The invention discloses a preparation method of self-assembled
nano silicon dioxide. The preparation method comprises synthesizing a
silicon dioxide seed solution and growing of a
silicon dioxide seed, and specifically comprises the steps of: mixing a PEO-PPO-PEO triblock
copolymer, a solution containing spherical
silicon dioxide and a solution containing a catalyst; adding a solution containing a silicon precursor at 40-60 DEG C to obtain a solution A; and stirring and reacting for 20-30 hours to obtain a
silicon dioxide seed solution, heating to boil, dropwise adding a
silicic acid solution, and reacting for 1-3 hours. The surface appearance of the self-assembled
nano silicon dioxide is improved, so that the particles and a
wafer form multi-
point contact, and the removal rate can be increased through a friction
chemical reaction. The multi-
point contact can effectively disperse the load, so that the scratch becomes shallow, and the scratch probability can be reduced. The
polishing solution is used for ultra-precise
polishing of hard and brittle materials. Through the synergistic effect of a dispersing agent and a
metal ion capturing agent which are compounded, the adsorption and dispersion effects of
abrasive dust ions or particles are well balanced, and cleaning is easy after
polishing.