film damping in the vertical sensitive direction of the conventional structure and prevents parasitic signal interference caused by structural resonance in the vertical direction. The acceleration transducer has the characteristics of particular suitability for measuring a high g value, simple structure, small size of the chip and the like. Simultaneously, a single side process can use low-cost single throwing silicon chips, is suitable for low-cost mass manufacturing and has higher performance and wide application prospects.