The invention discloses a production technology for a stainless steel
dot matrix friction plate and belongs to the technical field of optical chemical
etching. The production technology comprises the following working procedures of: designing a plate, wherein the
diameter of each round dot on the plate is 0.198mm; performing polish-
brush treatment on a stainless steel base plate in a large area manner; performing silk-screening on the surface of the base plate for the second time, and
drying photo-sensitive
resist; exposing a film substrate coated on a photo-sensitive
resist membrane layer of the base plate, wherein a light supplementation plate is arranged between a
light source of an
exposure machine and a base plate to be photo-sensed; developing, fixing and
drying the film substrate; baking and firming a membrane at high temperature; dangling the base plate to be etched upside down in the air,
etching the base plate through a lower
sprayer of an
etching machine, wherein etching liquid adopts liquid
ferric trichloride with 46 percent of
ferrous ions Fe<3+>; removing the membrane from the etched plate, and flushing and
drying the membrane. Furthermore, after the step of firming the membrane and before the step of etching the base plate, a protection
membrane layer is coated on the back of the base plate, so that the back of the plate is intact. The large-area stainless steel
dot matrix friction plate obtained by using the production technology disclosed by the invention is high array-round-dot uniformity consistency, single-
surface etching resistance, small
light intensity error, high etching speed and god benefits.