908results about How to "Reduce chip area" patented technology

A cell according to the present invention comprises a plurality of terminals capable of transmitting an input signal or an output signal and serving as a minimum unit in designing a semiconductor integrated circuit, wherein the plurality of terminals is located on routing grids lined in a Y direction which is a direction vertical to a power-supply wiring of the cell used in automatic placement & routing and has a shape extended in an X direction which is a direction in parallel with the power-supply wiring, more specifically such a shape that, for example, a longer-side dimension of the terminal is equal to “a routing grid interval in the X direction+a wiring width. According to the constitution, a cell area is reduced, which advantageously leads to the reduction of a chip area.

An LDMOS transistor and a bipolar transistor with LDMOS structures are disclosed for suitable use in high withstand voltage device applications, among others. The LDMOS transistor includes a drain well region 21 formed in P-type substrate 1, and also formed therein spatially separated one another are a channel well region 23 and a medium concentration drain region 24 having an impurity concentration larger than that of drain well region 21, which are simultaneously formed having a large diffusion depth through thermal processing. A source 11s is formed in channel well region 23, while a drain 11d is formed in drain region 24 having an impurity concentration larger than that of drain region 24. In addition, a gate electrode 11g is formed over the well region, overlying the partially overlapped portions with well region 23 and drain region 24 and being separated from drain 11d. Since the source 11s, well region 23, and drain region 24 are respectively self-aligned to the gate electrode 11g, resultant transistor characteristics are stabilized, and the decrease in the on resistance and improved drain threshold voltages can be achieved. Also disclosed herein are bipolar transistors with LDMOS structures, which are capable of obviating the breakdown of gate dielectric layers even at high applied voltage and achieving improved stability in transistor characteristics.

A multi-chip module is implemented by connecting a plurality of connection pads provided on, for example, two semiconductor chips via a plurality of conductive connecting members. To carry out a test for determining the quality of the connection between the two semiconductor chips, the multi-chip module is further provided with a plurality of switch elements so that the plurality of connecting members can be electrically conducted in a serial manner via the connection pads of the semiconductor chips. During the connection test, all the switch elements are turned on, and the impedance between both ends of the line including the plurality of connecting members conducted in a serial manner is measured using two probing pads.

A pixel circuit, and a method for operating a high-low sensitivity (HLS) pixel circuit, to provide increased dynamic range in an imager. The pixel circuit combines a four transistor (“4T”) and a three-transistor plus capacitor (“3TC”) configuration in one pixel, where the 4T portion of the pixel is coupled to a high sensitivity buried photodiode region, and the 3TC portion of the pixel is coupled to a low sensitivity buried photodiode region. The pixel circuit first reads out charge from the high sensitivity photodiode region and compares it to a reset voltage, then reads out charge from the low sensitivity photodiode region. Under an alternate embodiment, multiple HLS pixels are coupled through a common floating diffusion node.

A memory cell array is logically divided into a plurality of regions having different reading speeds, the respective regions having the different reading speeds include region information storage regions for storing region information in which at least two addresses present in the memory cell at the same time are set to be different regions, a reading control circuit is constituted to carry out a reading operation by determining any of the divided regions which is to be read, selecting an optimum reading method and controlling the reading circuit based on the region information stored in the region information storage region, and an address which can be read in a short time in multivalued information stored in one memory cell is set to be a high speed reading region and is distinguished from regions having the other reading speeds. Consequently, it is possible to efficiently write and read information of 2 bits or more in one memory cell array without reducing a using efficiency of the memory cell array.

A memory operative to provide multi-port functionality includes multiple single-port memory cells forming a first memory array. The first memory array is organized into multiple memory banks, each of the memory banks comprising a corresponding subset of the single-port memory cells. The memory further includes a second memory array including multiple multi-port memory cells and is operative to track status information of data stored in corresponding locations in the first memory array. At least one cache memory is connected with the first memory array and is operative to store data for resolving concurrent read and write access conflicts in the first memory array. The memory includes a controller operative: to receive the status information and to determine a validity of data stored in the first memory array as a function of the status information; to control a manner in which data is stored in the memory for avoiding data overflow in the cache memory; and to resolve concurrent read and write access conflicts in the first memory array during the same memory cycle.

A vertical electrode structure of GaN-based light emitting diode discloses an oxide window layer constructing the GaN-based light emitting diode of vertical electrode structure, which effectively decreases the Fresnel reflection loss and total reflection, and further advances the luminous efficiency. Moreover, the further included metal reflecting layer causes the reflection without the selective angle of incidence, thus increasing the coverage of the reflecting angles and further reflecting the light emitted from a light emitting layer effectively. In addition, the invented structure can also advance the function of heat elimination and the electrostatic discharge (ESD) so as to the increase the operating life of the component and to be applicable to the using under the high current driving. Moreover, the vertical electrode structure of the present invention is able to lower down the manufacturing square of the chip and facilitate the post stage of the conventional wire bonding process.

An integrated circuit device includes a semiconductor substrate having a top surface; at least one insulation region extending from the top surface into the semiconductor substrate; a plurality of base contacts of a first conductivity type electrically interconnected to each other; and a plurality of emitters and a plurality of collectors of a second conductivity type opposite the first conductivity type. Each of the plurality of emitters, the plurality of collectors, and the plurality of base contacts is laterally spaced apart from each other by the at least one insulation region. The integrated circuit device further includes a buried layer of the second conductivity type in the semiconductor substrate, wherein the buried layer has an upper surface adjoining bottom surfaces of the plurality of collectors.

A slow-wave transmission line component having a slow-wave structure. The slow-wave structure includes a floating shield employing one of electric and magnetic induction to set a potential on floating strips of said floating shield to about 0, thereby reducing losses caused by electric coupling to a substrate. A spacing between the strips is small to inhibit electric field from passing the metal strips to the substrate material.

A semiconductor integrated circuit device includes a HFET formed on part of a substrate made of sapphire and including a Group III-V nitride semiconductor layer, a dielectric film formed on the substrate to cover the top and side surfaces and upper corners of the Group III-V nitride semiconductor layer, a microstrip line formed with the dielectric film interposed between the substrate and the microstrip line, and a drain lead which is formed on part of the dielectric film and through which the HFET is electrically connected to the microstrip line.

A semiconductor memory device includes a memory cell array region in which vertical transistors each having a lower electrode connected to a bit line is regularly arranged with a predetermined pitch, including memory cells formed using at least the vertical transistors; a peripheral circuit region arranged adjacent to the memory cell array region in a bit line extending direction; and a predetermined circuit arranged overlapping the peripheral circuit region and the memory cell array region. In the semiconductor memory device, the vertical transistors each having an upper electrode connected to the predetermined circuit are included in an end region of the memory cell array region, in which no word line is provided.

An encryption part or a decryption part of an encryption / decryption apparatus or a part common to both parts is used both for encryption and decryption of a datum to be stored and the encrypted memory content and for the generation of the address-individual key and the address-dependent key, respectively.

An exemplary embodiment of the present disclosure illustrates a method for auto-refreshing memory cells in a semiconductor memory device with an open bit line architecture, wherein the semiconductor memory device comprises M memory banks, and each of the M memory banks has two particular sectors with a same index and L remained sectors with different indices. Two word lines of the two particular sectors with the same index in the memory bank and (M−1) word lines of the L remained sectors respectively in the other (M−1) memory banks are selected in one cycle. Then, memory cells of the selected word lines are refreshed.

A multi-word line refresh-type semiconductor device may have a plurality of memory banks and performs a refresh operation simultaneously with respect to a plurality of word lines for each of the banks in a self-refresh mode. The semiconductor device includes an address controller for receiving a normal address and a refresh address and selectively outputting the received refresh address in a refresh mode, a fuse circuit for receiving the refresh address, determining whether the received refresh address corresponds to a word line to be repaired and outputting a redundancy word line enable signal and a first control signal according to a result of the determination, a first signal generator for, in response to a bit value for block selection of the refresh address and the first control signal, outputting a second control signal which defines a multi-word line refresh period, a refresh address generator for generating the refresh address in response to the second control signal, and a row controller for receiving the refresh address, second control signal and redundancy word line enable signal and controlling the refresh operation with respect to a memory core.

A coupled microstrip line structure having tunable characteristic impedance and wavelength are provided. In accordance with one aspect of the invention, a coupled microstrip line structure comprises a first ground plane having a plurality of first conductive strips separated by a dielectric material, and a first dielectric layer over the first ground plane. The coupled microstrip line further comprises a first signal line over the first dielectric layer, wherein the first signal line is directly above the plurality of first conductive strips, and wherein the first signal line and the plurality of first conductive strips are non-parallel, and a second signal line over the first dielectric layer, wherein the second signal line is directly above the plurality of first conductive strips, and wherein the second signal line and the plurality of first conductive strips are non-parallel, and wherein the second signal line is substantially parallel to the first signal line.

The invention provides a miniaturized MEMS switch-line phase shifter, comprising an MEMS switch, a reference phase shifting transmission line, a phase delay transmission line, a switch offset line, a back surface grounding layer, a medium liner, a microwave grounding terminal, and a micro-mechanical through hole. The invention has the advantages of keeping low insertion loss of a transmission passage and reducing the chip area of a large phase shifting unit bit transmission line of the phase shifter by distribution-typed elements with high resistance and a phase delay transmission network formed by the microwave grounding of a collecting element and the micro-mechanical through hole, reducing the chip area of a small phase shifting unit bit delay line of the phase shifter, reducing the area of the chip, minimizing the chip area occupied by the MEME switch by selecting miniaturized MEMS switches such as a built-in cantilever MEMS switch, keeping the broad band performance of the MEMS switch and the phase shifter and minimizing the chip area occupied by the MEMS switch offset circuit by separating a microwave signal from a switch driving signal, and leading to simple and convenient design of microwave grounding of the chip and reducing the area of the chip to the most extent by the micro-mechanical through hole technology.

In a stacked semiconductor device in which a plurality of through silicon vias used for data transfer are shared among a plurality of semiconductor chips, a first semiconductor chip included in the semiconductor chips holds through silicon via switching information for specifying a through silicon via among the through silicon vias to be used for data transfer, and transfers the through silicon via switching information to a second semiconductor chip included in the semiconductor chips. According to the present invention, because the through silicon via switching information is transferred from the first semiconductor chip to the second semiconductor chip, a circuit for storing the through silicon via switching information in a nonvolatile manner is not required in the second semiconductor chip. With this arrangement, a chip area of the second semiconductor chip can be reduced.

A page buffer for an NAND flash memory, including: a first latch for loading data; a second latch for storing data stored on a cell depending on a bit line selection signal; a setting circuit for setting the first latch to a high level to load data in a high level; a first switching circuit for transferring the data stored on the second latch depending on a data output signal of a page buffer; a discharging circuit for discharging charges on a data line; a second switching circuit for connecting the data line discharged by the discharging circuit to the first latch depending on a data control signal to load the data in a low level to the first latch; and a data transferring circuit for transferring the data of the first latch to the second latch.

An integrated circuit structure includes a chip including a substrate and a power distribution network. The power distribution network includes a plurality of power through-silicon vias (TSVs) penetrating the substrate, wherein the plurality of power TSVs forms a grid; and a plurality of metal lines in a bottom metallization layer (M1), wherein the plurality of metal lines couples the plurality of power TSVs to integrated circuit devices on the substrate.

Electrically erasable programmable “read-only” memory (EEPROM) cells in an integrated circuit, and formed by a single polysilicon level. The EEPROM cell consists of a coupling capacitor and a combined read transistor and tunneling capacitor. The capacitance of the coupling capacitor is much larger than that of the tunneling capacitor. In one embodiment, field oxide isolation structures isolate the devices from one another; a lightly-doped region at the source of the read transistor improves breakdown voltage performance. In another embodiment, trench isolation structures and a buried oxide layer surround the well regions at which the coupling capacitor and combined read transistor and tunneling capacitor are formed.

A method for driving a nonvolatile memory device including a semiconductor substrate, an island semiconductor layer on the substrate, a memory cell having a control gate and a charge storage layer surrounding a peripheral surface of the island semiconductor layer, a first selection transistor provided between the memory cell and the substrate and having a first selection gate, a source diffusion layer between the substrate and the island semiconductor layer, a drain diffusion layer provided in an opposing end of the island semiconductor layer from the source diffusion layer, and a second selection transistor provided between the memory cell and the drain diffusion layer and having a second selection gate, the method comprising the steps of: applying a negative first voltage to the drain and the first selection gate, applying a positive second voltage to the second selection gate, and applying 0V or a positive third voltage to the source; and applying a positive fourth voltage higher than the second voltage to the control gate of the memory cell for injecting electric charges into the charge storage layer.

Stacked capacitor memory is realized, wherein a capacitor stores data and a diode serves as an access device instead of MOS transistor, the first terminal is connected to a word line, the second terminal is connected to the first electrode of the capacitor which serves as a storage node while the second electrode is connected to a plate line, the third terminal is floating, and the fourth terminal is connected to a bit line. When write, the storage node is charged or not, depending on the conducting state of the diode which is controlled by the bit line. When read, the diode also serves as a sense amplifier to detect whether the storage node is forward bias or not, and it sends binary data to a latch device wherein includes a current mirror and a feedback loop which cuts off the current path after latching, thus it reduces active current, minimizes data pattern sensitivity, and also rejects coupling noise. And dummy rows and columns generate replica delay signals which guarantee timing margin and reduce cycle time. And its applications are extended to single port, multi port and content addressable memory. In addition, the memory cells are formed in between the routing layers, which memory cells can be stacked over the transistor or another capacitor memory cell.

A semiconductor device includes a gate electrode over a semiconductor substrate, wherein the gate electrode has a gate width direction; a source / drain region in the semiconductor substrate and adjacent the gate electrode, wherein the source / drain region has a first width in a direction parallel to the gate width direction; and a bulk pick-up region in the semiconductor substrate and abutting the source / drain region. The bulk pick-up region and the source / drain region have opposite conductivity types. The bulk pick-up region has a second width in the width direction, and wherein the second width is substantially less than the first width.

Disclosed is a dynamic semiconductor storage device in which the power supply current during the standby time is diminished to decrease the power consumption and to suppress the chip area from increasing. During the normal operation, the information as to a word line associated with a row address accessed during the normal operation is stored in a RAM. In entering self refresh, data of memory cells connected to a word line associated with a row address accessed during the normal operation time is read out and check bits for the data are appended in an encoder and written in a check bit area. As an initializing operation for the first self refresh entry after power up sequence, the data retention time of the memory cells is inspected every word line. Based on the results of inspection, the setting value of the refresh period of the word line is determined and written in the RAM to set the word line based refresh period. During error check for the refresh operation, any error is corrected by an error correction circuit.

The invention relates to a power MOSFET (Metal-Oxide -Semiconductor Field Effect Transistor) device of a novel groove structure and a manufacture method thereof. The unit cell of the element zone of the power MOSFET device adopts groove structure; an insulating oxide layer is arranged in the unit cell groove; the thickness of a second isolated gate oxide layer in the unit cell groove is more thanthe thickness of a first isolated gate oxide layer; conductive polysilicon is deposited in the cell unit groove; the extending distance of the first conductive polysilicon is more than the extending distance of the second conductive polysilicon in the unit cell groove; the groove mouth of the unit cell groove is covered by an insulating medium layer; a source electrode contact hole is filled withsecond contract hole filling metal; the second contract hole filling metal, a first conductive type filling zone and a second conductive type layer are in ohmic contact; source electrode metal is arranged above the unit cell groove; the source electrode metal and the second contact hole filling metal are electrically connected; and the first conductive polysilicon, the source electrode metal and the like are in potential connection. The power MOSFET device has the advantages of low conduction resistance, small grid leak electric charge Qgd, low switching speed, low switching loss, simple technology and low cost.