51results about How to "Improve uneven thickness" patented technology

The invention method is suitable to working procedure for evening inter layer dielectric (ILD) and inter metal dielectric (IMD) in flow for manufacturing semiconductor parts so as to improve the issue of inconsistence dielectric thickness after chemically machinery grinding. The method includes following steps. A semiconductor substrate possessing multiple components or patternized metal conducting wire is provided. A dielectric layer is formed to cover components or metal conducting wires uniformly. Etch back procedure is carried out by using technology of reactivity ion etching (RIE) with etching gas containing C5H3, CHF3 and Ar. The said etching procedure is stopped on the components or patternized metal conducting wire in order to form an even dielectric layer between components and wires.

The invention relates to a graphic substrate, an epitaxial wafer, a manufacturing method, a storage medium and an LED chip. The graphic substrate is applied to a Micro LED, and the body is provided with at least one accommodating groove for accommodating at least a portion of the epitaxial material dropped in the epitaxial process. The graphic substrate is advantaged in that at least a portion ofthe excess epitaxial material generated during high-speed rotational molding of the epitaxial layer in an MOCVD furnace can be dropped into the accommodating groove without remaining on the epitaxiallayer, a problem of uneven thickness of the epitaxial layer is ameliorated, wavelength uniformity is improved, and a problem of wavelength non-uniformity is at least solved.

The invention discloses an all-glass tube MVC low-solubility sewage evaporation and condensation purification system, comprising: an evaporation condenser, a compressor, a water pump, a glass special-shaped preheater and a raw water tank. The present invention can optimize the existing mechanical vapor compression technology, and provide an evaporation condensation purification system with low cost, corrosion resistance, high efficiency and energy saving, daily output of about 0.5-10 tons of pure water, and zero discharge.

The invention discloses a support tool structure for painting the inner wall of a gyration shell. The support tool structure for painting the inner wall of the gyration shell comprises a support frame, a horizontal guiding support structure, a vertical guiding support structure and a lifting assembly. The support frame is of an L shape as a whole and comprises a base and a vertical frame arrangedon one side of the base. The horizontal guiding support structure is arranged on the base, the rear end of the gyration shell can be supported by the horizontal guiding support structure, and supporting points can translate along the horizontal direction to adapt to gyration shells of different length and diameters through the horizontal guiding support structure. The vertical guiding support structure is arranged on the vertical frame, the front end of the gyration shell can be supported by the vertical guiding support structure, and the supporting points can translate in the vertical direction through the vertical guiding support structure so that the tilting angle of the gyration shell can be adjusted. The lifting assembly is arranged on the vertical frame and used for driving the vertical guiding support structure to move in the vertical direction. By means of the support tool structure for painting the inner wall of the gyration shell, it is guaranteed that the tilting angle of axis of the gyration shell in the painting process does not change, the problem that inner wall paint film thickness is uneven is solved, and in addition, the distance from the cut-off line of paint film to the rear end face of the gyration shell is consistent.

The invention provides an inkjet printing device and an inkjet printing method, and relates to the technical field of display. The inkjet printing device is used for spraying printing ink to a targetsubstrate and comprises an inkjet assembly and a heating assembly, wherein the inkjet assembly comprises a nozzle for spraying the printing ink; the heating assembly comprises an emitting nozzle for emitting heat source beams; and the heat source beams are used for heating the printing ink on the target substrate, and energy density of each heat source beam is decreased progressively from center to the periphery on the cross section of the heat source beam. According to the embodiment, the energy density of each heat source beam is decreased progressively from center to the periphery on the cross section of the heat source beam, so that the increase speed of the solidification rate of the intermediate region of the printing ink in accommodating holes is higher than that of the solidification rate of the edge region, and the printing ink flowing from the intermediate region to the edge region can be reduced.

The liquid crystal display device according to the present invention includes: a thin-film transistor substrate, wherein the thin-film transistor substrate includes an organic insulating film disposed on a drain electrode and provided with a contact hole, the contact hole includes first, second, third, and fourth side wall portions in the given order, an inclination of an upper portion of the second side wall portion is gentler than an inclination of an upper portion of each of the first and third side wall portions, and the contact hole satisfies W2>L, wherein L is a distance from an upper end of the first side wall portion to an upper end of the third side wall portion on a first straight line, and W2 is a maximum distance between one and another upper end of the second side wall portion on a third straight line parallel to the first straight line.

The invention relates to a kind of zeolite film prepn, method. The characteristics are: to compound sol according to mole matching ratio of Na2O:SiO2:Al2O3:H2O, to coat sol layer on supporting body of a-Al2O3 ceramics etc., it is conversed to dry sol layer, then is put into stainless steel pressure pot with polytetrafluorine lining to be soaked by water heat treatment solution compounded at same time, the pot is closed in temp, 80-200 deg.C, keeping the temp, for 24-48 hours, then taking out, washing, drying and inreasing and reducing temp, in program to obtain zeolite film.

The embodiment of the invention provides a movable support assembly, a mammary radiography machine and a mammary radiography machine pressing method. The movable support assembly comprises a movable support plate and a support rail, wherein a revolving shaft is arranged on the support rail, the movable support plate is movably connected to the support rail through the revolving shaft, and the movable support plate can move up and down through the revolving shaft; the back end of the support rail is connected to a fixed portion, the fixed portion comprises a force application part, and the force application part is used for applying downward force to the movable support plate so that the movable support plate can be upwarped relative to the horizontal direction in the initial state. According to the embodiment of the invention, the oppressing and releasing effect can be effectively improved, the comfort of patients is improved, the phenomenon that the examined body is extruded in oppressing is effectively improved, and the quality of imaging is improved.