The invention relates to an
arsenic-removing device and method for
gallium arsenide wafer production and
processing waste water and belongs to the technical field of waste
water treatment. The
arsenic-removing method comprises conveying
raw water to a primary
arsenic-removing tank, performing sequencing batch
flocculation and
sedimentation to remove arsenic, and enabling the basic process to comprise water inflow,
flocculation,
sedimentation and water outflow; enabling treated supernatant to enter a secondary arsenic-removing tank, first performing oxidation reactions, then performing sequencing batch
flocculation and
sedimentation to remove arsenic, and enabling the basic process to comprise water inflow, oxidation, flocculation, sedimentation and water outflow; first enabling the treated supernatant to flow into an intermediate tank, conveying the supernatant to a
sand filter through a three-level lift pump to perform gravity
filtration, enabling final outflow water to enter a
clean water pond after
filtration, and discharging the
effluent finally; utilizing a backflushing pump to perform back flush on the
sand filter at a fixed period, and taking backflushing water from the
clean water pond. The arsenic-removing device and the arsenic-removing method are high in arsenic-removing rate, enable concentration of arsenic in the outflow water to be controlled to be below 0.02mg / L, are easy to operate, run stably, and are suitable for treating the
gallium arsenide wafer production and
processing waste water and arsenic-containing waste water of related industries.