The invention discloses a batch preparation method of a suspended
nanowire manipulator. The method comprises the following steps: preparing a
nanowire array growing on the edge of a slope step definedby photoetching based on an IPSLS growth mode, then, spin-
coating a layer of
oxygen resin
colloid on the substrate on which the
silicon nanowires grow; carrying out photoetching pattern operation, removing an
amorphous silicon dielectric layer on the surface of the substrate by wet
etching, suspending an
epoxy resin
colloid thin film adhered to a
nanowire array on the surface of a solution, fullyreplacing the
epoxy resin
colloid thin film with
ethanol, and carrying out a
drying technology to prepare the self-assembled suspended nanowire
manipulator array. According to the invention, the
nanowire array is transferred to the photoetched self-supporting substrate by using a transfer technology and a
critical point drying technology; the influence of solution
surface tension is eliminated, the original appearance of the nanowire
manipulator is kept, finally, the operable suspended nanowire manipulator array is obtained, and the method can be widely applied to various fields of nano robots, biomedical
cell detection, biosensors and the like.