663results about How to "Change properties" patented technology

A method for assembly of an eyewear and an eyewear structure are provided to incorporate preferred properties into the eyewear. A relatively less curved lens is encircled by a protruding rim element, thereby forming a lens unit which is removably attached to the eyewear structure. The protruding rim element has a much curved outer periphery thereof such that the relatively less curved lens can be assembled in a much curved frame structure.

Luminal endoprosthesis formed of a multi-layer braided framework. The framework is devoid of any cover layer, and formed of a plurality of stabilized layers of biocompatible metal wires which are interlaced, forming a lattice, a plurality of wires of a given layer being integrated in the lattice of the adjacent layers. The mechanical characteristics of an outermost layer is so that when in place, the layer applies against a vessel wall, the other layers extending substantially along cylindrical surfaces distinct from the outermost layer so as to form a multi-layer mat which affects the haemodynamic of a flow of blood passing along or through this mat and preventing a growing of plaque.

A bonding technique suitable for bonding a non-metal body, such as a silicon MEMS sensor, to a metal surface, such a steel mechanical component is rapid enough to be compatible with typical manufacturing processes, and avoids any detrimental change in material properties of the metal surface arising from the bonding process. The bonding technique has many possible applications, including bonding of MEMS strain sensors to metal mechanical components. The inventive bonding technique uses inductive heating of a heat-activated bonding agent disposed between metal and non-metal objects to quickly and effectively bond the two without changing their material properties. Representative tests of silicon to steel bonding using this technique have demonstrated excellent bond strength without changing the steel's material properties. Thus, with this induction bonding approach, silicon MEMS devices can be manufacturably bonded to mechanical steel components for real time monitoring of the conditions / environment of a steel component.

The invention discloses a six-degree-of-freedom micro vibration abatement platform. The six-degree-of-freedom micro vibration abatement platform comprises a foundation platform, a load platform, six sets of totally identical single-degree-of-freedom active / passive composite vibration insulating devices, and a controller; and the upper and lower two ends of each set of single-degree-of-freedom active / passive composite vibration insulating devices are respectively connected with the foundation platform and the load platform. A control method comprises logic shaft signal calculation, logic shaft control signal calculation, physical shaft real-time control signal calculation and transfer steps. The six-degree-of-freedom micro vibration abatement platform is simple in structure and adjustable in rigidity, can inhibit and isolate six-degree-of-freedom micro vibration in translation and rotation directions of axles X, Y and Z, can be suitable for different places, can effectively attenuate micro vibration on different frequency bands, provides reliable guarantee to precise machining and measuring equipment under micro vibration environments, solves the problems of complex structure and complex control mode in a traditional active / passive composite vibration insulating mechanism, and realizes multi-degree-of-freedom vibration inhibition.

Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no compatibility with a liquid for liquid immersion lithography; and causing no mixing with the resist film, a composite film comprising a protective film formed from the material and a resist film, and a method for forming a resist pattern using them. These can prevent both the resist film and the liquid used from changing in properties during the liquid immersion lithography, so that a resist pattern with high resolution can be formed using the liquid immersion lithography.