3105results about How to "Reduce amount" patented technology

A jaw movement mechanism for surgical tools has improved mechanical efficiency and other advantages. The jaw movement mechanism controls the orientation and position of a movable jaw relative to a fixed jaw through a range of movement of the movable jaw. The jaws maintain a parallel orientation throughout a portion of the range of movement of the movable jaw. The jaws maintain an angular relationship throughout a portion of the range of movement of the movable jaw.

Methods for an intravascular occlusion are provided. A guidewire having an occlusive device such as balloon or a filter at one end is advanced across the occlusion using a guide catheter, and the occlusive device is expanded distal to the occlusion to occlude the blood vessel. The guide catheter may also have an occlusive device to occlude the vessel proximal to the occlusion. In a treatment method for the carotid arteries, occlusive devices may be provided in the external carotid artery, in the internal carotid artery, and in the common carotid artery.

Matrixes doped with semiconductor nanocrystals are provided. In certain embodiments, the semiconductor nanocrystals have a size and composition such that they absorb or emit light at particular wavelengths. The nanocrystals can comprise ligands that allow for mixing with various matrix materials, including polymers, such that a minimal portion of light is scattered by the matrixes. The matrixes of the present invention can also be utilized in refractive index matching applications. In other embodiments, semiconductor nanocrystals are embedded within matrixes to form a nanocrystal density gradient, thereby creating an effective refractive index gradient. The matrixes of the present invention can also be used as filters and antireflective coatings on optical devices and as down-converting layers. Processes for producing matrixes comprising semiconductor nanocrystals are also provided. Nanostructures having high quantum efficiency, small size, and / or a narrow size distribution are also described, as are methods of producing indium phosphide nanostructures and core-shell nanostructures with Group II-VI shells.

The present invention concerns a method and an apparatus for removing substances from gases discharged from gas phase reactors. In particular, the invention provides a method for removing substances contained in gases discharged from an ALD reaction process, comprising contacting the gases with a “sacrificial” material having a high surface area kept at essentially the same conditions as those prevailing during the gas phase reaction process. The sacrificial material is thus subjected to surface reactions with the substances contained in the gases to form a reaction product on the surface of the sacrificial material and to remove the substances from the gases. The present invention diminishes the amount of waste produced in the gas phase process and reduces wear on the equipment.

In one embodiment, a semiconductor substrate is placed into a process chamber. A gas mixture including a silicon-containing gas, a fluorine-containing gas, an inert gas, and an oxygen gas is introduced into the chamber at a pressure range of from about 30 mTorr to about 90 mTorr. During this time, deposition and etching processes are concurrently performed using a plasma to form a high-density plasma (HDP) insulating layer on the semiconductor substrate. A ratio of deposition to etching is from about 3:1 to about 10:1. A ratio of a flow rate of the fluorine-containing gas to a flow rate of the silicon-containing gas is less than about 0.9.