The invention belongs to the technical field of photoelectric functional materials and particularly relates to a phase-change-controllable totally-inorganic
perovskite thin film preparation method anddevice application. The method comprises the steps that (1), precursor
lead bromide and
cesium bromide are placed into a vapor deposition device correspondingly, a substrate is placed in a depositionarea, and
vacuum pumping is performed on the whole device; (2), an
inert gas is introduced into the vapor deposition device; (3), the
deposition temperature and deposition time are set, the
deposition temperature is selected from 500-800 DEG C, and at the different
deposition temperature,
perovskite thin film has different composition and
crystal forms. The phase-change-controllable totally-inorganic
perovskite thin film preparation method and the device application adopt a
chemical vapor deposition method, are simple in process condition, easy to control accurately and suitable for industrial production; meanwhile, the thin film has good uniformity and has good adhesiveness and
spreadability with the substrate material, and the prepared optoelectronic thin film has broad application prospects; and by means of change of the deposition temperature, controllable growth of perovskite phase from CsPb2Br5 to CsPbBr3 is realized, and a photoelectric
detector prepared on base of the perovskite thin film obtained by the phase-change-controllable totally-inorganic perovskite thin film preparation method shows good photoelectric response and switching characteristics.