143 results about "Dram chip" patented technology

In a memory module including a plurality of DRAM chips which transmit/receive a system data signal with a predetermined data width and at a transfer rate and which transmit/receive an internal data signal having a larger data width and a lower transfer rate as compared with the system data signal, it has become clear that there is a restriction on the transfer rate of the system data signal and that speeding-up cannot be expected. A current consumption in a plurality of DRAMs constituting the memory module is large, and this is also a factor for hindering the speeding-up. There is obtained a memory module in which a plurality of DRAM chips are stacked on an IO chip and in which each DRAM chip is connected to the IO chip by a through electrode and which comprises a constitution for mutually converting the system data signal and the internal data signal in each DRAM chip by the IO chip. In this constitution, a wiring between the DRAM chips can be shortened, and DLL having a large current consumption may be disposed only on the IO chip.

A COC DRAM including a plurality of stacked DRAM chips is mounted on a motherboard by using an interposer. The interposer includes a Si unit and a PCB. The Si unit includes a Si substrate and an insulating-layer unit in which wiring is installed. The PCB includes a reference plane for the wiring in the Si unit. The wiring topology between a chip set and the COC DRAM is the same for every signal. Accordingly, a memory system enabling a high-speed operation, low power consumption, and large capacity is provided.

A buffer amplifier architecture for buffering signals which are supplied in parallel to identical chips, particularly DRAM chips, on a semiconductor memory module, is disclosed. The architecture has adjustable delay circuits in each signal line and a delay detector circuit which receives a clock signal from the buffer amplifier architecture at the input and at the output of the buffer amplifier architecture, and takes the phase difference between the two signals to produce a control signal for setting the variable delay time of the delay circuits. To ensure that the delay time set by the delay detector circuit is independent of variations in parameters of the DRAM memory chips, the feedback path routed to the input of the delay detector circuit has a reference line network of the same structure and having the same electrical properties as capacitance elements which terminate the line network routed to the DRAM memory chips and the reference line network, and which have the same capacitances as the signal inputs on the DRAM memory chips.

A memory module substrate printed-circuit board (PCB) has multi-type footprints and an edge connector for mating with a memory module socket on a motherboard. Two or more kinds of dynamic-random-access memory (DRAM) chips with different data I/O widths can be soldered to solder pads around the multi-type footprints. When ×4 DRAM chips with 4 data I/O pins are soldered over the multi-type footprints, the memory module has a rank-select signal that drives chip-select inputs to all DRAM chips. When ×8 DRAM chips with 8 data I/O pins are soldered over the multi-type footprints, the memory module has two rank-select signals. One rank-select drives chip-select inputs to front-side DRAM chips while the second rank-select drives chip-select inputs to back-side DRAM chips. Wiring traces on the PCB cross-over data nibbles between the solder pads and the connector to allow two ×4 chips to drive a byte driven by only one ×8 chip.

A new DRAM architecture, HPPC DRAM, is provided to support a high performance and low cost memory system. The HPPC DRAM has integrated the following concepts into a single DRAM chip. First, superset pin definitions backward-compatible to the traditional fast-page-mode DRAM SIMM. This allows one memory controller to support a memory system having both a traditional fast-page-mode DRAM and HPPC DRAM of this invention. Secondly, combining a memory array, a register of 4:1 Mux/Demux function, a RAS buffer/decoder, a CAS buffer/decoder, a burst address counter, a page register/comparator, a sequencer and a data buffer into a single DRAM IC chip. Using these intelligent peripheral circuits, the HPPC DRAM execute a pipeline cycle request and precharge cycle stealing. Thirdly, a precharge cycle stealing pipeline is implemented to the timing chain of read operation to eliminate the precharge cycle time which is achieved by executing read drive concurrently to the precharge cycle. This read timing chain shows that a zero wait state is sustained if there is a page-hit. Fourthly, a precharge cycle stealing pipeline is implemented to the timing chain of write operation to eliminate the precharge cycle time which is achieved by executing precharge cycle concurrently to address predecoding and data strobing.

A manufacturing method makes memory modules from partially-good DRAM chips soldered to its substrate. The partially-good DRAM chips have a number of defective memory cells that is below a test threshold, such as 10%. Packaged DRAM chips are optionally pre-screened and considered to pass when the number of defects found is less than the test threshold. A defect table is created during testing and written to a serial-presence-detect electrically-erasable read-only memory (SPD-EEPROM) on the memory module. The memory module is finally tested on a target-system tester that reads the defect table during booting, and redirects memory access to defective memory locations identified by the defect table. The memory modules may be burned in or tested at various temperatures and voltages to increase reliability.

The interposer is disposed on an upper surface of the stacked structure formed by stacking a plurality of a DRAM chip and a plurality of a flash memory chip. Thus down-size of an entire device is accomplished. A boost converter having an inductor is used as a voltage boost circuit. Thus down-size of the entire device is accomplished in comparison to a voltage boost circuit using a charge pump connected in parallel with a plurality of a capacitance.

An alternating phase shift mask with dark loops thereon, a memory array fabricated with the alternating phase shift mask, and a method of fabricating the memory. The dark loops in the mask always separate first regions with 180° phase difference from second regions with 0° phase difference to define active areas or gate-lines in a DRAM chip.

Error correction and error detection related to DRAM chip failures, particularly adapted server memory subsystems. The application of a code for 128 bit memories is applied to a 20 bit directory store to improve reliability of the directory store memory of the computer system. The code uses ×4 bit DRAM devices organized in a code word of 20 data bit words and 12 check bits. These 12 check bits provide a code capable of 4 bit adjacent error correction within a family (i.e., in a ×4 DRAM) and double bit non-adjacent error detection across the entire 20 bit word, with single bit correction across the word as well. Each device can be though of as a separate family of bits, errors occurring in more than one family are not correctable, but may be detected if only one bit in each of two families is in error. Syndrome generation and regeneration are used together with a specific large code word. Decoding the syndrome and checking it against the regenerated syndrome yield data sufficient for providing the features described.

Memory chips are tested by insertion into a chip test socket on a test adapter board that is mounted to the reverse or solder-side of a personal computer motherboard. A memory module socket is removed from the motherboard, and adapter pins are inserted into holes for the removed memory module socket, but from the reverse (solder) side of the motherboard. The adapter pins connect to the test adapter board either directly, through a connector plug, or through an intervening adapter board. The test adapter board has soldered onto it additional memory chips and buffer chips on a memory module, such as an Advanced Memory Buffer (AMB) for a fully-buffered memory module. The built-in-self-test (BIST) feature of the AMB may be used to test the memory chip under test in the chip test socket, or the processor on the motherboard may write and read the memory chip.

A memory system comprising memory modules including memory chips including integrated switching circuits. A memory controller coupled to the memory modules is configured to initiate memory accesses. When a switching circuit within a memory chip detects the memory access, the switching circuit routes the access to another memory module if the access is not directed to a memory chip of the receiving memory module, or processes the access locally if the access is directed to a memory chip of the receiving memory module. The memory controller and memory modules are coupled via bi-directional serial links. Each memory module may include multiple switching circuits, each of which may be coupled to fewer than all of the memory chips within the memory module. Switching circuits further include circuitry configured to de-serialize data prior to conveyance to a memory chip, and serialize data received from a DRAM chip prior to transmitting the received data.

A method of depositing a fluorinated borophosphosilicate glass (FBPSG) on a semiconductor device as either a final or interlayer dielectric film. Gaps having aspect ratios greater than 6:1 are filled with a substantially void-free FBPSG film at a temperature of about 480 DEG C. at sub-atmospheric pressures of about 200 Torr. Preferably, gaseous reactants used in the method comprise TEOS, FTES, TEPO and TEB with an ozone/oxygen mixture. Dopant concentrations of boron and phosphorus are sufficiently low such that surface crystallite defects and hygroscopicity are avoided. The as-deposited films at lower aspect ratio gaps are substantially void-free such that subsequent anneal of the film is not required. Films deposited into higher aspect ratio gaps are annealed at or below about 750 DEG C., well within the thermal budget for most DRAM, logic and merged logic-DRAM chips. The resultant FBPSG layer contains less than or equal to about 5.0 wt % boron, less than about 4.0 wt % phosphorus, and about 0.1 to 2.0 wt % fluorine.

In wafer semiconductor manufacture, a method of etching an arsenic doped polysilicon layer down to a patterned boro-phospho-silicate-glass (BPSG) layer provided with a plurality of openings with an uniform etch rate is disclosed. The method relies on a combination of both system and process improvements. The system improvement consists to hold the wafer in the reactor during the etch process with an electrostatic chuck device to have a perfect plasma environment around and above the wafer. On the other hand, the process improvement consists in the use of a non dopant sensitive and not selective chemistry. A NF3/CHF3/N2 gas mixture with a 11/8.6/80.4 ratio in percent is adequate in that respect. The etch time duration is very accurately controlled by an optical etch endpoint detection system adapted to detect the intensity signal transition of a CO line at the BPSG layer exposure. The process is continued by a slight overetching. When the above method is applied to the doped polysilicon strap formation in DRAM chips, excessive or insufficient etching of the polysilicon layer is avoided, so that the doped polysilicon strap thickness is thus much more uniform, opening to opening, within a wafer.