A
coating film preparation process for an electronic device shell comprises the following steps that
ion bombardment is conducted, i.e., a transparent
polyethylene glycol terephthalate (PET) sheet with one face subjected to UV transfer treatment is put into a
vacuum coating chamber, and the surface of the PET sheet is subjected to
ion bombardment; and
film coating is conducted, i.e., the surface of the PET sheet is sequentially coated with a SiO2 film, a TiO2 film, an
indium film and a SiO2 film in a vacuum
film coating mode, and the parameters of vacuum
film coating are as follows: the vacuum degree during film formation is from 4.0*E-3Pa to 2.0*E-3Pa, the current during SiO2 film
coating is 50-150 mA, the current during TiO2 film
coating is 350-390 mA, the
evaporation resisting current during
indium film coating is 280-300 mA, and the thicknesses of the SiO2 film, the TiO2 film, the
indium film and the SiO2 film are sequentially seen in the specifications. The surface of a product processed by the process has the 3D effect with
high surface three-dimensional sense, the product has the golden appearance with high
metal sense, and the film coating reliability is high.