It is an object of the present invention to provide a
semiconductor display device having an interlayer insulating film which can obtain planarity of a surface while controlling film formation time, can
control treatment time of heating treatment with an object of removing
moisture, and can prevent
moisture in the interlayer insulating film from being discharged to a film or an
electrode adjacent to the interlayer insulating film. An inorganic insulating film containing
nitrogen, which is less likely to transmit
moisture compared with an organic resin, is formed so as to cover a TFT. Next, an organic resin film containing photosensitive
acrylic resin is applied to the organic insulting film, and the organic resin film is partially exposed to light to be opened. Thereafter, an inorganic insulting film containing
nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover the opened organic resin film. Then, in the opening part of the organic resin film, a gate insulating film and the
two layer inorganic insulating film containing
nitrogen are opened partially by
etching to
expose an
active layer of the TFT.