Mask box with electrostatic damage resistance and processing method thereof

An antistatic and masking technology, which is applied in the field of mask box with antistatic damage ability and its processing field, can solve problems such as insurmountable defects

Pending Publication Date: 2022-04-12
GUDENG PRECISION IND CO LTD
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Obviously, grounding the base 112 still cannot overcome all static-generated defects

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask box with electrostatic damage resistance and processing method thereof
  • Mask box with electrostatic damage resistance and processing method thereof
  • Mask box with electrostatic damage resistance and processing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0073] The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which certain exemplary embodiments are shown by way of illustration. However, claimed subject matter may be embodied in many different forms, and thus constructions of covered or claimed subject matter are not limited to any example embodiments disclosed in this specification; the example embodiments are merely illustrations. Likewise, the invention resides in providing a reasonably broad scope for claimed subject matter as claimed or covered.

[0074] The use of the phrase "in one embodiment" in this specification does not necessarily refer to the same embodiment, and the use of "in other (some / certain) embodiments" in this specification does not necessarily refer to different embodiments. It is intended, for example, that claimed subject matter includes combinations of all or some of the exemplified embodiments.

[0075] Figure 4 An exploded view illu...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a mask box with an anti-static damage function and a processing method thereof. The mask box comprises a base and a plurality of supporting elements, the base is provided with a bearing face, a groove is formed in the bearing face, and the groove is provided with a bottom face. The supporting element surrounds the bearing surface of the base and is configured to support a mask. The groove has a depth extending between the bearing surface and the bottom surface, and the depth is between 300 [mu] m and 3400 [mu] m, thereby weakening the electrostatic force borne by the particles on the bearing surface. By controlling the processing depth of the groove in the base of the mask box or the distance between the bottom surface of the groove and the downward surface of the mask, the influence of residual voltage of the mask on particles on the surface of the base can be effectively weakened, so that the particles are prevented from being attracted to the downward surface of the mask, and a pattern area is prevented from being polluted.

Description

technical field [0001] The invention relates to a mask box and its processing method, in particular to a mask box with anti-static damage capability and its processing method. Background technique [0002] In the current extreme ultraviolet (EUV) process, the masks involved need to be protected by a dedicated EUV mask box. figure 1 A mask box for accommodating the EUV mask is shown, which has an inner layer and an outer layer accommodating space defined by an outer box 100 and an inner box 110 . The outer box 100 includes a box cover 101 and a base 102 , which together define an accommodating space for accommodating the inner box 110 . The inner box 110 includes a box cover 111 and a base 112 , which are combined by special means to define an accommodating space with a sealing effect for accommodating a mask 120 . [0003] Specifically, when the mask 120 is housed in the inner box 110, the edge or bottom of the mask 120 is supported by a plurality of supporting elements 11...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B25H3/02
CPCG08C17/02H01L21/67389H01L21/67393H01L21/67363G03F7/7075G03F7/7085G03F7/70866G03F1/66G03F7/70975H01L21/6735H01L21/67242H01L21/67396H01L21/67359G03F7/70741H01L21/67369H01L21/67383H05K5/0034H05K5/0208
Inventor 邱铭乾庄家和李怡萱温星闵薛新民林韵孜
Owner GUDENG PRECISION IND CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap