107 results about "Cyclotron resonance" patented technology

An ion separation instrument includes an ion source coupled to at least a first ion mobility spectrometer having an ion outlet coupled to a mass spectrometer. Instrumentation is further included to provide for passage to the mass spectrometer only ions defining a preselected ion mobility range. In one embodiment, the ion mobility spectrometer is provided with electronically controllable inlet and outlet gates, wherein a control circuit is operable to control actuation of the inlet and outlet gates as a function of ion drift time to thereby allow passage therethrough only of ions defining a mobility within the preselected ion mobility range. In another embodiment, an ion trap is disposed between the ion mobility spectrometer and mass spectrometer and is controlled in such a manner so as to collect a plurality of ions defining a mobility within the preselected ion mobility range prior to injection of such ions into the mass spectrometer. In yet another embodiment, an ion inlet of the ion trap may be electronically controlled relative to operation of the ion mobility spectrometer as a function of ion drift time to thereby allow passage therein only of ions defining a mobility within the preselected ion mobility range. The mass spectrometer is preferably a Fourier Transform Ion Cyclotron Resonance mass spectrometer, and the resulting ion separation instrument may further include therein various combinations of ion fragmentation, ion mass filtering, ion trap, charge neutralization and / or mass reaction instrumentation.

The invention provides a manufacturing apparatus for nanometer powder, The apparatus contains: a reaction room with an incidence window; an laser generator used to generate laser; an optical system, which is located on the incidence window and used to focus the laser generated by the laser generator, and then the focused laser enters the reaction room through the incidence window; at least one input device of reaction air providing air for the reaction room; a vacuumizing device used to vacuumize the reaction room; a powder collecting unit to collect the powder produced by reaction of air; and a microwave generator used to generate the microwave which causes the cyclotron resonance of the microwave electron. The invention also provides a manufacturing method for nanometer powder.

The present invention comprises a method and system for accurate estimation of the ion cyclotron resonance (ICR) parameters in Fourier-transform mass spectrometry (FTMS / FT-ICR MS). The parameters are essential to estimating the mass to charge ratio of an ion from FT-ICR MS data, the intended purpose of the instrument. Achieving greater accuracy in the parameters assists in greater accuracy of the mass to charge ratio of an ion, and obtaining an accurate estimation of the mass to charge ratio of an ion further aides in detecting mass with sub-ppm accuracy. Estimating mass in this manner enhances identification and characterization of large molecules. The inventive method and system thereby enhances the data obtained by conventional FTMS by accurately estimating ICR parameters. Ultimately, accurate estimates of the masses of molecules and detection and characterization of molecules from FT-ICR MS data are obtained.

Disclosed is apparatus and method for improving the signal by changing the voltage applied to an analyzing trap of a high resolving power Fourier Transform Ion Cyclotron Resonance (FT-ICR) mass spectrometer. More specifically, after the ion activation, a voltage different from that of a trap electrode is applied to an additional electrode in the center of the trap electrode, and the voltage is maintained until the end of a detection cycle. Applying the above method, the stability of the ions confined in a trap is more increased, and therefore, the detected time domain signal is being lengthened. The lengthened time domain signal results in an increase of the frequency or an improvement of the resolving power and the sensitivity of the mass-to-charge domain signal.

We have discovered a method of improving step coverage of a copper seed layer deposited over a semiconductor feature surface which is particularly useful for small size features having a high aspect ratio. Using a contact via as an example of a high aspect ratio feature, we have demonstrated that despite previously-held views, it is possible to increase the copper seed layer coverage simultaneously at the bottom of the via and on the wall of the via by increasing the percentage of the depositing copper species which are ions. The percentage of species ionization which is necessary to obtain sufficient step coverage for the copper seed layer is a function of the aspect ratio of the feature. For features having a 0.25 mum or smaller feature size, an aspect ratio of about 3:1 requires that about 50% or more of the copper species be ions at the time of deposition on the substrate. As the aspect ratio increases to about 4:1, the percentage of species which are ions is preferably increased to between about 60% and 70%. When the aspect ratio is about 5:1 or greater, the percentage of species which are ions is preferably increased to greater than 80%. This increase in the percentage of copper species which are ionized can be achieved using techniques known in the art, such as, for example, laser ablation of the copper target, electron cyclotron resonance, hollow cathode, and applicants' preferred technique, an inductively coupled RF ion metal plasma. We have further discovered that when an inductively coupled plasma is used to increase ionization, an increase in power to the ionization source is not enough to obtain the desired percentage of ions in many cases. It is also necessary to increase the plasma gas pressure. Typically the plasma gas is argon, and the argon pressure in the copper seed layer deposition chamber is increased to fall within the range of about 20 to about 100 mT, preferably between about 30 mT and 70 mT.