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259results about How to "More stability" patented technology

Semiconductor device and method for fabricating such device

InactiveUS6911694B2Stable operational characteristicAvoid layeringTransistorSolid-state devicesLDMOSGate dielectric
An LDMOS transistor and a bipolar transistor with LDMOS structures are disclosed for suitable use in high withstand voltage device applications, among others. The LDMOS transistor includes a drain well region 21 formed in P-type substrate 1, and also formed therein spatially separated one another are a channel well region 23 and a medium concentration drain region 24 having an impurity concentration larger than that of drain well region 21, which are simultaneously formed having a large diffusion depth through thermal processing. A source 11s is formed in channel well region 23, while a drain 11d is formed in drain region 24 having an impurity concentration larger than that of drain region 24. In addition, a gate electrode 11g is formed over the well region, overlying the partially overlapped portions with well region 23 and drain region 24 and being separated from drain 11d. Since the source 11s, well region 23, and drain region 24 are respectively self-aligned to the gate electrode 11g, resultant transistor characteristics are stabilized, and the decrease in the on resistance and improved drain threshold voltages can be achieved. Also disclosed herein are bipolar transistors with LDMOS structures, which are capable of obviating the breakdown of gate dielectric layers even at high applied voltage and achieving improved stability in transistor characteristics.
Owner:RICOH KK

Method and apparatus for loading and implanting a shape memory implant

An implant insertion system includes a shape memory implant movable between a first shape a second shape and an implant insertion device movable between an implant disengagement position and an implant engagement position. The implant insertion device receives the shape memory implant in its first shape while in its implant disengagement position. Movement of the implant insertion device from its implant disengagement position to its implant engagement position manipulates the shape memory implant from its first shape to its second shape. The implant insertion device maintains the shape memory implant in its second shape until delivery of the shape memory implant into tissue or bone.
Owner:BIOMEDICAL ENTERPRISES

System for cushioning wafer in wafer carrier

The invention relates to transport and shipping containers for wafers that are processed into semiconductor units. The wafer transport system provides wafer carriers that provide damage protection and particulate protection with minimal contamination of the wafers in the shipper. The invention includes a wafer cushion for cushioning semiconductor wafers that is made of a closed-cell polyethylene material with a surface resistivity of less than 5×107 ohms per square that has less than 1800 ng / g Cl−, 400 ng / g F− / Acetate, 270 ng / g NO3−, 350 ng / g SO42−, and 60 ng / g PO43−ions leachable under moderate conditions. The wafer cushion optimally has no detectable outgassing organics under stringent conditions. The static control properties are the result of carbon that is part of the structure of the material.
Owner:ENTEGRIS INC

Optical glass and lens

An optical glass which contains at least 20 mol % of TeO2 and has an internal transmittance of at least 80% in a thickness of 2 mm to a light having a wavelength of 405 nm and a refractive index of at least 1.85 to the same light, and which contains no alkali metal oxide or contains alkali metal oxides in a total amount of at most 15 mol %.
Owner:ASAHI GLASS CO LTD

Method for treating cement kiln dust

A method for treating cement kiln dust containing alkaline metal salts includes the steps of hydration (formation of calcium hydroxide), dehydration i.e. drying, fractionation by sieving and carbonation (reaction of the fractionated moistened cement kiln dust) with CO2 gas in a fluidized bed reactor.
Owner:UNITED ARAB EMIRATES UNIVERSITY

Weight-forward composite arrow shaft

An improved arrow shaft comprised of a core of substantially round, very lightweight, porous material, with the porous core having sections that have different diameters at various points along the length of the arrow shaft, with the lightweight core materials being overwrapped with different thickness' of reinforcing materials such that the resulting outside diameter of the finished arrow shaft has substantially parallel surfaces over the entire length of the shaft and the finished shaft has a substantially constant circumference and outside diameter along its entire length. The inventive composite arrow shaft incorporates different thickness' and weights of reinforcement materials, strategically placed along it's length, in a manner that results in providing, in an integral manner, proper front to back balance in the finished arrow, with the proper balance achieved by using the same weight point, point insert, nock, nock insert, and fletching materials, regardless of the length the shaft is cut off at. The preferred embodiment of the inventive arrow shaft includes end sections at each end that have greater thicknesses of reinforcement materials overlaying the core, than at other intermediate sections of the shaft, with the increased reinforcement materials at each end of the shaft serving to increase, in an integral manner, the strength of the shaft in these areas. The preferred embodiment of the inventive arrow shaft also includes at least one other section intermediate the end sections of the shaft that also has greater thicknesses of reinforcement materials along it's length than do some other sections of the shaft that are intermediate the additionally-reinforced end sections.
Owner:SCHAAR JOHN G
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