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53 results about "Beam scattering" patented technology
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Electron beam drawing mask blank, electron beam drawing mask, and method of manufacturing the same
InactiveUS6812473B1Reduce overall chromatic aberrationReduce exposure timeElectric discharge tubesSemiconductor/solid-state device manufacturingBody PatterningFilm material
An electron beam drawing mask includes a pattern supporting film for transmitting an electron beam therethrough; an electron beam scattering body pattern formed over the pattern supporting film; and a support member for supporting the pattern supporting film and the electron beam scattering body pattern. The pattern supporting film has a film thickness of 0.005 to 0.2 micron, a film material density of 1.0 to 5.0 g / cm<3 >and an elastic modulus of 0.8x10<11 >Pa or higher. The electron beam scattering body pattern has a film thickness of 0.2 to 2 micron, a film material density of 1.0 to 5.0 g / cm<3>, and an elastic modulus of 0.8x10<11 >Pa or higher.
Owner:HOYA CORP
Method of repairing a mask with high electron scattering and low electron absorption properties
A method to repair a scattering stencil type mask having a high electron beam scattering property and low electron absorption. In order to correct a defect caused at the time of manufacturing of the mask, which is being used when a reduction projection image is transferred onto a substrate and has a pattern projection portion comprising an electron beam scattering material, a repair membrane is formed in the defective portion of the mask by irradiating a charged particle beam to said defect while a gas including substances having high scattering properties are supplied to the close vicinity of the defective portion.
Owner:NIKON CORP
Phased array antenna choke plate method and apparatus
ActiveUS7295165B2Sufficient attenuationMore aerodynamicAntenna adaptation in movable bodiesHorizonEngineering
A phased array antenna system on an aircraft that incorporates a choke plate that significantly attenuates sidelobes of the antenna beam pattern at elevation angles that would cause RF interference with ground-based terrestrial wireless networks. The choke plate includes a plurality of choke grooves that substantially circumscribe the antenna aperture. The choke plate has an upper surface that is positioned generally coplanar with the upper surface of the antenna aperture. The grooves of the choke plate may be filled with a dielectric material. The choke plate provides a smooth aerodynamic component that significantly attenuates beam scattering, and thus the radiation pattern sidelobes of the antenna at or below the horizon, when the aircraft is in flight.
Owner:THE BOEING CO
Field emission device
ActiveUS8018169B2Improve emission uniformityHigh voltageControl electrodesDischarge tube luminescnet screensField emission deviceGate insulator
Disclosed is a field emission device. The field emission device includes: an anode substrate including an anode electrode formed on a surface thereof and a fluorescent layer formed on the anode electrode; a cathode substrate disposed opposite to and spaced apart from the anode substrate, and including at least one cathode electrode formed toward the anode substrate and a field emitter formed on each cathode electrode; and a gate substrate having one surface in contact with the cathode substrate, wherein the gate substrate include gate insulators surrounding the field emitters and having a plurality of openings exposing the field emitters, and a plurality of gate electrodes formed on the gate insulators around the openings and electrically isolated from one another. Thus, when the trajectories of the electron beams emitted from the emitters are rapidly changed over time by a voltage difference between the gate electrodes, an electron beam-scanned area can be expanded due to residual images and the electron beam can be more uniformly emitted due to an electron beam scattering effect and a linear beam spreading effect, resulting in improved emission uniformity of the fluorescent layer.
Owner:ELECTRONICS & TELECOMM RES INST
Phased array antenna choke plate method and apparatus
ActiveUS20060238427A1Sufficient attenuationLarge radiationAntenna adaptation in movable bodiesHorizonRadiation pattern
A phased array antenna system on an aircraft that incorporates a choke plate that significantly attenuates sidelobes of the antenna beam pattern at elevation angles that would cause RF interference with ground-based terrestrial wireless networks. The choke plate includes a plurality of choke grooves that substantially circumscribe the antenna aperture. The choke plate has an upper surface that is positioned generally coplanar with the upper surface of the antenna aperture. The grooves of the choke plate may be filled with a dielectric material. The choke plate provides a smooth aerodynamic component that significantly attenuates beam scattering, and thus the radiation pattern sidelobes of the antenna at or below the horizon, when the aircraft is in flight.
Owner:THE BOEING CO
Apparatus for homogenizing light
ActiveCN101305309ALarge numerical apertureNumerical aperture adaptationDiffusing elementsLensOptoelectronicsBeam scattering
The invention relates to a device for homogenising light, said device comprising a first lens array (11) provided with a number of convex lenses (12), and at least one second lens array (21) which is arranged at a distance from the first lens array in the beam scattering direction and through which the light refracted by the first lens array (11) can pass. The second lens array (20) comprises a number of first lenses (22) that are respectively arranged at a distance from each other, at least one of the first lenses (22) of the second lens array (21) being associated with each convex lens (12) of the first lens array (11). The convex lenses (12) of the first lens array (11) have a smaller curvature than the first lenses (22) of the second lens array (21) associated with said convex lenses.
Owner:LIMO GMBH
Reflective digital holographic fingerprint imaging device
InactiveCN102436577AIncrease the amount of informationOvercome collection deficienciesTelevision system detailsPerson identificationUltrasound attenuationLatent fingerprint
The invention relates to a digital holographic device, in particular to a fingerprint acquisition and imaging device applied in the field of police. Aiming at the problems of poisonous detection and damage of the original state of physical evidences, which exist in the latent fingerprint appearing technology, the invention provides the non-contact digital holographic fingerprint acquisition device with nondestructive measurement, the device comprises a laser, a continuous attenuation piece, a half-wave plate, a polarization beam splitter prism, a completely reflecting mirror, a beam scattering filter system, a beam combination prism, a CCD (Charge Coupled Device) image sensor and a computer. The reflective digital holographic fingerprint imaging device disclosed by the invention can carry out acquisition for many times without destroying fingerprints, so that the problem of insufficient site fingerprint acquisition in the traditional criminal investigation can be solved, and extra information-phase information is provided for acquiring fingerprint information texture. The reflective digital holographic fingerprint imaging device has a practical significance for the fingerprint acquisition in the field of police.
Owner:BEIJING UNIV OF TECH
Mask blank and mask for electron beam exposure
InactiveUS20050266320A1Thin thicknessLittle time-dependent changeElectric discharge tubesSemiconductor/solid-state device manufacturingSurface roughnessBeam scattering
A mask blank for electron beam exposure includes a pattern support layer that transmits an electron beam therethrough, an electron beam scattering layer formed on the pattern support layer, and a support body supporting the pattern support layer and the electron beam scattering layer. The pattern support layer is formed by a material that has an amorphous structure and that is mainly composed of carbon-silicon bonds. The pattern support layer is a tensional stress membrane that has a surface roughness of 0.2 (nm, Rms) or less. A mask for electron beam exposure is formed by patterning the electron beam scattering layer of the mask blank.
Owner:HOYA CORP
Polymer piezoelectric gas sensor system for detecting gases
InactiveCN103336026ALow priceEasy to operateMaterial analysis by electric/magnetic meansSensor arrayGas passing
The invention provides a polymer piezoelectric gas sensor system for detecting gases. The system comprises a gas passing pipe, a magnetic valve, a filter, a thermostatic chamber, a gas sensor array, a micro-compressor, a frequency meter and a control computer. The gas passing pipe is connected with the magnetic valve, the thermostatic chamber and the micro-compressor successively. The magnetic valve is connected with the filter. The sensor array is arranged in the thermostatic chamber. The sensor array is connected with the frequency meter through a wire. The frequency meter is connected with the control computer. The polymer piezoelectric gas sensor system can detect complex gases, and is advantaged by small size, low power consumption, strong applicability for detecting different gases and good selectivity. By utilizing the electron beam scattering method, thin polymer films are deposited on a quartz wafer, and the thickness of thin films and the uniformity of surfaces of the thin films can be controlled accurately. The system has advantages of simple and rapid operations and wide applicability, detections are qualitative but not quantitative, and the system is suitable for large-scale primary screening.
Owner:谷宇
Method for reducing proximity effects in electron beam lithography
InactiveUS20050263722A1Reduce proximity effectReduce energy depositedMaterial analysis using wave/particle radiationElectric discharge tubesResistVery Energetic
An electric field is applied below a resist to reduce proximity effects associated with electron beam scattering, thereby improving the resolution of features or lines written into the resist. Although the electrons in the electron beam can be very energetic (e.g., >>10 keV), it is shown that even a small electric field can reduce the number of electrons that re-enter the resist material after being scattered in the substrate, and thus reduce the energy deposited in the resist from these electrons. One advantage of this technique is that high potentials and high fields are not required. Accordingly, the methods described can be applied to existing tooling with little modification to the electron beam system.
Owner:GLOBALFOUNDRIES INC
Multiplexing readout scheme for a gamma ray detector
A method and apparatus for producing a PET image of a tissue using a PET scanner that includes scintillation crystals and detectors. A first crystal group including a first subset of crystals is formed, and a second crystal group including a second subset of the crystals is formed. The crystals in the first crystal group are different from crystals in the second crystal group A first beam striking one or more crystals of the first crystal group is converted to a first electrical signal, while a second beam striking one or more crystals of the second crystal group is converted to a second electrical signal, wherein the second beam is scattered from the first beam. The second electrical signal is corrected using a correction factor derived from at least one of a first and second timing relationships to compensate for energy in the second signal scattered from the first signal. An image of the tissue is created using the corrected second electrical signal.
Owner:GENERAL ELECTRIC CO
Hologram recording/reproducing device, hologram recording/reproducing method, and hologram recording medium
InactiveUS20090279153A1Avoid mistakesRecord information storageRecording/reproducing/erasing using optical interference patternsSpatial light modulatorLight beam
The hologram recording / reproducing apparatus is for recording a hologram by emitting a recording beam (S) modulated by a spatial light modulator and a reference beam (R) having a same wavelength as the recording beam onto a hologram recording medium (B) so that the beams overlap each other with polarization direction (p) of the beams being matched to interfere with each other, and for reproducing the hologram by exposing the hologram recording medium storing the hologram to the reference beam to generate diffracted light and receiving the diffracted light by an imaging device. The spatial light modulator is controlled so as to form a data area (H0) corresponding to information to be recorded and a plurality of mark areas (H1) for detecting a position of the data area in the hologram recording medium (B) in recording of the hologram. The mark areas (H1) are formed at positions not to be overlapped by a beam scattering region which may be generated along a polarizing direction (p) of the reference beam on an outward side of the data area (H0).
Owner:FUJITSU LTD
Beam scattering laser monitor
ActiveUS20130016358A1Lower Level RequirementsHigh measurement sensitivityTelevision system detailsPhotometryRayleigh scatteringRayleigh Light Scattering
New systems for characterizing laser beams, using measurements performed on light which has been Rayleigh scattered from the beam. Different implementations are used for beam profiling, using images of the Rayleigh scattered light, and for laser beam power measurement, using the integrated Rayleigh scattered light. Both of these implementations can be applied to laser beams having high powers, since the measurements do not require insertion of any element into the beam itself, but rather depend on light scattered laterally from the passing beam. The measurements can thus be termed “non contact” measurements, in contrast to prior art methods which require an element inserted into the beam. The systems use Rayleigh scattering from the laser beam passing through ambient air, such that no special scattering chambers or liquids are required for the measurements. Special cancellation algorithms or filters are used to discriminate from light arising from scattering from dust particles.
Owner:OPHIR OPTRONICS SOLUTIONS
Apparatus and method of applying small-angle electron scattering to characterize nanostructures on opaque substrate
ActiveUS20150340201A1Sufficient angular resolutionReduce incidenceMaterial analysis using wave/particle radiationElectric discharge tubesProjection opticsElectron source
An apparatus and methods for small-angle electron beam scattering measurements in a reflection or a backscattering mode are provided. The apparatus includes an electron source, electron collimation optics before a sample, electron projection optics after the sample, a sample stage capable of holding the sample, and a electron detector module. The electrons emitted from the source are collimated and positioned to impinge nanostructures on the sample. The signals resulting from the interactions between the impinging electrons and the nanostructures are further magnified by the electron projection optics to reach a sufficient angular resolution before recorded by the electron detector module.
Owner:IND TECH RES INST
Laser machining apparatus
ActiveUS20140238961A1Shorten the timeReliable preventionTurbinesMetal working apparatusLaser processingLaser Nozzle
A laser machining apparatus includes a laser nozzle for supplying an assistive gas to remove undesirable materials and applying a laser beam at an angle, which is inclined with respect to a surface of a workpiece, a sputter blocking jig disposed over a region of the workpiece that is irradiated with the laser beam, so as to lie across directions in which the laser beam is scattered, and for blocking sputtered particles that are generated from the surface by the applied laser beam, and a joint connecting the laser nozzle and the sputter blocking jig to each other. The joint moves the laser nozzle and the sputter blocking jig in synchronism with each other.
Owner:HONDA MOTOR CO LTD
High thermal conductivity carbon fiber cloth and preparation method thereof
InactiveCN107022903ASolve the problems of low heat dissipation and poor reliabilityImprove performanceTextiles and paperEpoxy resin coatingsFiberThermal energy
The invention provides a high thermal conductivity carbon fiber cloth, which comprises a carbon fiber cloth and an attachment evenly distributed on the carbon fiber cloth. The attachment is a high thermal conductivity mixture, and includes micro-nano ceramic powder, a curing agent and adhesive resin, wherein, the weight percentage of the micro-nano ceramic powder is 20-50%, the weight percentage of the curing agent is 10-40%, and the weight percentage of adhesive resin is 30-60%. The high thermal conductivity carbon fiber cloth provided by the invention utilizes high thermal conductivity carbon fiber adhesive resin to replace the traditional insulating gel system so as to greatly increase the thermal conductivity between carbon fiber beams, if carbon fiber beam scattering, fracture and other phenomena occur, thermal energy can also be transmitted to other carbon fiber beams through the high thermal conductivity adhesive resin between carbon fiber, thus improving the heat conductivity coefficient, and also ensuring the directional properties of heat transfer. Therefore, the problems of low integral heat dissipation and poor reliability of carbon fiber cloth serving as a thermal conductivity product in the prior art can be solved.
Owner:倪进焕
Radiation-monitoring system with correlated hodoscopes
InactiveUS9268043B2Independence of effectAvoid necessityNuclear energy generationNuclear monitoringHodoscopeStatistical correlation
At least one pair of hodoscope radiation monitors arranged to simultaneously monitor a target region that contains a source of radiation. The hodoscopes are preferably arranged so that their fields of view of the region are approximately orthogonal. The fields of view of the two detectors will overlap in a region that contains the source of radiation. Each of the two detectors will record radiation from the overlap region and, in addition, will record background radiation emanating from other regions within detector fields of view. The present invention provides statistical correlation techniques to estimate the extent to which unusually high radiation originates in the overlap region, irrespective of background in the field-of-view of individual hodoscope detectors. The source of radiation might be spontaneous, might be from an activation process, or might be scattered in from an external beam.
Owner:DEVOLPI ALEXANDER
Reflecting-type blue laser lighting assembly
ActiveCN109703120AEfficient light outputImprove practicalityElectric lightingSpectral modifiersSlurryBeam scattering
A reflecting-type blue laser lighting assembly relates to the technical field of lighting. The lighting assembly has a multilayer structure and includes, successively from bottom to top, a luminescentlayer, a substrate, a light beam scattering layer, and a high-reflecting aluminum plate. The luminescent layer, the substrate, the light beam scattering layer and the high-reflecting aluminum plate are tightly connected in a sintering manner. The luminescent layer is a glassy state substance containing fluorescent powder. The substrate is alumina, zinc oxide or quartz, of which the surface is coated with a film. The light beam scattering layer is a glassy state substance having micropores, which is composed of low-melting point glass powder and hollow alumina. The ratio of thicknesses of thelight beam scattering layer, the substrate and the luminescent layer is (1:10:1) - (2:5:2). The wavelength range of the blue laser is 420 to 480 nm. The surface, coated with the light beam scatteringlayer slurry, of the substrate is placed above the high-reflecting aluminum plate.
Owner:XIAMEN UNIV
Polygonal partially coherent vortex beam generation system and method
ActiveCN113504656AThe production is simple and convenientIncreased freedom of controlOptical elementsSpatial light modulatorHigh energy
The invention relates to the technical field of optics, and discloses a polygonal partially coherent vortex beam generation system and method. The polygonal partially coherent vortex beam generation system comprises a computer, and a laser, a collimating and beam expanding element, a first lens, a beam scattering element, a second lens, a Gaussian filter, a spatial light modulator and a third lens which are arranged along a light path; the spatial light modulator is connected with the computer, and the computer is used for loading the hologram of the abnormal power exponent vortex beam to the spatial light modulator. According to the invention, the geometric structure of the partially coherent vortex beam can be flexibly regulated and controlled in real time, and the polygonal partially coherent vortex beam can be simply and conveniently generated, so that the system and method has important application value in the field of particle manipulation. Furthermore, elliptic, triangular, quadrilateral and pentagram-shaped light intensity distribution can be realized by regulating and controlling the numerical values of the power exponent factor and the spiral factor. Compared with a traditional partially coherent vortex light beam, light intensity distribution of the polygonal partially coherent vortex beam has a high regulation freedom degree, and high energy is reserved.
Owner:SUZHOU UNIV
Apparatus and method of applying small-angle electron scattering to characterize nanostructures on opaque substrate
ActiveUS9390888B2Electric discharge tubesMaterial analysis using radiation diffractionProjection opticsElectron source
An apparatus and methods for small-angle electron beam scattering measurements in a reflection or a backscattering mode are provided. The apparatus includes an electron source, electron collimation optics before a sample, electron projection optics after the sample, a sample stage capable of holding the sample, and a electron detector module. The electrons emitted from the source are collimated and positioned to impinge nanostructures on the sample. The signals resulting from the interactions between the impinging electrons and the nanostructures are further magnified by the electron projection optics to reach a sufficient angular resolution before recorded by the electron detector module.
Owner:IND TECH RES INST
Particle detection via scattered light combined with incident light
PendingUS20210381948A1CouplingEnhanced couplingIndividual particle analysisPhotovoltaic detectorsPhotodetector
Particle detection systems and methods are disclosed. In one embodiment, a particle detection system comprises an incident beam light source that emits an incident beam, a particle interrogation zone disposed in the path of the incident beam, a photodetector disposed to detect the incident beam after passing through the particle interrogation zone, a pump beam light source for emitting a pump beam, the pump beam being targeted at the particle interrogation zone, wherein the incident beam, the pump beam, and photodetector are arranged such that the photodetector is configured to detect a combination of light from the incident beam, scattered light due to incident beam scattering in the particle interrogation zone, and scattered light due to pump beam scattering in the particle interrogation zone.
Owner:PARTICLE MEASURING SYST
Laser correlation type computer mouse walking maze competition scoring system
PendingCN111599032AThe detection process is fastAvoid missed detectionRegistering/indicating time of eventsTransmission systemsBeam scatteringDirectivity
The invention discloses a laser correlation type computer mouse walking maze competition scoring system, and belongs to the field of communication. The system comprises a starting point signal detection device placed at the starting point of the maze, an end point signal detection device placed at the end point of the maze, a signal receiving device for monitoring the starting point signal and theend point signal, and upper computer scoring software for processing the starting point signal and the end point signal. The starting point signal detection device comprises a starting point laser emission module and a starting point illuminance detection module which are oppositely arranged; the end point signal detection device comprises an end point laser emission module and an end point illuminance detection module which are oppositely arranged; a starting point signal and an end point signal are detected by adopting a principle that a computer mouse shields laser beams emitted by a laseremission module to cause illuminance change of an illuminance detection module. Laser beams emitted by the laser emitting module are high in directivity, interference generated by light beam scattering is avoided, and therefore the accuracy of the scoring system is improved. The illuminance sensing module is high in detection speed, and the response speed of the scoring system is increased.
Owner:TIANJIN POLYTECHNIC UNIV
Field emission device
ActiveUS20090058309A1Improve emission uniformityEfficient emissionsControl electrodesDischarge tube luminescnet screensField emission deviceGate insulator
Disclosed is a field emission device. The field emission device includes: an anode substrate including an anode electrode formed on a surface thereof and a fluorescent layer formed on the anode electrode; a cathode substrate disposed opposite to and spaced apart from the anode substrate, and including at least one cathode electrode formed toward the anode substrate and a field emitter formed on each cathode electrode; and a gate substrate having one surface in contact with the cathode substrate, wherein the gate substrate include gate insulators surrounding the field emitters and having a plurality of openings exposing the field emitters, and a plurality of gate electrodes formed on the gate insulators around the openings and electrically isolated from one another. Thus, when the trajectories of the electron beams emitted from the emitters are rapidly changed over time by a voltage difference between the gate electrodes, an electron beam-scanned area can be expanded due to residual images and the electron beam can be more uniformly emitted due to an electron beam scattering effect and a linear beam spreading effect, resulting in improved emission uniformity of the fluorescent layer.
Owner:ELECTRONICS & TELECOMM RES INST
Manufacturing device of continuous energy spectrum electron source
The invention relates to a manufacturing device of a continuous energy spectrum electron source and belongs to the technical field of space utilization. The device is characterized in that an electron beam scattering film is applied under an electron gun; one side of the film is coated with an aluminum layer and the other side thereof is coated with a concentric silver ring Kapton film; during actual use, an aluminum disc equipped with the electron beam scattering film and the electron gun are mounted in a vacuum chamber; the aluminum disc is grounded by a wire; the vacuum chamber is vacuumized to 10-4Pa; the electron gun is turned on to emit a monoenorgetic electron beam; and after the monoenorgetic electron beam penetrates through the electron beam scattering film, an electron beam with a continuous energy spectrum is obtained. The device can simulate a space electron environment relatively truly, and is applicable to surface charge and discharge experiments of a satellite.
Owner:LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
Cancer cell detection using dielectrophoretic dynamic light scattering (DDLS) spectroscopy
Non-invasive apparatus and method for determining and monitoring glucose concentrations in human subjects. Glucose level is estimated through the effect of glucose on biological cells with glucose dependencies, e.g., red blood cells. The invention is based on the interaction of such cells with oscillating electric field gradients. The response of biological cells depends on factors including shape, size, and electrical charge distribution. The field gradient causes the cells to undergo characteristic motion which is detected by light beam scattering. The autocorrelation of the scattered light is computed, and the Fourier transform (FT) is performed to produce a characteristic velocity spectrum in which the peaks are characteristic of the cell “bio-electrical” states. The glucose level is estimated through measurements of changes of FT with changes in glucose levels after calibration with standard glucose methods.
Owner:HALAKA FOLIM G
Particle characterisation instrument
ActiveUS11112342B2Precise alignmentScattering properties measurementsParticle size analysisLight beamEngineering
Owner:MALVERN INSTRUMENTS
Method for reducing proximity effects in electron beam lithography
InactiveUS7038204B2Reduce proximity effectHigh electric fieldsMaterial analysis using wave/particle radiationElectric discharge tubesResistVery Energetic
Owner:GLOBALFOUNDRIES INC
Method for rendering sky based on atmospheric scattering theory and device thereof
Owner:BEIJING PIXEL SOFTWARE TECH
Vacuum environment beam energy online adjusting device
InactiveCN111741587ALarge adjustment rangeHigh adjustment accuracyAcceleratorsParticle acceleratorBeam energy
The invention relates to a vacuum environment beam energy online adjusting device which comprises an energy reduction vacuum chamber, a driving part and an energy reduction adjusting assembly. A beamcurrent pipeline is arranged on the energy-reducing vacuum chamber, the energy reduction adjusting assembly is connected with the driving part and comprises two energy reduction sheets which are matched with each other, and the energy-reducing sheets can be overlapped in the energy-reducing vacuum chamber to change the energy-reducing thickness so as to adjust the beam energy. The vacuum environment beam energy online adjusting device has the following beneficial effects that the beam energy of a particle accelerator can be adjusted on line by continuously adjusting the thicknesses of the energy-reducing sheets at the beam, the energy adjustment can be continuous, the adjustment range is large, the adjustment precision is high, and the structural design is simple; and the shape of the energy-reducing sheet is designed into a right triangle, and by adopting the installation manner that the hypotenuses of the two right triangles are opposite, the beam scattering is effectively reduced.
Owner:CHINA INSTITUTE OF ATOMIC ENERGY
Light source system
PendingCN113687569AReduce volumeAchieve the effect of dissipating spotsProjectorsLight beamScattering effect
Owner:APPOTRONICS CORP LTD
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