Product
Patsnap Eureka
For R&D, Patsnap Eureka makes reading and utilizing patents & technical documents easy.
Patsnap Eureka AIR
Designed for self-driven R&D workflows. Generate viable solutions, solve complex R&D challenges, empower your innovation with AI.
Patsnap Eureka Materials
Designed for material experts only. Revolutionize your material R&D, from search, analyze, to developing new materials.
Feature
TechResearch
Generate reliable direction feasibility study reports for your R&D in just a few steps.
TechSeek
Discover and master advanced knowledge NOW. Basics, ideas, possibilities, all at once.
TechMind
As an expert in R&D Theories, TechMind can generates customized viable solutions instantly.
TechRisk
Analyze your overall solution with one click, know your potential R&D risks in advance.
TechMonitor
Get weekly tech updates, stay abreast of the latest tech innovations and key insights.
Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
82 results about "Diffusion field" patented technology
Efficacy Topic
Property
Owner
Technical Advancement
Application Domain
Technology Topic
Technology Field Word
Patent Country/Region
Patent Type
Patent Status
Application Year
Inventor
Lateral diffusion field effect transistor with a trench field plate
InactiveUS20090140343A1High conductanceImprove the immunityTransistorSolid-state devicesGate dielectricElectrical conductor
A dielectric material layer is formed on a bottom surface and sidewalls of a trench in a semiconductor substrate. The silicon oxide layer forms a drift region dielectric on which a field plate is formed. Shallow trench isolation may be formed prior to formation of the drift region dielectric, or may be formed utilizing the same processing steps as the formation of the drift region dielectric. A gate dielectric layer is formed on exposed semiconductor surfaces and a gate conductor layer is formed on the gate dielectric layer and the drift region dielectric. The field plate may be electrically tied to the gate electrode, may be an independent electrode having an external bias, or may be a floating electrode. The field plate biases the drift region to enhance performance and extend allowable operating voltage of a lateral diffusion field effect transistor during operation.
Owner:GLOBALFOUNDRIES INC
Method for analyzing MRI diffusion data
Owner:U S GOVERNMENT REPRESENTED BY THE DEPT OF VETERANS AFFAIRS +1
Method for analyzing MRI diffusion data
A new transform is disclosed, applying methods of group theory, with which the composition of a voxel of three channels comprising isotropic, single fiber and multiple fiber components can be determined, as well as the magnitude and orientation of the diffusion field. Asymmetries produced by experimental artifacts fall into channels distinct from the fiber channels, allowing their separation and a subsequent reduction in noise from the reconstructed fibers.
Owner:U S GOVERNMENT REPRESENTED BY THE DEPT OF VETERANS AFFAIRS +1
Seabed-based multipoint in-situ long-term observing system
ActiveCN106841311ARealize multi-point precise positioning functionSimplicity guaranteedMaterial analysis by electric/magnetic meansSeismologyOcean bottomHydrate decomposition
The invention relates to a seabed-based multipoint in-situ long-term observing system which comprises a platform frame, a floating body material, an underwater sound communication apparatus, a beacon receiver, a monitoring cabin, a control cabin, a release control cabin, a central rotary table, a balancing weight and a microelectrode probing system. A main body of the platform frame is of a cylindrical shape and is divided into four layers from top to bottom; the floating body material, the underwater sound communication apparatus and the beacon receiver are mounted in the first layer, the monitoring cabin, the control cabin and the release control cabin are mounted in the second layer, the central rotary table is mounted in the third layer, and the balancing weight is mounted in the fourth layer. The seabed-based multipoint in-situ long-term observing system provided by the invention effectively realizes a multipoint precise positioning function so as to acquire data of a plurality of probing points in a probing region as required. Finally, spatial distribution information of an active diffusion field can be analyzed to provide an important data support for marine environment effect estimation of oil spill and aquo-complex decomposing process, thereby providing support and service for key projects such as submarine oil extraction and pilot production of natural gas hydrates.
Owner:QINGDAO INST OF MARINE GEOLOGY
Lateral diffusion field effect transistor with drain region self-aligned to gate electrode
InactiveUS20090261426A1Constant drift distanceSemiconductor/solid-state device manufacturingSemiconductor devicesField-effect transistorLateral diffusion
A disposable structure displaced from an edge of a gate electrode and a drain region aligned to the disposable structure is formed. Thus, the drain region is self-aligned to the edge of the gate electrode. The disposable structure may be a disposable spacer, or alternately, the disposable structure may be formed simultaneously with, and comprise the same material as, a gate electrode. After formation of the drain regions, the disposable structure is removed. The self-alignment of the drain region to the edge of the gate electrode provides a substantially constant drift distance that is independent of any overlay variation of lithographic processes.
Owner:GLOBALFOUNDRIES INC
A method for making horizontal dual pervasion field effect transistor
ActiveCN101266930ALow costExpand the ability to prepare special devicesSemiconductor/solid-state device manufacturingLDMOSCMOS
The invention discloses a method for manufacturing a laterally dual-diffused FET (field effect transistor), belonging to FET manufacturing field, the method is achieved by using the method for manufacturing LDMOS according to standard CMOS manufacturing processes, to realize LDMOS via chart design as following: defining a active layout to form a body extracting area, a source area, a drain area, a channel area, a drift area and a grid area of a LDMOS element; the source area, grid area and drain area are formed according to a re-doping injection layout; the drift area is disposed between the drain area and the channel area; both of the body extracting area and the source area are in grounding connection; using a N well layout to form a low-doping drift area of a N type LDMOS, or using P well layout to form a P type low-doping drift are of a P type LDMOS; using anti-silicification board to prevent the drift area from being silicified; the design of the source area, the drain area and the grid area complies with the normal MOS. The invention can be applied on any standard process, effectively reducing costs, and improving the capability of standard process for manufacturing special elements.
Owner:SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORP +1
Heat diffusion based detection of structures of interest in medical images
A method for detecting and identifying structures of interest such as colonic polyps or similar structures like lung nodules in volumetric (medical) images data is provided. The method includes obtaining a heat diffusion field (HDF) by applying a heat diffusion scheme to a volume of interest that includes structures. The obtained heat diffusion field is then used for identifying a structure of interest from the structures in the volume of interest using a geometrical analysis of the heat diffusion field. The heat diffusion scheme is, at least partly, governed by non-linear diffusion parameters. The identification includes two parts: (i) the computation of a spherical symmetry parameter, and (ii) the performance of a local analysis of the volume of interest and computation of a triangulization parameter.
Owner:THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIV
Heat diffusion based detection of structures of interest in medical images
Owner:THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIV
Single chip integration making technology for enhanced and consumption-up vertical dual diffusion field effect pipe
ActiveCN101127327AImprove compatibilityIncreased photolithographic injectionSemiconductor/solid-state device manufacturingBiochemical engineeringVoltage regulation
The utility model relates to a monolithic fabrication technology for the enhanced and depletion VDMOS, belonging to a technology applying for fabricating a enhanced and a depletion VDMOS with a high voltage (650V) common drain in one IC, which is characterized in that the material of the VDMOS adopting a N(100) substrate doped arsenic, which has a resistivity below 0.005 Omega-CM, the thickness of the epitaxy is 55Mum, the resistivity of the epitaxy is 24 Omega-CM. The withstand voltage can be stable on 650V, and up to 700V. To add a depletion VDMOS on the surface of the enhanced VDMOS, the depletion area needs a individual switching voltage adjustment, which is adding once more VT impurity, while adjusting the pre-and post process. The utility model has the advantages of fewer photoetching, low cost and simple fabricating control.
Owner:WUXI CRYSTAL SOURCE MICROELECTRONICS CO LTD
Thin silicon single diffusion field effect transistor for enhanced drive performance with stress film liners
InactiveUS20070158743A1Maximizing stress impartedReduced dimensionSolid-state devicesSemiconductor/solid-state device manufacturingSemiconductorCondensed matter physics
The present invention provides a semiconducting device structure including a thin SOI region, wherein the SOI device is formed with an optional single thin diffusion, i.e., offset, spacer and a single diffusion implant. The device silicon thickness is thin enough to permit the diffusion implants to abut the buried insulator but thick enough to form a contacting silicide. Stress layer liner films are used both over nFET and pFET device regions to enhance performance.
Owner:IBM CORP
Lateral diffusion field effect transistor with drain region self-aligned to gate electrode
InactiveUS20120126319A1Semiconductor/solid-state device manufacturingSemiconductor devicesField-effect transistorLateral diffusion
A disposable structure displaced from an edge of a gate electrode and a drain region aligned to the disposable structure is formed. Thus, the drain region is self-aligned to the edge of the gate electrode. The disposable structure may be a disposable spacer, or alternately, the disposable structure may be formed simultaneously with, and comprise the same material as, a gate electrode. After formation of the drain regions, the disposable structure is removed. The self-alignment of the drain region to the edge of the gate electrode provides a substantially constant drift distance that is independent of any overlay variation of lithographic processes.
Owner:GLOBALFOUNDRIES INC
Method for making fully self-aligning bar gate power vertical bilateral diffusion field-effect tranisistor
ActiveCN101399227AIncrease the areaGate Area ReductionSemiconductor/solid-state device manufacturingEtchingCobalt
The invention relates to the technical field of semiconductor device and integrated circuit fabrication technologies and discloses a method for preparing a DMOS power transistor with a fully self aligned strip-type gate. The method comprises: A. epitaxial growth is carried out on a substrate, and a field area is oxidized thereafter, thereby forming a field oxide layer; B. the field oxide layer in active area is etched, a gate region is oxidized, then, amorphous silicon is deposited, and the deposited amorphous silicon is doped thereafter; C. lithography, etching and boron injection are carried out on the amorphous silicon after being doped, and the injected boron is pushed forward under high temperature, thereby forming a P-type well region; D. the amorphous silicon is injected with arsenic to form a shallow source region, and then a side wall is formed by deposition and anti-etching; E. boron is injected into the amorphous silicon, a cobalt film is deposited, and then cobalt silicide is formed, and P-type well contact is formed by making use of the cobalt silicide; F. boron-phosphorosilicate glass is deposited, and pulling holes are formed by lithography and etching; G. metal is deposited by sputtering, and lithography and etching are carried out thereafter. The invention simplifies the fabrication process, reduces the fabrication cost and improves the operating frequency of the DMOS power transistor.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1
Marine oil spill risk assessment method
ActiveCN106339796AGuaranteed feasibilityCalculation accuracy is reliableResourcesICT adaptationEngineeringParticle drift
The invention belongs to the field of marine pollution risk assessment and monitoring, and particularly relates to a marine oil spill risk assessment method. The marine oil spill risk assessment method comprises the following steps of (1) risk source assessment; (2) risk diffusion calculation; (3) sensitivity analysis; and (4) oil spill risk division. The concrete operation of the step (2) is that a climate state marine oil spill risk diffusion model is established based on the marine environment, the hydrodynamic characteristics and the wind field variations of different seasons of the research marine area by using an oil particle drift diffusion simulation method, each oil spill risk source risk diffusion field is monthly calculated and the level of the oil spill risk is determined through superposition calculation. The climate state marine oil spill risk diffusion model is established so that the requirement of high-resolution calculation of the oil spill risk diffusion precision can be met, the calculation burden can also be saved and integrated oil spill risk calculation of the marine area level is enabled to be feasible.
Owner:NORTH CHINA SEA ENVIRONMENTAL MONITORING CENT OF STATE OCEANIC ADMINISTATION
Lateral diffusion field effect transistor with a trench field plate
InactiveUS7956412B2Improve performanceIncrease allowable operating voltageTransistorSolid-state devicesExternal biasGate dielectric
Owner:GLOBALFOUNDRIES INC
Transverse power component with high K insulating regions
ActiveCN103219386AIncrease the concentration figure of meritSimple processSemiconductor/solid-state device manufacturingSemiconductor devicesDielectricLDMOS
The invention provides a transverse power component with high K insulating regions. An insulating column region with a high dielectric constant is led to the inside of a drift region of the power component. The high K insulating regions and N-type column regions are distributed in an alternate mode. The insulating column region extends into a semi-conductor region. The insulating column region with the high dielectric constant has a field-reduction function. Surface electric field distribution of the drift region and optimal drift region concentration can be optimized through increase of the dielectric constant of the insulating column region, and accordingly voltage endurance and conductive performance of the component are improved. A transverse diffusion field effect transistor LDMOS or a transverse PN diode or a transverse insulated gate bipolar transistor LIGBT made according to the structure has the advantages of being high in breakdown voltage, low in on resistance, simple in process, low in cost and the like.
Owner:NANJING UNIV OF POSTS & TELECOMM INST AT NANJING CO LTD
Thin silicon single diffusion field effect transistor for enhanced drive performance with stress film liners
InactiveUS20090305471A1Maximizing stress impartedReduced dimensionSolid-state devicesSemiconductor/solid-state device manufacturingCondensed matter physicsSemiconductor
Owner:IBM CORP
Transverse diffusion field effect transistor and manufacturing method therefor
ActiveCN105789311AMinimize JFET effectLower on-resistanceSemiconductor/solid-state device manufacturingSemiconductor devicesPower flowLow voltage
The invention discloses a transverse diffusion field effect transistor. The transverse diffusion field effect transistor comprises a second-conductive-type-doped buried layer formed in a first-conductive-type-doped drifting region; the buried layer is provided with multiple buried layer sections with different concentrations and different depths; each adjacent two buried layer sections are arranged in a staggered manner longitudinally, so that a JFET effect between a channel region and the drifting region is lowered, and the current conduction region in the drifting region is enlarged when the device is conducted; the doping concentration of the buried layer section nearest to the channel region is greater than that of other buried layer sections; and due to the doping concentration of the buried layer section nearest to the channel region, the auxiliary drifting region on the side face of the channel region can be fully depleted at the initial stage of a drain terminal voltage. The invention also discloses a manufacturing method for the transverse diffusion field effect transistor. By adoption of the transverse diffusion field effect transistor, the low voltage breakdown can be prevented, the breakdown voltage can be increased, the conduction region of the leakage current can be enlarged, and the conduction resistance of the device can be lowered.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP
Field effect transistor of radio frequency lateral double-diffusion and preparation method thereof
ActiveCN103035731ALower on-resistanceImprove breakdown voltageSemiconductor/solid-state device manufacturingSemiconductor devicesDouble diffusionField-effect transistor
The invention discloses a field effect transistor of a radio frequency lateral double-diffusion which comprises a P-type substrate. A P-type epitaxial layer is arranged on the P-type substrate, a light dope drift region is formed in the P-type epitaxial layer, and a first layer of faraday shield and a second layer of faraday shield is arranged on the upper portion of the P-type epitaxial. The light dope drift region further comprises two second time filling region of N-type light dope drift (NLDD), which respectively placed on the lower portion of the first layer of faraday shield and the second layer of faraday shield. The field effect transistor of the radio frequency lateral double-diffusion has the advantages of surpassing the performance of prior structural device, achieving higher breakdown voltage (above 120 volts), and meanwhile reducing the on-resistance of prior structural device. Meanwhile the invention further discloses a preparation method of the transistor.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP
Multi-channel transient electromagnetic (MTEM) virtual wave field extraction device and method
InactiveCN106094044AStable virtual wave field waveform curveSmooth virtual wave field curveElectric/magnetic detectionAcoustic wave reradiationTime domainSplit window
The application provides a multi-channel transient electromagnetic (MTEM) virtual wave field extraction device and method and relates to the field of coalfield hydrogeology and physical geography. The method comprises steps of extracting virtual wave field data of a full time domain diffusion field; extracting virtual wave field data of each split window diffusion field; and performing related superposition of a full time domain extraction result and split window extraction results, and taking the superposition results as a virtual wave field extraction result. A stable and smooth virtual wave field waveform curve can be obtained, and the anti-interference capability is strong.
Owner:INST OF GEOLOGY & GEOPHYSICS CHINESE ACAD OF SCI
Radio frequency transverse double-diffusion field effect transistor and manufacturing method thereof
InactiveCN103855210ALower base resistanceAvoid conductionSemiconductor/solid-state device manufacturingSemiconductor devicesElectrical resistance and conductanceDouble diffusion
The invention discloses a radio frequency transverse double-diffusion field effect transistor. The radio frequency transverse double-diffusion field effect transistor comprises a P-type substrate, a P-type epitaxial layer and a P well, wherein the P-type epitaxial layer is formed on the P-type substrate in an epitaxial growth mode; the P well is located in the P-type epitaxial layer, formed in an ion injection mode and used for forming a channel; a P buried layer is arranged in the P-type epitaxial layer, formed in an ion injection mode and located below the P well, and makes contact with the P well. The radio frequency transverse double-diffusion field effect transistor can effectively lower base resistance of a parasitic bipolar transistor, thereby restraining the parasitic bipolar transistor from being conductive. The drift region with light dope runs out through the P buried layer and the P well together, electric fields on the surface of the drift region are evenly distributed, electric field intensity of the lower portion, close to the drain terminal edge, of a polysilicon gate is reduced, and therefore a hot carrier is restrained from being injected into an oxidation layer, close to the drain terminal edge, of the polysilicon gate.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP
Manufacturing method of double diffusion field effect transistor
InactiveCN101447432AIncrease saturation currentImprove withstand voltage characteristicsSemiconductor/solid-state device manufacturingDouble diffusionEngineering
The invention discloses a manufacturing method of a double diffusion field effect transistor, comprising the following steps: greatly increasing the saturation currents of the transistor by increasing the overlapped area of a transistor gate and drift region; changing the electric field distribution on the drift region using an extended grid potential so as to increase breakdown voltages; and synchronously, inhibiting the GIDL effect resulted from the overlapped area using the thick silicon dioxide under the gate at the overlapped area so as to reduce drain currents of transistor. In addition, the method can change the high-voltage breakdown position of the transistor from a transverse junction area to a longitudinal junction area, namely, the high-voltage breakdown position of the transistor is at the strongest junction area, thereby improving the voltage endurance of the double diffusion field effect transistor.
Owner:SHANGHAI HUA HONG NEC ELECTRONICS
Optical diffusion film and production process thereof
ActiveCN103675963AHigh light transmittanceHigh haze valueDiffusing elementsCoatingsOptical coatingOptical transmittance
The invention belongs to the field of production of optical diffusion films and particularly relates to an optical diffusion film and a production process thereof. The production process includes the steps of producing diffusion liquid, stirring, moving the diffusion liquid to a trough of a coating machine, allowing the trough to feed from the ends and discharge from the middle, and coating one face of a base film with an optical diffusion layer; producing anti-sticking liquid and mixing, moving the anti-sticking liquid to the trough of the coating machine, allowing the trough to feed from the ends and discharge from the middle, and coating the other face of the base film with an antistatic layer. The optical diffusion film produced by the production process has high light transmittance and haze value; the optical coatings can well attach to base material; light permeating the diffusion film is soft and even; the optical diffusion film also has excellent anti-sticking property. A stirrer is disposed in each of containers of diffusion liquid and anti-sticking liquid, the diffusion liquid and the anti-sticking liquid are rotated, and diffusing particles and anti-sticking particles are avoided settling; a reflow device is provided, the trough feeds from the ends and discharges from the middle, liquid cycling is ensured, particle settlement is avoided, and yield of the optical diffusion field is increased.
Owner:昆山倬跃蓝天电子科技有限公司
N-type silicon-on-insulator transverse double-diffusion field effect transistor
InactiveCN102437192ASmall radius of curvatureReduce electric field strengthSemiconductor devicesDouble diffusionElectrical field strength
Owner:SOUTHEAST UNIV
High-resolution ground nuclear magnetic resonance imaging method
ActiveCN108897051ASolve bottlenecksAvoid disadvantages such as poor edge resolutionDetection using electron/nuclear magnetic resonanceWave fieldElectromagnetic field
The invention provides a high-resolution ground nuclear magnetic resonance imaging method, solving the problem that the traditional ground nuclear magnetic resonance imaging method meets the bottleneck in the aspect of further improving the interpretation precision of underground water. A damping method least square method is applied, a nuclear magnetic resonance electromagnetic field and a seismic wave field equation are solved, and wave field conversion is achieved, and the seismic wave field discrete data of each receiving coil on the measuring line can be obtained; the deconvolution is obtained by fitting seismic wave field discrete data to each receiving coil on the measuring line, the waveform broadening effect of the wave field conversion is eliminated; the mutual relation of all points in the synthetic aperture range is obtained on the basis of the related superposition principle, so that correlation point superposition is realized, the detection signal-to-noise ratio is improved, and the synthetic aperture virtual seismic wave field composite value on the measuring line is obtained; by means of the Kirchhoff's migration imaging theory, the seismic wave fluctuation equationis solved to realize the underground water-containing structure migration imaging. The high-precision imaging of the water-containing layer is achieved based on mathematical integration transformation between the nuclear magnetic resonance response diffusion field and the pseudo-seismic fluctuation field, and the defects that a traditional nuclear magnetic resonance data interpretation method ispoor in water-containing layer edge resolution are avoided, and the method has certain significance for further application and popularization of the ground nuclear magnetic resonance technology.
Owner:JILIN UNIV
Field effect transistor of radio frequency lateral double-diffusion and preparation method thereof
ActiveCN103035532AInhibition injection) effectReduce depositionSemiconductor/solid-state device detailsSolid-state devicesDouble diffusionElectrical field strength
The invention discloses a field effect transistor of a radio frequency lateral double-diffusion which comprises a P-type substrate. A P-type epitaxial layer is formed on the P-type substrate in an epitaxial growth mode, and a veneer of monox layer is deposited on the upper portion of the P-type epitaxial layer. A veneer of metal layer is deposited on the monox layer and formed a faraday layer in an etching form. A veneer of silicon nitride layer is arranged between the monox layer and the faraday layer. The field effect transistor of the radio frequency lateral double-diffusion has the advantages of reducing one metal deposition process, meanwhile achieving higher breakdown voltage (BV), reducing the electric field intensity of the lower portion of gate-oxide edge, and helping to restrain domino effect of (HCI) hot carrier injection.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP
Transient electromagnetic tunnel advanced prediction method under tunnel boring machine construction condition
InactiveCN108983300AEnables multiresolution analysisStable wave field transformationElectric/magnetic detectionAcoustic wave reradiationWave fieldTunnel boring machine
The invention discloses a transient electromagnetic tunnel advanced prediction method under a tunnel boring machine construction condition. The method comprises the following steps of firstly, subtracting TBM machine theory response from an acquisition signal, removing a part of TBM response, and through a mathematical transformation relation and corresponding signal processing, converting a transient electromagnetic diffusion field signal into a virtual wave field signal satisfying an independent component analysis requirement; secondly, using an information independent component analysis algorithm to carry out TBM interference separation and extracting an tunnel transient electromagnetic geological characteristic signal; and finally, using Born approximate inversion to realize underground medium virtual wave field inversion imaging, combining a global apparent resistivity definition to realize the interpretation of a geologic anomaly in front of a tunnel face, and completing the transient electromagnetic advanced geological prediction of a TBM excavation tunnel. In the invention, low-resistance geological anomaly information in front of the face can be effectively extracted, TBMmachine interference is suppressed, and the key problem of the advanced prediction of a transient electromagnetic method in a TBM construction tunnel is effectively solved.
Owner:CHANGAN UNIV
Radio frequency transverse double-diffusion field effect transistor and manufacturing method thereof
ActiveCN104282763AEasy injectionImprove featuresSemiconductor/solid-state device manufacturingSemiconductor devicesCapacitanceDouble diffusion
The invention discloses a radio frequency transverse double-diffusion field effect transistor. A drifting region is of a non-uniform doping structure. The invention further discloses a manufacturing method for the radio frequency transverse double-diffusion field effect transistor. Three times of N-type ion injection is adopted in the drifting region to form a non-uniform N-type structure, self-alignment perpendicular injection of low-dosage medium energy is conducted in the first time of N-type ion injection, self-alignment oblique angle injection of low-dosage low energy is conducted in the second time of N-type ion injection, and then the third time of N-type ion injection is conducted at the position, away from polysilicon gates by a certain distance, in the drifting region through template definition. According to the radio frequency transverse double-diffusion field effect transistor and the manufacturing method thereof, on the condition of a thick Faraday shield oxidation layer, the output capacitance is reduced, the hot carrier injection capability and the robustness are enhanced, and the manufacturing technology is simple.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP
Water-bearing geologic body water-rich property prediction method based on transient electromagnetic method
ActiveCN112213792AOvercome the disadvantage of single featureElectric/magnetic detection for well-loggingWater resource assessmentTransient electromagneticsNeural network nn
The invention provides a water-bearing geologic body water-rich property prediction method based on a transient electromagnetic method, and relates to the technical field of mine safety prevention andcontrol. The water-bearing geologic body water-rich property prediction method based on the transient electromagnetic method comprises the following steps of step 1, conducting mine transient electromagnetic detection; step 2, acquiring double-field information data of the water-containing geologic body and drilling water-rich property information data; step 3, constructing a water-rich propertyintelligent discrimination model of the water-containing geologic body; and step 4, predicting the water-rich property of the water-containing geologic body. The method is applied to detection construction and data processing explanation of a mine transient electromagnetic method, and water-rich property feature extraction and sample set construction are performed by adopting double-field information of a transient electromagnetic diffusion field and a pseudo-seismic fluctuation field, so that the defect of single information feature of transient electromagnetic original data is overcome; a deep neural network algorithm is adopted to carry out optimization approximation on the complex nonlinear relationship between the sample data and the water-containing geologic body water-rich propertyinformation, and deep mining and grading prediction of the water-containing geologic body water-rich property information are achieved.
Owner:CCTEG CHINA COAL RES INST +1
A seabed-based multi-point in-situ long-term observation system
ActiveCN106841311BRealize multi-point precise positioning functionSimplicity guaranteedMaterial analysis by electric/magnetic meansProspecting/detection of underground/near-surface gasesOcean bottomEngineering
Owner:QINGDAO INST OF MARINE GEOLOGY
Static sounding composite type geochemical microelectrode probe system
ActiveCN106770559AFast response timeImprove resolutionTransmission systemsProspecting/detection of underground/near-surface gasesBreaking strengthEngineering
The invention relates to a static sounding composite type geochemical microelectrode probe system. The static sounding composite type geochemical microelectrode probe system comprises a base, a static penetration probe and at least one microelectrode, wherein the static penetration probe and the microelectrodes are arranged on the base; the static penetration probe is arranged at the center of the base; the microelectrodes are distributed around the static penetration probe; the length of a conical tip of each static penetration probe is 4 to 8cm more than the length of a conical tip of the microelectrode. The static sounding composite type geochemical microelectrode probe system has the advantages that the static penetration probe is combined with the microelectrodes, and the static penetration threshold value is set according to the extreme breaking strength of the microelectrode, so as to ensure that the microelectrode stops penetrating into a precipitate before reaching the extreme breaking strength, and avoid the damage to the microelectrode; the penetrating depth of the microelectrode is larger; the microelectrode probe system can be applied into a seabed base multi-point in-situ long-term observing system; the multi-point accurate positioning function is effectively realized, the data of multiple detection points in the detection area can be obtained according to requirements, and the space distribution information of an active diffusion field is obtained after analysis.
Owner:QINGDAO INST OF MARINE GEOLOGY
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com