The invention relates to the field of film preparation, in particular to an arc
ion plating device which controls arc point movement by a rotary
magnetic field and is controlled by a rotary
transverse magnetic field with the multi-mode programmable modulation. The device is provided with a target material, a rotary
magnetic field generating device, an
electromagnetic coil, an insulating bush, a
flange, a
vacuum chamber and a matrix holder, wherein, the matrix holder and the target material are arranged inside the
vacuum chamber, the front face of the target material is opposite to the matrix holder, the back of the target material is provided with electromagnetic coils, the rotary
magnetic field generating device arranged outside the
vacuum chamber is sheathed on a
flange sleeve or an furnace body tube around the target material, and insulation is used for protection between the rotary magnetic field generating device and the
flange sleeve or the furnace body tube. By controlling the arc point movement by the rotary
transverse magnetic field with the multi-mode programmable modulation, the arc
ion plating device can improve the
discharge mode and the operating stability of the arc point, improve the
etching uniformity and the
utilization rate of the target material and reduce the
large particle emission of the target material. The arc
ion plating device is used for preparing high-quality films and functional films and expanding the application range of the arc
ion plating.