Graphic substrate, epitaxial wafer, manufacturing method, storage medium and LED chip
A patterned substrate and manufacturing method technology, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of uneven wavelength, uneven thickness of epitaxial layer, etc., to improve the uneven wavelength, improve the uneven thickness, improve Effect of Wavelength Uniformity
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[0026] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0027] The patterned substrate 100 provided by the present invention (in image 3 Among them, 300 represents the carrier in MOCVD, and the six circles placed on the carrier 300 represent the patterned substrate 100. It can be understood that the number of patterned substrates 100 that can be accommodated in the carrier 300 can be increased. Minus, by no means limited to six), applied to Micro LED, such as figure 1 , figure 2 and image 3 As shown, it includes: a substrate body 101, at least one accommodating groove 103 is arranged above the substrate body 101, and the accommodating groove 103 h...
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