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186results about How to "Remove pollutants" patented technology

Gas phase contaminant removal with low pressure drop

A system is disclosed which incorporates low pressure drop contaminant removal from gas phases or streams, which advantageously can be used to enhance efficiency, improve humidity characteristics, and reduce capital cost of air handing systems such as HVAC systems and the like. Placement of the low pressure drop contaminant removal mechanism for enhancing effectiveness of same is also disclosed.
Owner:CARRIER CORP

Semiconductor substrate, method for manufacturing semiconductor substrate, semiconductor device, and electronic device

A single crystal semiconductor layer is formed over a substrate having an insulating surface by the following steps: forming an ion doped layer at a given depth from a surface of a single crystal semiconductor substrate; performing plasma treatment to the surface of the single crystal semiconductor substrate; forming an insulating layer on the single crystal semiconductor substrate to which the plasma treatment is performed; bonding the single crystal semiconductor substrate to the substrate having the insulating surface with an insulating layer interposed therebetween; and separating the single crystal semiconductor substrate using the ion doped layer as a separation surface. As a result, a semiconductor substrate in which a defect in an interface between the single crystal semiconductor layer and the insulating layer is reduced can be provided.
Owner:SEMICON ENERGY LAB CO LTD
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