The invention discloses a device for improving the luminous efficiency of a
silicon nitride-based thin-film light-emitting
diode and a preparation method of the device, and belongs to the technical field of
semiconductor luminescent devices. The preparation method mainly comprises the following steps: a p-Si layer is used as a hole-injection layer, and an ultrathin noncrystalline
silicon thin film is deposited on the hole-injection layer; a
silicon nitride-based thin film is deposited on the ultrathin noncrystalline
silicon thin film to serve as a light-emitting
active layer; the ultrathin noncrystalline
silicon thin film is placed in an annealing furnace to be subjected to
dehydrogenation annealing and
steady state high temperature annealing in sequence, so that the ultrathin noncrystalline
silicon thin film is converted into a nanometer silicon thin film; then, an AZO transparent conducting thin film provided with an optical window is deposited on the
silicon nitride-based light-emitting
active layer. The device for improving the luminous efficiency of the
silicon nitride-based thin-film light-emitting
diode and the preparation method of the device mainly have the advantages that ultrathin nanometer silicon is used as a hole
blocking layer in the device to effectively restrain hole carriers from being injected excessively, therefore, balanced injection of electrons and holes is promoted, and the luminous efficiency of the device is improved. The preparation process is simple, good in
controllability, and compatible with a current microelectronic process.