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151 results about "Ic production" patented technology

Composite single crystal thin film and method for manufacturing composite single crystal thin film

The invention discloses a composite single crystal thin film and a method for manufacturing the composite single crystal thin film. The composite single crystal thin film comprises a substrate, an optical isolation layer, a lithium niobate single crystal thin film or a lithium tantalate single crystal thin film and a silicon thin film, wherein the optical isolation layer is located on a substrate; the lithium niobate single crystal thin film or the lithium tantalate single crystal thin film is located on the optical isolation layer; and the silicon thin film is located on the lithium niobate single crystal thin film or the lithium tantalate single crystal thin film. The composite single crystal thin film disclosed by the invention has good nonlinear optical effect, acousto-optical effect, electro-optic effect and the like of a lithium niobate or lithium tantalite material, and simultaneously has the characteristic of a mature processing technology of a silicon material, so that the composite single crystal thin film disclosed by the invention can achieve relatively good compatibility with an existing IC production technology and has a broad industrial prospect. In addition, stable and effective industrial production can be achieved according to the method for manufacturing the composite single crystal thin film disclosed by the invention.
Owner:JINAN JINGZHENG ELECTRONICS

Preventing Contamination in Integrated Circuit Manufacturing Lines

A semiconductor manufacturing line includes an inert environment selected from the group consisting essentially of an inert airtight wafer holder, an inert wafer transport channel, an inert production tool, an inert clean room, and combinations thereof.
Owner:TAIWAN SEMICON MFG CO LTD

Silicon wafer positioning and loading device applied to chemical mechanical polishing equipment

The invention provides a silicon wafer positioning and loading device applied to chemical mechanical polishing equipment and relates to the technical field of silicon-wafer chemical mechanical polishing equipment. A base plate of the positioning and loading device is connected to a loading guide ring on the base plate through a supporting rod; a stretching part on a lifting driving mechanism is fixedly connected to a silicon wafer fixture thereon; the silicon wafer fixture is connected to a silicon wafer guide ring outside the silicon wafer fixture; a butt-joint guiding mechanism of a silicon wafer loading device and a silicon wafer resisting-joint guiding mechanism are arranged on the loading guide ring; and an automatic displacement adjusting mechanism and an automatic resetting mechanism are arranged on the base plate or the lower part of the lifting driving mechanism. The positioning and loading device can accurately position a silicon wafer and convey the silicon wafer to a loader for processing. The positioning and loading device has the advantages of simple structure, accurate positioning, loading safety, reliable property and operation convenience, and is beneficial to realizing the automatic loading of the silicon wafer and promoting the efficiencies for positioning, loading and processing the silicon wafer. The positioning and loading device is especially suitable for the loading of the silicon wafer in the chemical mechanical polishing equipment and also can be used for loading wafers during production processes of a transistor and an integrated circuit.
Owner:THE 45TH RES INST OF CETC

Method for quickly extracting critical area of layout

The invention discloses a method for quickly extracting the critical area of a layout, which includes the following steps that: layout information is extracted; a blocked ordered multi-level indexed table is established; the defects of the production technique are simulated at random, and the affection is statistically analyzed; and the blocked ordered multi-level indexed table is utilized to calculate the critical area. By utilizing the method which first classifies basic pattern units of the integrated circuit layout and then hierarchically traverses a layout tree to extract all the patterns superposed with defective polygons, the invention can quickly extract all the patterns superposed with defective polygons in a layout tree with great depth and extension within an effective time and space range and calculate the critical area of the layout, and is used for directing the practical integrated circuit production to increase the yield.
Owner:ZHEJIANG UNIV

Wafer-grade vacuum encapsulation process for micro-electro-mechanical system

A wafer-grade vacuum encapsulation process for a micro-electro-mechanical system belongs to an encapsulation method for a micro-electro-mechanical system and solves the problems of the film deposition-based vacuum encapsulation process that the deposited film is thin, has small chamber and is easy to be damaged and the encapsulation device has leaked vacuum and reduced service life. The process sequentially comprises a step of depositing an air absorbent, a step of depositing a thin sacrificial layer, a step of depositing a cushion chamber sacrificial layer, a step of depositing thick sacrificial layer, a step of preparing an encapsulation cover, a step of etching a releasing hole, a step of removing sacrificial layer and a step of sealing. The process solves the problems that the existing encapsulation method has short vacuum retaining time, low sealing quality, large encapsulation dimension, incompatibility between the process and the standard IC process and high cost, thus ensuring the air pressure in the inner-most chamber; and simultaneously, the cost of the process is less than that of the vacuum encapsulation based on wafer-bonding process, and the process can realize production in general IC production factories and greatly promote the development and generalization of wafer-grade MEMES vacuum encapsulation technology.
Owner:HUAZHONG UNIV OF SCI & TECH

Defect casual inspection method capable of dynamically adjusting according to technology wafer number load

The invention discloses a defect casual inspection method capable of dynamically adjusting according to the technology wafer number load. The method comprises the following steps: presetting a defect detection data server; inputting and storing standard casual inspection frequency of a defect detection station and operation speed ratios of different defect detection procedures at normal production time into the defect detection data server; the defect detection data server calculating the real-time capacity of the defect detection station according to the real-time state of each defect detection device in the defect detection station, and automatically upgrading the standard casual inspection frequency of the defect detection station. By the adoption of the method, the problem that dynamic changes of the defect detection capacity cause production speed to become slow and production cost to be increased is effectively avoided. The frequency of defect casual inspection is adjusted according to the dynamic changes of the technology wafer number load, so that integrated circuit production speed is effectively improved, the production period is shortened, and the production cost is eventually reduced.
Owner:SHANGHAI HUALI MICROELECTRONICS CORP

IC (integrated circuit) virtual manufacturing system and implementing method thereof

The invention relates to an IC (integrated circuit) virtual manufacturing system and an implementing method thereof. The implementing method comprises the following steps of according to an EDA (electronic design automation) design document, designing the technological process of an IC production line, wherein the IC production line comprises an IC wafer manufacturing process, an IC chip circuit manufacturing process and an IC packaging manufacturing process; displaying the technological process of the IC production line in a 3D (three-dimensional) cartoon way; performing the parameter setting and programming simulating on key equipment of the IC production line, and inputting the data into a database; automatically performing the mechanism working process 3D simulating and interactive operation on the key equipment of the IC production line by an object orienting technique and a Unity technique under the VC++6.0 environment. The implementing method has the advantages that the intuitive reference is provided for the data modifying of the technological design of the IC production line and the key equipment within the shortest period, so as to realize the purposes of short development cycle, low cost and high production efficiency; the training, examination and technical qualification certifying examination can be performed on IC technicians and engineers.
Owner:CHANGZHOU AUTOSMT INFORMATION TECH

High and low temperature test device for IC testing

The invention relates to a high and low temperature test device for IC testing, so that technical problems that abnormity elimination and correction can not be carried out on a single abnormal integrated circuit while a high-and-low-temperature box is not opened and the power of the integrated circuit that can not be corrected or has been tested can not be cut off completely to enter a silence state in the prior art can be solved. The test device is composed an upper computer, a hardware circuit connected with the upper computer, and a plurality of ICs connected with the hardware circuit. The hardware circuit includes a processor, a power supply module, a current monitoring module, a voltage monitoring module and a switch module, wherein the power supply module, the current monitoring module, the voltage monitoring module and the switch module are connected with the processor. Therefore, the problems can be solved well. The test device can be applied to the industrial IC production.
Owner:张家港市欧微自动化研发有限公司

Visual configuration method for integrated circuit production line monitoring system

The invention discloses a visual configuration method for an integrated circuit production line monitoring system. The visual configuration method has the effect of monitoring the integrated circuit production line in real time by the details of realizing connection with a device through serial communication, acquiring real-time production status of device and displaying the status on a web page. The visual configuration method includes the steps of 1, building a graph structural body which includes a graphic edit too bar and a graphic edit area; 2, defining events which are selected, dragged and placed through dragging actions; 3, performing visual configuration, building relation between graph elements at the page end and the actual device; and 4, acquiring real-time status of the device and updating information displayed in the page in real time. The device configuration is achieved by means of dragging, and accordingly the visual configuration method has the advantages of operational convenience, high speed, visual display and the like.
Owner:MICROCYBER CORP

Arrangement and method impedance matching

An arrangement and method for impedance matching (e.g., for a power amplifier) comprising a first node (204a) for receiving an output current to be impedance matched; a second node (212, 214) for receiving output current from the first node; a first current conductor (202c) for carrying current from the first node to the second node; a third node (204b) for receiving output current from the second node; and a second current conductor (202d) for carrying current from said second node to said third node, whereby the first and second current conductors are closely positioned so that their inductance is the sum of their self-inductances and the negative sum of their mutual inductance. The current conductors may be wire bonds, the arrangement may include a capacitor integrated in a power amplifier IC module, in which the capacitor may be provided in a separate IC from the power amplifier, the arrangement may utilise a plurality of impedance matching cells, and the wire bonds may be interdigitated across the semiconductor die. This provides the following advantages: easy to implement; increased accuracy of matching; requires few external components; easy to manufacture; no need for dedicated design flow; requires only standard IC production and test tools; uses low loss matching networks; involves only a small increase in die size (due to integration of capacitor), but the total size of the solution may be significantly reduced (e.g., by 50%) because of the reduced number of external components.
Owner:NXP USA INC

Compound containing N amidino-silicon and application thereof

The invention relates to a compound containing N amidino-silicon. The compound is prepared according to the following methods: (1) dissolving carbodiimide or derivatives thereof into a reaction solvent, adding an alkyl / amido lithium solution, aminopyridine or derivatives thereof and alkyl / amido lithium under the stirring condition of -78 DEG C to 0 DEG C according to the molar ratio of 1 to (1-1.2), restoring to room temperature, and then further stirring and reacting for 0.5-3 hours to obtain a reaction mixture; (2) filtering the reaction mixture obtained in the step (1) to obtain lithium salt solid, and dissolving the lithium salt solid into an organic solvent to obtain a lithium salt solution; (3) dropwise adding a silicon-containing reactant or a solution thereof to the lithium salt solution at -78 DEG C to 0 DEG C according to the molar ratio of lithium salt to silicon-containing reactant being (1-4) to (1-1.1), rising to a certain temperature and reacting for 3-10 hours; (4) filtering the reaction mixture obtained in the step (3), concentrating and crystallizing filtrate, or distilling at reduced pressure to obtain a silicon compound containing an amidine ligand. The compound disclosed by the invention can be applied to production of integrated circuits to prepare films of silicon nitride, carbon-containing silicon nitride and the like.
Owner:JIANGNAN UNIV

Use of copper Dimashg process in production of integrated circuits

The method comprises: based on the flat surface of photosensitive material and the polysilicon etch-back technology, a selective etch is made for the tantalum nitride and tantalum metal layer deposited with physical vapour deposition process; a one time metal copper chemical mechanical polishing is used to replace the original two times polishing process, copper chemical mechanical polishing and tantalum nitride / tantalum metal layer polishing. The invention reduces the dishing of metal wire and the erosion of insulation media caused by over-polishing from multi times of chemical mechanical polishing.
Owner:SHANGHAI INTEGRATED CIRCUIT RES & DEV CENT +2

Non-shutdown various-IC picking device

The invention discloses a non-shutdown various-IC picking device which comprises an IC picking mechanism, a servo motor X-Y-Z-direction work platform, servo motor X-Y-Z-direction work platform mounting racks, a feeding mechanism and a servo motor X-direction work platform A and B mounting rack base. The IC picking mechanism is mounted on the servo motor X-Y-Z-direction work platform; the servo motor X-Y-Z-direction work platform is mounted on the servo motor X-Y-Z-direction work platform mounting racks; and the feeding mechanism is mounted on the servo motor X-direction work platform A and B mounting rack base. The non-shutdown various-IC picking device is used for picking ICs in a small fixed area, the stability and success rate of IC picking are guaranteed, IC picking in the shortest distance is guaranteed, the IC picking time is shortened, and the efficiency of the device is improved; and stable non-shutdown same-type IC production is achieved by means of left area feeding and right area feeding, and stable non-shutdown IC production can be achieved as long as movable IC feeding mechanism bodies are additionally arranged.
Owner:SHENZHEN COMWIN AUTOMATION TECH

Semiconductor integrated circuit test equipment

InactiveCN112964978AImprove positioning test efficiencyHigh precisionElectronic circuit testingIc productionSemiconductor
The invention relates to the technical field of integrated circuit production and processing, and discloses semiconductor integrated circuit test equipment. The semiconductor integrated circuit test equipment comprises a workbench, wherein a test board is fixedly installed at the center of the top part of the workbench, a probe board is arranged at the top part of the test board, a lifting mechanism is arranged at the top part of the workbench, and the lifting mechanism comprises a lifting table. According to the semiconductor integrated circuit test equipment, a rotating ring rotates in one direction on the outer wall of the lifting table, so that a positioning frame is driven by four groups of moving rods and four groups of linkage rods to continuously reciprocate up and down in a hollow part in the middle of the lifting table, the positioning frame drives a circuit board limited in a cavity of the positioning frame to reciprocate up and down, when the positioning frame moves to the lowest part of the lifting platform, the circuit board is in extrusion contact with a probe on the top part of the probe plate, and the circuit board is accurately butted with the probe on the probe plate up and down. The positioning test efficiency of a semiconductor integrated circuit board is improved.
Owner:北京瓢虫星球信息技术有限公司

Rapid collecting and distributing method of real-time data for integrated circuit production equipment

The invention discloses a rapid collecting and distributing method of real-time data for integrated circuit production equipment, aiming to distribute the real-time data collected by different types of integrated circuit production equipment. The rapid collecting and distributing method includes steps of 1), configuring a data collection ID of database management and an event ID mapping table; 2), configuring a real-time data-collecting periodic table of the database management; 3), configuring a notification information table of data-overrun emails for a control section that the equipment of the database management belongs to; 4), loading configuration information from the database; 5), customizing the collected events from the integrated circuit production equipment; 6), subjecting the received data of the collected events to analytical processing; 7), subjecting the collected and analyzed data to distributing processing. By the rapid collecting and distributing method, the real-time data collected by the different types of the integrated circuit production equipment can be subjected to distributing processing which can be customized by customers, so that flexibility and adaptability of software are improved.
Owner:MICROCYBER CORP

Packaged device for detecting factory ESD events

An ESD monitor device may take the form of an integrated circuit with a plurality of monitor components available at each I / O site of the ESD monitor device. Each monitor component has a physical structure which provides scalable ESD robustness. The monitor components are connected in parallel to an ESD bus. An integrated circuit may be formed by processing an ESD monitor device through one or more process steps of an integrated circuit manufacturing line, and subsequently measuring the ESD monitor device. Parameters of a process step of the manufacturing line may be adjusted to reduce ESD events at the process step, based on measurement results from the ESD monitor device. The integrated circuit may subsequently be processed through the adjusted process step.
Owner:TEXAS INSTR INC
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