107680 results about "Thermodynamics" patented technology

A substrate heat treatment apparatus includes a heat-treating plate having a flat upper surface, support devices formed of a heat-resistant resin for contacting and supporting a substrate, a seal device disposed annularly for rendering gastight a space formed between the substrate and heat-treating plate, and exhaust bores for exhausting gas from the space. The support devices are formed of resin, and the upper surface of the heat-treating plate is made flat, whereby a reduced difference in the rate of heat transfer occurs between contact parts and non-contact parts on the surface of the substrate. Consequently, the substrate is heat-treated effectively while suppressing variations in heat history over the surface of the substrate.

An apparatus and related method for distributing process gas in a vapor deposition system is described. The gas distribution system includes a vertically movable piston within its plenum, and the movement of the piston controls the flow rate of process gas through the vapor distribution plate of the gas distribution system. The piston can be used to accommodate changes in processing parameters that affect flow characteristics and to create edge-enhanced, uniform, and center-enhanced profiles of deposited material on a substrate without the need to replace the vapor distribution plate.

A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.

Gas-phase reactors and systems are disclosed. Exemplary reactors include a reaction chamber having a tapered height. Tapering the height of the reactor is thought to reduce a pressure drop along the flow of gasses through the reactor. Exemplary reactors can also include a spacer within a gap to control a flow of gas between a region and a reaction chamber.

A method of parallel shift operation of multiple reactors includes: (i) continuously supplying n gases numbered 1 to n simultaneously to n gas ports via n main gas lines, respectively, at a constant flow rate, wherein one of branch gas lines of each main gas line is in an open state so that the inflow rates of the respective reactors are equal, and the outflow rates of the respective reactors are equal; and (ii) while maintaining the inflow rates and the outflow rates of the respective reactors, simultaneously closing the one of the branch gas lines of each main gas line in the open state and opening another one of the branch gas lines of each main gas line so that different numbered gases are continuously supplied to the respective reactors in parallel without changing the inflow rates and the outflow rates of the reactors.

Provided is a substrate processing apparatus capable of suppressing accumulation of reaction products or decomposed matters on an inner wall of a nozzle and suppressing scattering of foreign substances in a process chamber. The substrate processing apparatus includes a process chamber, a heating unit, a source gas supply unit, a source gas nozzle, an exhaust unit, and a control unit configured to control at least the heating unit, the source gas supply unit and the exhaust unit. The source gas nozzle is disposed at a region in the process chamber, in which a first process gas is not decomposed even under a temperature in the process chamber higher than a pyrolysis temperature of the first process gas, and the control unit supplies the first process gas into the process chamber two or more times at different flow velocities to prevent the first process gas from being mixed.

The present invention provides methods and apparatus for performing thermal processes to a semiconductor substrate. Thermal processing chambers of the present invention comprise two different energy sources, such as an infrared radiation source and a UV radiation source. The UV radiation source and the infrared radiation source may be used alone or in combination to supply heat, activate electronic, or create active species inside the thermal processing chamber.

Provided is a cooling device capable of controlling the temperature of an upper portion of a reactor, or more particularly, a gas supply device, for example, a shower head. The cooling device includes a separator configured to uniformly and efficiently cool the gas supply device.

A thin film forming method includes: a first operation of supplying a source gas at a first flow rate into a reactor; a second operation of purging the source gas in the reactor to an exhaust unit; a third operation of supplying a reactive gas at a second flow rate into the reactor; a fourth operation of supplying plasma into the reactor; and a fifth operation of purging the reactive gas in the reactor to the exhaust unit, wherein, during the second to fifth operations, the source gas is bypassed to the exhaust unit, and a flow rate of the source gas bypassed to the exhaust unit is less than the first flow rate. According to the thin film forming method, the consumption of the source gas and the reactive gas may be reduced, and the generation of reaction by-products in the exhaust unit may be minimized.

The present invention relates to fluoroolefin compositions. The fluoroolefin compositions of the present invention are useful as refrigerants or heat transfer fluids and in processes for producing cooling or heat. Additionally, the fluoroolefin compositions of the present invention may be used to replace currently used refrigerant or heat transfer fluid compositions that have higher global warming potential.

A substrate processing apparatus includes a stage provided in a chamber, a shower head in which a plurality of slits are formed and which is opposed to the stage, a first gas supply part which supplies a first gas to a space between the stage and the shower head via the plurality of slits, and a second gas supply part which supplies a second gas which is not a noble gas to a region below the stage, wherein the second gas is the same gas as one of a plurality of kinds of gases constituting the first gas in a case where the first gas is a mixture gas constituted of the plurality of kinds of gases, and the second gas is the same gas as the first gas in a case where the first gas is a single kind of gas.

An apparatus and method for reducing moisture within a wafer handling chamber is disclosed. The moisture reduction results in reduced oxidation of a wafer. The moisture reduction is made possible through use of valves and purging gas. Operation of the valves may result in improved localized purging.

A method for vapor deposition on a substrate in a vapor deposition system having a process space separated from a transfer space. The method disposes a substrate in a process space of a processing system that is vacuum isolated from a transfer space of the processing system, processes the substrate at either of a first position or a second position in the process space while maintaining vacuum isolation from the transfer space by way of a movement accommodating sealing material, and deposits a material on the substrate at either the first position or the second position.

A fast quench reaction includes a reactor chamber having a high temperature heating means such as a plasma torch at its inlet and a restrictive convergent-divergent nozzle at its outlet end. Reactants are injected into the reactor chamber. The resulting heated gaseous stream is then rapidly cooled by passage through the nozzle. This "freezes" the desired end product(s) in the heated equilibrium reaction stage.

A stream conditioning system for a fuel cell gas management system or fuel cell engine. The stream conditioning system manages species potential in at least one fuel cell reactant stream. A species transfer device is located in the path of at least one reactant stream of a fuel cell's inlet or outlet, which transfer device conditions that stream to improve the efficiency of the fuel cell. The species transfer device incorporates an exchange media and a sorbent. The fuel cell gas management system can include a cathode loop with the stream conditioning system transferring latent and sensible heat from an exhaust stream to the cathode inlet stream of the fuel cell; an anode humidity retention system for maintaining the total enthalpy of the anode stream exiting the fuel cell related to the total enthalpy of the anode inlet stream; and a cooling water management system having segregated deionized water and cooling water loops interconnected by means of a brazed plate heat exchanger.

A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas distribution system coupled to a reaction chamber.

A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.

A system for stimulating oil or gas production from a wellbore includes a hydraulic fracturing pump unit having one or more hydraulic fracturing pumps driven by one or more electrical fracturing motors, a variable frequency drive (VFD) controlling the electrical fracturing motors, a fracturing pump blower unit driven by a blower motor, and a fracturing pump lubrication unit having a lubrication pump driven by a lubrication motor and a cooling fan driven by a cooling motor. The system may further include a blender unit and a hydration unit. A system control unit may control the operational parameters of the system.

Synthesis gas is produced though a cyclic method where the first step of the cycle includes reforming a hydrocarbon feed over a catalyst to synthesis gas in a first zone of a bed and the second step reheats this first zone. A hydrocarbon feed is introduced to a bed along with CO2 and optionally steam where it is reformed into synthesis gas. The synthesis gas is collected at a second zone of the bed and an oxygen-containing gas is then introduced to this second zone of the bed and combusted with a fuel, thereby reheating the first zone to sufficient reforming temperatures. Additionally, a non-combusting gas can also be introduced to the second zone to move heat from the second zone to the first zone.

The present invention is a method for detecting an abnormal event for process units of a Fluidized Catalytic Cracking Unit. The method compares the operation of the process units to a statistical and engineering models. The statistical models are developed by principle components analysis of the normal operation for these units. In addition, the engineering models are based on partial least squares analysis and correlation analysis between variables. If the difference between the operation of a process unit and the normal model result indicates an abnormal condition, then the cause of the abnormal condition is determined and corrected.

A climate control device includes a first and a second thermal module. The first module is configured to provide climate conditioned air to a first portion of a seat. The second module is configured to provide climate conditioned air to a second portion of the seat. A control system is provided for controlling the climate control device. The control system includes an input device for providing a set point for the system. A first control unit of the control system is provided for the first thermal module and a second control unit is provided for the second thermal module.

An electrical current generating system is disclosed that includes a fuel cell operating at a temperature of at least about 250° C. (for example, a molten carbonate fuel cell or a solid oxide fuel cell), a hydrogen gas separation system or oxygen gas delivery system that includes a compressor or pump, and a drive system for the compressor or pump that includes means for recovering energy from at least one of the hydrogen gas separation system, oxygen gas delivery system, or heat of the fuel cell. The drive system could be a gas turbine system. The hydrogen gas separation system or the oxygen gas delivery system may include a pressure swing adsorption module.

Particulate compositions are described comprising an intimate mixture of a petroleum coke, coal and a gasification catalyst, where the gasification catalyst is loaded onto at least the coal for gasification in the presence of steam to yield a plurality of gases including methane and at least one or more of hydrogen, carbon monoxide, and other higher hydrocarbons are formed. Processes are also provided for the preparation of the particulate compositions and converting the particulate composition into a plurality of gaseous products.

A biomass fast pyrolysis system for conversion of biomass vegetation to synthetic gas and liquid fuels includes: a) a non-circulating riser reactor for pyrolysis of biomass vegetation feedstock utilizing a heat carrier, the non-circulating riser reactor being physically structured and adapted to have a rate of reaction of at least 8,000 biomass vegetation feedstock lbs / hr / ft2, utilizing a ratio of heat carrier to biomass vegetation feedstock of about 7:1 to about 11.5:1, the riser reactor having a base input region at its bottom, a central reaction region and an output region at its top, the riser reactor including a cyclone disengager at its output region for separation of pyrolysis resulting char and heat carrier from the pyrolysis product gases, the cyclone disengager having an output downcomer and an output upcomer, the cyclone disengager output downcomer being connected to and feeding into a side combustor unit, the riser reactor being a non-circulating riser reactor in that the heat carrier is not returned directly to the riser reactor from the cyclone disengager and travels first down the cyclone disengager output downcomer to the side combustor unit; and, b) the side combustor unit for combusting pyrolysis resultant char and reheating the heat carrier the side combustor having a heat carrier downcomer connected to the base input region of the riser reactor.

The present invention provides processes for making syngas-derived products. For example, one aspect of the present invention provides a process for making a syngas-derived product, the process comprising (a) providing a carbonaceous feedstock; (b) converting the carbonaceous feedstock in a syngas formation zone at least in part to a synthesis gas stream comprising hydrogen and carbon monoxide; (c) conveying the synthesis gas stream to a syngas reaction zone; (d) reacting the synthesis gas stream in the syngas reaction zone to form the syngas-derived product and heat energy, a combustible tail gas mixture, or both; (e) recovering the syngas-derived product; and (f) recovering the heat energy formed from the reaction of the synthesis gas stream, burning the combustible tail gas mixture to form heat energy, or both.

A plasma processing system for processing a substrate is disclosed. The plasma processing system includes a gas distribution system. The plasma processing system also includes a gas flow control assembly coupled to the gas distribution system and configured to control a set of input gases provided by the gas distribution system. The plasma processing system further includes a first set of nozzles coupled to the gas flow control assembly and configured to supply a first set of gases for processing a first portion of the substrate. The plasma processing system further includes a second set of nozzles coupled to the gas flow control assembly and configured to supply a second set of gases for processing a second portion of the substrate.

A method of cementing a tubular string in a wellbore includes: deploying the tubular string into the wellbore; pumping cement slurry into the tubular string; launching a cementing plug after pumping the cement slurry; propelling the cementing plug through the tubular string, thereby pumping the cement slurry through the tubular string and into an annulus formed between the tubular string and the wellbore; and controlling flow of fluid displaced from the wellbore by the cement slurry to control pressure of the annulus.

A cooling apparatus and methods for maintaining a precursor source vessel heater at a desired temperature are disclosed. The apparatus and methods can be used to maintain a desired temperature gradient within the precursor source vessel for improved integrity of the precursor source before delivery of the precursor to a reaction chamber. The apparatus and methods can also be used for rapid cooling of a source vessel for maintenance.