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53results about How to "Reduce electrostatic force" patented technology

Micro-oscillation element and array of micro-oscillation elements

A micro-oscillation element includes a base frame, an oscillating portion, and a link portion connecting the base frame and the oscillating portion to each other. The oscillating portion has a movable functional portion, a first driving electrode connected to the movable functional portion, and a weight portion joined to the first driving electrode. The link portion defines an axis of the oscillating motion of the oscillating portion. The second driving electrode, fixed to the base frame, generates driving force for the oscillating motion in cooperation with the first driving electrode.
Owner:FUJITSU LTD

Gating voltage control system and method for electrostatically actuating a micro-electromechanical device

A gating voltage control system and method are provided for electrostatically actuating a micro-electromechanical systems (MEMS) device, e.g., a MEMS switch. The device may comprise an electrostatically responsive actuator movable through a gap for actuating the device to a respective actuating condition corresponding to one of a first actuating condition (e.g., a closed switching condition) and a second actuating condition (e.g., an open switching condition). The gating voltage control system may comprise a drive circuit electrically coupled to a gate terminal of the device to apply a gating voltage. The gating voltage control system may further comprise a controller electrically coupled to the drive circuit to control the gating voltage applied to the gating terminal in accordance with a gating voltage control sequence. The gating voltage control sequence may comprise a first interval for ramping up the gating voltage to a voltage level for producing an electrostatic force sufficient to accelerate the actuator through a portion of the gap to be traversed by the actuator to reach a respective actuating condition. The gating voltage control sequence may further comprise a second interval for ramping down the gating voltage to a level sufficient to reduce the electrostatic force acting on the movable actuator. This allows reducing the amount of force at which the actuator engages a contact for establishing the first actuating condition, or avoiding an overshoot position of the actuator while reaching the second actuating condition.
Owner:GENERAL ELECTRIC CO

Powder removal method of 3DP printed thin-walled porous metal blank

The invention relates to the technical field of porous metal material and 3D printing, in particular to a powder removal method of a 3DP printed thin-walled porous metal blank. The method comprises the following steps of firstly, selecting metal powder required for molding, spraying a bonding agent to the metal powder and manufacturing a printing blank through the 3DP method; secondly, putting theprinting blank to be subjected to powder removal in a drying box to be heated for 1-2 h and then putting the printing blank into an ultrasonic cleaning machine containing an anhydrous ethanol solution to conduct ultrasonic powder removal; and thirdly, putting the printing blank subjected to powder removal into the drying box again to conduct heating treatment and then obtain the thin-walled porous metal blank with the structural integrity. Through the powder removal method, the powder of the porous printing blank with the low strength can be removed. The powder removal method has the characteristics that powder removal operation is easy, the cost is low, and the method is energy-saving and environment-friendly. The method can be adopted to conduct powder removal on 3DP printed thin-walledporous metal blanks in batch, can achieve the powder removal mechanization and provides a guarantee for mass production of 3DP parts.
Owner:NANTONG INST OF TECH +1

Glass substrate packing paper static electricity elimination and grabbing device and method

The invention discloses a glass substrate packing paper static electricity elimination and grabbing device and method. The device comprises a mechanical arm and a mechanical hand mounted on the mechanical arm. The mechanical hand is controlled by the mechanical arm to rotate and move in the space. The mechanical hand is fixedly connected with a mechanical arm beam. One side of the mechanical arm beam is provided with an air pipe. A plurality of blowing nozzles are arranged on the air pipe. The two ends of the mechanical arm beam are each provided with two grabbing arms arranged symmetrically.The grabbing arms can move relative to the mechanical arm beam. A grabbing wheel is fixed between the two grabbing arms on the same side of the two ends of the mechanical arm beam in the length direction of the mechanical arm beam. The grabbing wheel is fixedly connected with the corresponding grabbing arms. An air inlet of the air pipe is connected to an electrostatic wind source. According to the glass substrate packing paper static electricity elimination and grabbing device, the air pipe is fixed to the mechanical arm beam arranged on the mechanical arm; the multiple blowing nozzles are arranged on the air pipe; when a robot takes glass, the blowing nozzles blow electrostatic wind to the space between the glass and packing paper, electrostatic force between the glass and the packing paper is reduced instantly, the electrostatic force below the packing paper still exists, and accordingly, a glass substrate is conveyed smoothly and stably.
Owner:彩虹(合肥)液晶玻璃有限公司

Lunar dust protection conductive film with micro-nano structure and preparation method thereof

The invention relates to the technical field of lunar dust protection, in particular to a lunar dust protection conductive film with a micro-nano structure and a preparation method thereof. The lunar dust protection conductive thin film comprises a metal substrate layer, a first-level micrometer structure layer and a second-level nanometer conductive filling layer, wherein the first-level micrometer structure layer with a rough surface is formed on the metal substrate layer through a reverse mold technology; and a conductive layer is coated on the first-level micrometer structure layer to form the second-level nanometer conductive filling layer. According to the invention, the surface energy between the protected surfaces is reduced through the first-level micrometer structure layer, so that the Van der Waals force between the lunar dust and the protected surfaces is reduced; according to the lunar dust protection conductive film, the conductive characteristic of the protection film is improved by constructing the second-level nanometer conductive filling layer, so that the electrostatic force between lunar dust and a protected surface is reduced, and a good lunar dust protection effect is achieved by reducing Van der Waals force and the electrostatic force between the lunar dust and the protected surface at the same time.
Owner:LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH

Pole plate structure, electrostatic driving structure using the pole plate structure and manufacturing method thereof

The invention relates to a polar plate structure, an electrostatic driving structure utilizing the polar plate structure and a manufacturing method thereof. One side of the polar plate structure is provided with at least one damping hole which passes through the polar plate structure from top to bottom, wherein the upper opening area or the lower opening area of the damping hole is larger than the area of the side opening. The damping hole is capable of being easily prepared by utilizing the prior art level. At the same moment, when the polar plate structure of the damping hole is used as a movable part of the surface and when relative motions of the movable part occur, the air between the two movable parts is no longer compressed due to confinement, but enters the damping hole through an air inlet with smaller area, and is released rapidly through the upper opening with larger area or the lower opening with larger area, so that damping forces are reduced. Because the side opening area of the damping hole is smaller, the damaged area of the polar plate area is not too large, the static electricity is not obviously reduced, and a larger electrostatic force ratio or a larger damping force ratio is obtained by utilizing the electrostatic driving structure of the polar plate structure.
Owner:SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI

Organosilicone additive for inhibiting coating pigment reunion and settlement

The invention discloses an organosilicon additive for inhabiting coating pigment reunion and settlement and relates to the technical field of organosilicone materials. The organosilicone additive is prepared from, by weight, 10-15 parts of emulsified silicone oil, 6-11 parts of polyvinyl butyral, 4-8 parts of modified chlorinated paraffin, 3-6 parts of C5 petroleum resin, 2-4 parts of active magnesium oxide, 2-4 parts of tricetyl phosphate, 1-2 parts of microcrystalline wax, 1-2 parts of sulfated castor oil, 1-2 parts of vulcanized lard oil, 1-2 parts of 2-methyl cyclopentanone, 1-2 parts of dimethyl phosphate, 0.5-1 part of zinc dihydrogen phosphate, 0.5-1 part of edetic acid, 0.5-1 part of cyclopropylmagnesium bromide and 0.5-1 part of sodium tripolyphosphate. The organosilicone additive is short in preparation period and low in cost, uniform dispersion of pigments is facilitated by synergistic effect of raw materials through strictly controlled temperature rising and dropping speed and feeding sequence, and reunion and settlement of the pigments are prevented.
Owner:DONGZHI OASIS ENVIRONMENTAL PROTECTION CHEM

A kind of preparation method of TB ultrafiltration membrane, the treatment method of oily waste water

The invention provides a preparation method of TB ultrafiltration membrane and a treatment method of oily wastewater. Compared with the prior art, the present invention reacts TB with dimethyl sulfate to obtain methylated TB, and then uses hydrogen to oxidize After sodium hydrolysis and ring opening, it is mixed with N-methylpyrrolidone and ethylene glycol monomethyl ether according to a certain ratio to form a casting solution to prepare a TB ultrafiltration membrane. The addition of EGM to the coating solution affects the phase separation thermodynamics and mass transfer kinetics of the casting solution membrane system, further improving the hydrophilicity of the membrane. The hydrophilic surface of the prepared base ultrafiltration membrane can combine water molecules to form an ordered water layer, thereby effectively reducing the electrostatic force between the membrane surface and protein molecules; at the same time, the polymer conformation will not change when the protein contacts the membrane surface, so Significantly reduced protein adsorption. It also has a very high interception rate for emulsified oil wastewater, which can reach 98.55%-99.64%, and has a good application prospect.
Owner:ANHUI POLYTECHNIC UNIV

Dimethyl silicon acid dihalogen propyl ester compound serving as flame resistant plastifier and preparation method of dimethyl silicon acid dihalogen propyl ester compound

The invention relates to a dimethyl silicon acid dihalogen propyl ester compound serving as a flame resistant plastifier anda preparation method of the dimethyl silicon acid dihalogen propyl ester compound. The structure of the compound is shown in the formula, wherein ClXC3H5O is CH2ClCHXCH2O or (CH2Cl)(CH2X)CHO,X=Cl or Br. The preparation method comprises the following steps: dissolving dimethyl dihalogen silicon alkane in an organic solvent, adding epoxy chloropropane of which the mol is 2-3 times of that of the dimethyl dihalogen silicon alkane, performing temperature rise to enable the temperature to be 70-110 DEG C, performing a heat preservation reaction for 5-13 hours, and performing purification so as to obtain the dimethyl silicon acid dihalogen propyl ester. The dimethyl silicon acid dihalogen propyl ester disclosed by the invention is high in flame resistant efficacy, is good in plasticity, and is suitable for being used as a flame resistant plastifier of a polyvinyl chloride, polyurethane, an epoxy resin, an unsaturated resin and the like. The production technology is simple, the cost is low, and the industrialized production is easy to realize.
Owner:HUZHOU RUIGAO NEW MATERIALS CO LTD

Micromechanical sensor and method for producing a micromechanical sensor

A micromechanical sensor (100) is provided. The surface-micromechanically manufactured micromechanical sensor (100) includes at least one mass element formed in a third functional layer (60) and configured in a non-perforated manner at least in certain portions. A gap (S) below the mass element is formed by removal of a second functional layer (30) and at least one oxide layer (20). The removal of the at least one oxide layer (20) takes place by introducing a gaseous etching medium into a defined number of etching channels arranged substantially parallel to one another. The etching channels are configured to be connected to a vertical access channel in the third functional layer (60).
Owner:ROBERT BOSCH GMBH
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