114 results about "Norbornane" patented technology

Disclosed is a polyether polyamide elastomer particularly excellent in transparency while retaining properties such as dynamic physical properties, stiffness and resistance to fatigue from flexing. The polyether polyamide elastomer can be produced by polymerizing (A) a polyamide-forming monomer selected from (A1) an aminocarboxylic acid compound represented by the formula (1) and (A2) a lactam compound represented by the formula (2), (B) a diamine compound comprising (B1) a triblock polyether diamine compound represented by the formula (3) and (B2) at least one diamine compound selected from a branched saturated diamine having 6 to 22 carbon atoms, a branched alicyclic diamine having 6 to 16 carbon atoms and norbornanediamine, and (C) a dicarboxylic acid compound represented by the formula (4) with one another. H2N-R-COOH (1) wherein R represents a linking group having a hydrocarbon chain. (2) wherein R represents a linking group having a hydrocarbon chain. (3) wherein x represents a number ranging from 1 to 20, y represents a number ranging from 4 to 50, and z represents a number ranging from 1 to 20. HOOC-(R)m-COOH (4) wherein R represents a linking group having a hydrocarbon chain, and m represents 0 or 1.

Disclosed is a norbornane-2-spiro-a-cycloalkanone-a'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride represented by general formula (1), wherein n represents an integer of 0 to 12, and R1, R2, and R3 each independently represent a hydrogen atom or the like.

Disclosed are a polyamic acid having repeating units represented by the formula (1):wherein the norbornane skeleton ofcomprises four components ofand their contents satisfy the following:1%<=2,5-[diexo]<=90%,1%<=2,5-[exo,endo]<=90%,1%<=2,6-[diexo]<=90%,1% <=2,6-[exo,endo]<=90%,provided thatR represents from 4 to 27 carbon atoms, and represents a tetravalent group selected from the group consisting of an aliphatic group, a monocyclic aliphatic group, a condensed polycyclic aliphatic group, a monocyclic aromatic group, a condensed polycyclic aromatic group, and a non-condensed polycyclic aliphatic or aromatic group which is composed of cycloaliphatic or aromatic groups mutually bonded to each other either directly or via a crosslinking member; and a polyimide which is obtained by imidizing the polyamic acid and which has good properties intrinsic to polyimides, or that is, thermal resistance, mechanical properties, slidability, low water absorption, electric properties and radiation resistance intrinsic thereto. By varying the composition ratio of the starting diamine isomers, various polyimides having controlled thermal resistance, melt flowability, optical properties, chemical resistance and electric properties and capable of forming films of various forms can be obtained.

A pattern is formed by applying a positive resist composition comprising a polymer comprising 7-oxanorbornane ring-bearing recurring units and acid labile group-bearing recurring units and an acid generator onto a substrate to form a resist film, heat treating and exposing the resist film to radiation, heat treating and developing the resist film with a developer, and causing the resist film to crosslink and cure with the aid of acid and / or heat. A second resist pattern is then formed in the space area of the first resist pattern. The double patterning process reduces the pitch between patterns to one half.

A positive resist composition comprising: a resin that comprises a repeating unit including a specific norbornane lactone structure and a repeating unit including a specific alicyclic hydrocarbon structure, and that increases a solubility of the resin in an alkaline developer by an action of an acid; and a compound that generates an acid upon treatment with one of an actinic ray and radiation, and a pattern forming method utilizing the same.

The invention relates to a polycarbonate diol, comprising an organic residue derived from a diol component represented by formula (1),wherein n is 0 or an integer of 1 to 4, and the norbornane structure or the cyclopentane structure may be substituted with a halogen group or a hydrocarbon group.The polycarbonate diol according to the present invention can give a polyurethane resin having excellent heat resistance and flexibility in a well-balanced manner and reliability in long-term insulating properties under high temperature / high humidity conditions.

This polyimide precursor comprises: a tetracarboxylic acid component including a norbornane-2-spiro-alpha-cyclopentanone-alpha '-spiro-2''-norbornane-5,5'', 6, 6''-tetracarboxylic dianhydride or a derivative thereof; and a diamine component including diamine or a derivative thereof. The polymide precursor is characterized by the norbornane-2-spiro-alpha-cyclopentanone-alpha '-spiro-2''-norbornane-5,5'', 6, 6''-tetracarboxylic dianhydride having a peak area ratio for a specific peak of at least 60%, in a gas chromatograph obtained by gas chromatography analysis.

The purpose of the present invention is to provide a curable epoxy resin composition which is capable of forming a cured product that has high heat resistance, high light resistance, high thermal shock resistance, and especially excellent reflow resistance after moisture absorption. A curable epoxy resin composition of the present invention is characterized by containing (A) an alicyclic epoxy compound, (B) a monoallyl diglycidyl isocyanurate compound represented by formula (1), (C) a curing agent and (D) a curing accelerator. The curable epoxy resin composition is also characterized in that: a methyl norbornane-2,3-dicarboxylic acid anhydride is contained as an essential component of the curing agent (C); and the content of succinic acid anhydride in the whole curing agent (C) is 0.4% by weight or less. (In the formula, R1 and R2 may be the same as or different from each other, and each represents a hydrogen atom or an alkyl group having 1-8 carbon atoms.)