Method for removing arsenic from waste solution of etching PCB in order to produce feed additive of copper

A technology for feed additives and printed circuit boards, applied in chemical instruments and methods, improvement of process efficiency, water/sludge/sewage treatment, etc., to achieve the effects of small equipment investment, high arsenic removal rate, and low arsenic residue

Active Publication Date: 2008-02-20
SHENZHEN SHENTOU ENVIRONMENT TECH CO LTD
View PDF13 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a printed circuit board for the production of copper feed additives with simple and feasible process flow, convenient operation and high arsenic removal rate in view of the various problems existing in the above-mentioned various arsenic removal methods Method for removing arsenic from etching waste liquid

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Embodiment 1: Removal of arsenic from the arsenic-containing PCB etching waste liquid of an enterprise producing basic copper carbonate.

[0019] The following table 1 is the composition list of PCB etching waste liquid:

[0020]

name

ρ(g / mL)

Cu 2+

(g / L)

Total As

(mg / L)

Pb 2 +

(mg / L)

Cl -1

(mg / L)

Acid corrosion

Cutting solution

1.222

144.2

20.0

＜10

9.0

alkaline corrosion

Cutting solution

1.132

99.3

4.0

＜10

-

[0021] Table 1

[0022] The alkaline PCB etching waste liquid in Table 1 is used to adjust the acidity of the acidic PCB etching waste liquid.

[0023] to 7m 3 5.5m into the reactor 3 Acidic PCB etching waste liquid, start the stirring paddle, the stirring speed is 300r / min, slowly add the concentr...

Embodiment 2

[0027] Embodiment 2: Removal of arsenic and product quality from arsenic-containing PCB etching waste liquid of an enterprise producing basic copper chloride.

[0028] Please refer to the following table 3 for the composition of the acidic PCB etching waste liquid:

[0029]

name

ρ(g / mL)

Cu 2+ (g / L)

Total As

(mg / L)

Pb 2+ (mg / L)

Cl -1 (mg / L)

Acid corrosion

Cutting solution

1.300

150.0

18.0

＜10

10.1

[0030] table 3

[0031] Table 4 is a high-arsenic basic copper chloride quality analysis table, and the high-arsenic basic copper chloride in Table 4 is used to adjust the acidity of acidic PCB etching waste liquid to produce low-arsenic basic copper chloride.

[0032] copper hundred

Contains

quantity / %

not sour

dissolved matter

%

Al

As

Ca

CD...

Embodiment 3

[0038] Embodiment 3: Removal of arsenic and product quality from arsenic-containing PCB etching waste liquid of a copper sulfate production enterprise.

[0039] The low-arsenic basic copper chloride obtained in Example 2 was reacted with concentrated sulfuric acid to obtain a copper sulfate solution, and the solution was stirred and cooled, crystallized, and press-filtered to obtain copper sulfate pentahydrate. The product quality analysis results of copper sulfate pentahydrate are shown in Table 6:

[0040]

CuSO 4 ·5H 2 O%

Al

As

Ca

CD

co

Cr

Fe

Ni

Pb

Zn

mg / kg

98.5

＜

2

0.4

＜2

＜

2

3.8

1.5

14.1

＜

5

＜

5

＜

5

[0041] Table 6

[0042] Visible by table 6: the arsenic content of the copper sulfate pentahydrate t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

This invention discloses a method for removing arsenic from etching waste solution of printing circuit board (PCB) used for manufacturing copper feed additive. The method comprises: (1) adding oxidant or pumping air or oxygen to PCB etching waste solution under stirring, and oxidizing; (2) adjusting the pH value to 0.5-3.0; (3) adding KMnO4 solution at an amount of 0.8-5 kg KMnO4 / cu m PCB etching waste solution, stirring for 30-90 min until the color of the solution disappears, and filtering to obtain the filtrate. The method can remove arsenic from acidic and basic PCB etching waste solution or copper chloride hydroxide with high arsenic content. The method has such advantages as low energy consumption, simple process, easy control, high arsenic removing rate, and low equipment investment.

Description

technical field [0001] The invention relates to a method for removing arsenic from printed circuit board etching waste liquid used for producing copper feed additives. Background technique [0002] The arsenic in printed circuit board etching waste liquid (hereinafter referred to as "PCB etching waste liquid") mainly comes from the manufacture of copper-clad boards, and copper feed additives produced from PCB etching waste liquid, such as copper sulfate pentahydrate, basic chloride Copper and basic copper carbonate have strict requirements on arsenic, and the content requirements are less than 5ppm, 20ppm and 20ppm respectively. At present, the basic methods for removing arsenic from arsenic-containing solutions include chemical precipitation, functional polymer membrane, reverse osmosis, solvent extraction, ion exchange, flotation, biological methods, induced arsenic removal and adsorption co-precipitation. The respective shortcomings of these methods are as follows: [0...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C02F9/04C02F1/72C02F1/58C02F1/66C02F101/10
CPCY02P10/20
Inventor 陈志传宋传京毛谙章覃祚观吴瑞富
Owner SHENZHEN SHENTOU ENVIRONMENT TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap