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317results about How to "Increase the restrictive effect" patented technology

Light emitting diode and semiconductor laser

An ultraviolet-light-emitting semiconductor diode comprising an n-type ZnO layer with luminous characteristics formed on a transparent substrate, and a p-type semiconductor layer selected from the group consisting of SrCu2O2, CuAlO2 and CuGaO2, which is formed on the n-type ZnO layer to provide a p-n junction therebetween. The transparent substrate is preferably a single crystal substrate having atomically flat yttria-stabilized zirconia (YSZ) (III) surface. The n-type ZnO layer is formed on the transparent substrate having a temperature of 200 to 1200° C., and the p-type semiconductor layer selected from the group of SrCu2O2, CuAlO2 and CuGaO2 is formed on the n-type ZnO layer. The n-type ZnO layer may be formed without heating the substrate, and then the surface of the ZnO layer may be irradiated with ultraviolet light to promote crystallization therein.
Owner:HOYA CORP

Coupling structure with silicon nanowire waveguide and fiber and manufacturing method thereof

The invention discloses a coupling structure with a silicon nanowire waveguide and a fiber and a manufacturing method thereof. The coupling structure comprises a first silicon dioxide waveguide beingan input waveguide, a tapered silicon dioxide waveguide, a second silicon dioxide waveguide, a silicon dioxide flat-panel structure, a tapered silicon waveguide, and a silicon output waveguide. One side of the tapered silicon dioxide waveguide is connected with the first silicon dioxide waveguide and the dimension of the cross section is reduced gradually along the light transmission direction; the second silicon dioxide waveguide is connected with the other side of the tapered silicon waveguide and the dimension of the cross section of the second silicon dioxide waveguide is smaller than thatof the first silicon dioxide waveguide; the silicon dioxide flat-panel structure is connected with the second silicon dioxide waveguide; the tapered silicon waveguide coated by the second silicon dioxide waveguide is arranged at a symmetric axis of the second silicon dioxide waveguide and has the cross section with the dimension extending gradually along the light transmission direction; and thesilicon output waveguide coated by the silicon dioxide flat-panel structure is arranged at a symmetric axis of the silicon dioxide flat-panel structure and is connected with the tapered silicon waveguide. The simple coupling structure is designed to be convenient and is manufactured easily with low cost; and large-scale production and application of the coupling structure can be realized easily.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Structure for repairing urban bituminous pavements and construction method thereof

The invention belongs to the technical field of urban bituminous pavement repairing, and discloses a structure for repairing urban bituminous pavements and a construction method thereof. The structure comprises a bituminous pavement layer, a base layer, an upper layer high-strength geogrid, a geocell reinforcement layer filled with old bituminous pavement mixed aggregates, a lower layer high-strength geogrid, a waterproof layer and roadbed from top to bottom. According to the structure for repairing urban bituminous pavements and the construction method thereof, prior old bituminous pavement materials are fully used, and cross impacts of rainfall and ground water on the roadbed and the bituminous pavement are segregated effectively. Simultaneously, by means of a combined reinforcement structure of the upper layer and the lower layer high-strength geogrids and the geocell reinforcement layer, the anti-deformation capacity of the bituminous pavement structure can be improved effectively, cracking and deformation of the bituminous pavement structure are restricted, and the service life of the bituminous pavement is increased. Particularly, when local bad foundation exists in the roadbed, the 'girder effect' formed by the combined reinforcement structure can effectively transmit loads on the local bad foundation to around foundation, and secondary damages to a novel paved bituminous pavement structure are avoided.
Owner:HUAZHONG UNIV OF SCI & TECH +1

Surface acoustic wave resonator, surface acoustic wave oscillator, and surface acoustic wave module device

A surface acoustic wave resonator includes a piezoelectric substrate and an interdigital transducer (IDT) that includes electrode fingers exciting a surface acoustic wave on the piezoelectric substrate, a first region at a center of the IDT, and a second region and a third region at opposite sides of the IDT. In the IDT, a line occupation rate at which an electromechanical coupling coefficient becomes a maximum is different from the line occupation rate at which reflection of the surface acoustic wave becomes a maximum.
Owner:SEIKO EPSON CORP

Epitaxial structure of a light emitting diode and its manufacturing method

The invention discloses an epitaxial structure of a light-emitting diode and a manufacturing method thereof. On a GaAs substrate layer, there are a Bragg reflection layer, a first-type confinement layer, an active layer, a second-type confinement layer, and a current spreading layer in sequence from bottom to top. , the active layer is composed of n sets of quantum wells and quantum barriers alternately, where 100≥n≥2, and the barrier height in the same quantum barrier is a gradual distribution or the barrier height between different quantum barriers It is a gradual distribution; its manufacturing method includes the following steps: select GaAs as the substrate layer, and grow a Bragg reflection layer, a first-type confinement layer, an active layer, a second-type confinement layer, and a current spreading layer sequentially on the GaAs substrate layer, wherein The active layer is formed by alternately growing n groups of quantum wells and quantum barriers, and the quantum barriers are made of (AlxGa1-x)yIn1-yP group III and V compounds, where 1≥x≥0.5, and the invention enhances the quantum barrier’s effect on electrons The confinement effect increases the recombination rate of electrons and holes in the quantum well, thereby increasing the brightness of the light-emitting diode.
Owner:XIAMEN CHANGELIGHT CO LTD

Foot rest and footrest device with foot rest for car driver

The invention provides a foot rest and a footrest device with the foot rest for a car driver, belongs to the technical field of parts of cars, and aims at solving the problem of the existing foot rest assembly that the non-slip surface provided is small in friction coefficients, the feet of the driver easily forwards slip from the surface of the foot rest. The footrest device with the foot rest for the car driver comprises a base plate and the foot rest; the base plate is arranged on a car carpet that is opposite to the feet of the driver by position; the foot rest comprises a foot rest body that is equipped with the upper end surface; small elastic bulges of different shapes are closely distributed on the upper end surface of the foot rest body; the foot rest covers the base plate and is fixedly connected with the base plate. According to the foot rest and the footrest device with the foot rest for the car driver, the structure of the foot rest surface in the footrest device of the driver is changed, the friction coefficients and contact action area of the soles and the surface of the foot rest are increased, thus the forward motion speed of the feet of a passenger is limited, the crura are stably and uniformly supported, and meanwhile, the comfort of feet in laying is also improved.
Owner:ZHEJIANG GEELY HLDG GRP CO LTD +1

GaN-based laser with asymmetric Al component AlGaN limiting layers

A GaN-based laser with asymmetric Al component AlGaN limiting layers comprises a GaN native substrate, an n-type GaN homoepitaxial layer, the n-type AlGaN limiting layer, an n-type GaN waveguide layer, an InGaN / lGaN quantum well active region, a p-type AlGaN electron blocking layer, a p-type GaN waveguide layer, the p-type AlGaN limiting layer, a p-type doped / p-type heavily-doped contact layer, a p-type ohmic electrode and an n-type ohmic electrode. The n-type GaN homoepitaxial layer is manufactured on the GaN native substrate, the n-type AlGaN limiting layer is manufactured on the n-type GaN homoepitaxial layer, the n-type GaN waveguide layer is manufactured on the n-type AlGaN limiting layer, the InGaN / lGaN quantum well active region is manufactured on the n-type GaN waveguide layer, the p-type AlGaN electron blocking layer is manufactured on the InGaN / lGaN quantum well active region, the p-type GaN waveguide layer is manufactured on the p-type AlGaN electron blocking layer, the p-type AlGaN limiting layer is manufactured on the p-type GaN waveguide layer, a protruding ridge is formed in the middle of the p-type AlGaN limiting layer, the p-type doped / p-type heavily-doped contact layer is manufactured on the protruding ridge of the p-type AlGaN limiting layer, the p-type ohmic electrode is manufactured on the p-type doped / p-type heavily-doped contact layer, and the n-type ohmic electrode is manufactured on the lower surface of the GaN native substrate.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

P type LED epitaxy structure, growing method and LED display device

The invention discloses a P type LED epitaxy structure, a growing method and an LED display device. The P type LED epitaxy structure comprises a sapphire substrate, a low-temperature gallium nitride buffer layer, a non-doped gallium nitride layer, an n type gallium nitride layer, a first barrier layer, a shallow quantum well layer, a multiple quantum well layer, an electronic barrier layer, a highly doped P type gallium nitride layer and a contact layer from top to bottom. The highly doped P type gallium nitride layer further comprises a first P type gallium nitride layer and a second P type gallium nitride layer, and the first P type gallium nitride layer and the second P type gallium nitride layer grow by respectively adopting different carrier gases. According to the P type LED epitaxy structure, the growing method and the LED display device, P-GaN of different crystal quality can be obtained, the electron limiting capability of P-GaN is enhanced, hole injection is improved, electron injection is slowed down, the polarization effect is restrained, a current is expanded, the impact to GaN-based LEDs caused by static electricity is relieved, and accordingly the anti-static capability of an epitaxial wafer is improved.
Owner:XIANGNENG HUALEI OPTOELECTRONICS

LED epitaxial wafer and forming method thereof

ActiveCN103915534AEnhanced Electronic Limitation CapabilitiesIncrease hole injectionSemiconductor devicesPhysicsBlock layer
The invention proposes an LED epitaxial wafer and a forming method thereof. The forming method comprises a first step of providing a substrate and forming a buffer layer on the substrate; a second step of forming a semiconductor material layer of a first doping type on the buffer layer; a third step of forming a quantum well structure on the semiconductor material layer of the first doping type; a fourth step of forming an electron blocking layer on the quantum well structure; and a fifth step of forming a semiconductor material layer of a second doping type on the electron blocking layer. The fourth step comprises forming a first AlxGa1-xN layer on the quantum well structure, and forming a second AlxGa1-xN layer on the first AlxGa1-xN layer. In the formation of the first AlxGa1-xN layer, a component x of an Al is gradually changed from a first component value to a component value, and the second component value is larger than the first component value. In the formation of the second AlxGa1-xN layer, a component x of an Al is constant. The LED epitaxial wafer and the forming method thereof can improve the internal quantum efficiency of LED chips, promote the light-emitting efficiency of the epitaxial wafer, and are suitable for the needs of high-power epitaxial wafers.
Owner:广东比亚迪节能科技有限公司

Nuclear shell nickel-cobalt-manganese ternary sulfide hollow spherical electrode material and preparation method thereof

The invention discloses a nuclear shell nickel-cobalt-manganese ternary sulfide hollow spherical electrode material and a preparation method thereof, and belongs to the technical field of functional material preparation. According to the preparation method, isopropanol and polyhydric alcohols serve as a mixed solvent, and a solid spherical nickel-cobalt-manganese precursor compound is prepared through a solvothermal method; then, through vulcanization reaction, the solid spherical nickel-cobalt-manganese precursor compound is converted into the nuclear shell nickel-cobalt-manganese ternary sulfide hollow spherical material. The nuclear shell nickel-cobalt-manganese ternary sulfide hollow spherical material prepared through the preparation method is regular and uniform in shape and appearance and has large specific surface area, transmission and diffusion of ions and electrons are promoted, the effective contact area of electrolyte and the electrode material is enlarged, and many activesites are provided for electrochemical redox reaction; meanwhile, a nuclear shell hollow structure can effectively relieve volume expansion of the electrode material during charging and discharging,and therefore the electrochemical performance of the material is improved. The nuclear shell nickel-cobalt-manganese ternary sulfide hollow spherical electrode material has good electrochemical energystorage performance when serving as an electrode material to be applied to a supercapacitor.
Owner:ANYANG NORMAL UNIV

Double-heterojunction gallium nitride based HEMT (High Electron Mobility Transistor) taking aluminum-gallium-nitrogen as high-resistance layer and manufacturing method thereof

The invention provides a double-heterojunction gallium nitride based HEMT (High Electron Mobility Transistor) taking aluminum-gallium-nitrogen as a high-resistance layer, comprising a substrate, a nucleating layer, an unintentionally-doped high-resistance layer, an unintentionally-doped high migration rate layer, an aluminum nitride inserting layer, an unintentionally-doped barrier layer and an unintentionally-doped gallium nitride or aluminum-gallium-nitrogen cap layer, wherein the nucleating layer is manufactured above the substrate and is 0.01-0.50 microns in thickness; the unintentionally-doped high-resistance layer is manufactured above the nucleating layer; the unintentionally-doped high migration rate layer is manufactured above the unintentionally-doped barrier layer; the aluminum nitride inserting layer is manufactured above the unintentionally-doped high migration rate layer and is 0.7-5 nm in thickness; the unintentionally-doped barrier layer is manufactured above the aluminum nitride inserting layer; and the unintentionally-doped gallium nitride or aluminum-gallium-nitrogen cap layer is manufactured above the unintentionally-doped barrier layer and is 1-5 nm in thickness. According to the double-heterojunction gallium nitride, the channel electron migration rate and the limiting capability to two-dimensional electronic gas are obviously improved; power leakage of the buffering layer is inhibited; and meanwhile, crystal lattice stress of the barrier layer is reduced, the defect density is reduced, and the stability and the reliability of the work of a device are improved.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Building waterproof construction equipment and construction method thereof

The invention relates to building waterproof construction equipment and a construction method thereof. The building waterproof construction equipment comprises a shell, a supporting plate, a moving assembly, an unwinding roller rotationally installed on the inner wall of the shell and a gluing assembly installed in the shell. A laying through hole is formed in the bottom wall of the shell in a penetrating mode, a fixing plate is fixed to the bottom wall of the shell, and a compaction assembly is installed on the fixing plate. The compaction assembly comprises an air cylinder fixed to the fixing plate, a U-shaped plate body fixed to the lower end of a piston rod of the air cylinder and a compaction roller rotationally installed between the two side walls of the U-shaped plate body, and a limiting assembly for preventing the compaction roller from rotating reversely is installed on the U-shaped plate body. According to the building waterproof construction equipment, the limiting assembly plays a good role in limiting reverse rotation of the compaction roller, the resistance of the shell moving in the direction opposite to the waterproof roll laying direction is increased, the probability that the laid waterproof roll tilts due to the fact that the shell is subjected to acting force in the reverse direction is reduced, and the laying quality of the waterproof coiled material and the waterproof effect of a building site are improved.
Owner:合肥国泓建设工程有限公司

Reversible ratchet wrench

InactiveUS20150135909A1Increase speedEnhance position limit effectSpannersWrenchesWrenchDeep hole
A novel reversible ratchet wrench may include a wrench body, a control member, a ratchet member and a rotating member, wherein the control member has a restricting slot and two stopper planes, and a deep hole for placing the spring. The control member is placed into the round hole of the wrench body by the half cylindrical body and connects with the ratchet member which is placed into the arc-shaped ratchet slot, thereby resulting in a secure relative positioning between the control member and the ratchet member. The novel reversible ratchet wrench allows convenient switch between directions of the rotational movement of the wrench body and the structural design effectively prevents the spring from ejecting from the deep hole of the control member or getting stuck by restricting the movement space of the spring. Furthermore, this structural design improves the smoothness of switching operation of the ratchet wrench.
Owner:CHEN WEI CHU
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