The invention discloses a
plasma arc deposition device and method for
a diamond film, and belongs to the technical field of
diamond material preparation. A large-area conformal
diamond film is deposited by adopting a direct-current arc
plasma device with multi-stage
magnetic field control; stable control on a rotating
plasma arc is realized through a
magnetic field generated by an arc-stabilizingmagnetic
field coil; an extended arc coil further stabilizes the arc, and the extended rotating arc adapts to the size of a substrate, so that the large-area stable rotating guide of the arc to the substrate is realized. Meanwhile, a guide
magnetic field coil at the bottom of the substrate realizes movement of the plasma arc towards the concave part of the substrate, and uniform deposition of diamonds on the surface of the conformal substrate is realized. Three magnetic field coils expand and guide the
electric arc to enlarge the
diamond deposition area while achieving generation and stabilization of the rotating
electric arc, interference of
anode carbon deposition on the
electric arc is avoided, and long-term stable growth of
a diamond film with a uniform thickness is achieved. The obtained conformal diamond film can be used as a
heat sink or window material with
high heat flux and rapid heat dissipation.