The invention relates to a protection device and a
processing method for a sensitive structure of a
quartz micromechanical
accelerometer. The protection device selects a
quartz crystal of the same material and
cut shape as the sensitive structure as a base material, adopts a high-precision
photolithography process to make patterns, and uses wet
etching It is processed by
etching process, and the sensitive structure and protective structure are assembled by
epoxy adhesive bonding, forming a three-layer
assembly structure in which the upper and lower
layers are the protective structure and the middle layer is the sensitive structure, and the upper and lower protective structures are sensitive to the middle layer. The
mass block on the structure plays the role of limit protection, and at the same time, the groove area is etched to a certain depth on the protection device, providing space for the deformation of the sensitive structural
mass block, and at the same time, high alignment accuracy is achieved with the help of an
optical microscope system. The protection device of the present invention effectively improves the
impact resistance of the sensitive structure, avoids the stress caused by the difference in
thermal expansion coefficient, improves the reliability of the sensitive structure, and has high
assembly precision, simple process and easy implementation.