58 results about "Carbon plasma" patented technology

A process for producing single-walled carbon nanotubes in a continuous manner includes carbon plasma generation, plasma stabilization, and product deposition. The plasma is generated by electrical resistance heating or electron beam vaporization of feedstock. The plasma is stabilized with radio frequency energy from inductance coils and with electrical resistance heaters in the reactor. Stabilization homogenizes the plasma energy density and concentration, leading to a more efficient reactor. Finally, a transition metal catalyst and associated catalyst support are used to form the end product. The formation region may have variations of geometry and supporting equipment that will affect the rate and purity of the swcnt production. The formation region is immediately downstream from the plasma stabilization region. In addition, the entire apparatus is designed so that it can be mounted vertically such that continuous deposition of product can be applied with precision using an overhead robotic arm.

The present invention provides a pulsed carbon plasma apparatus to produce a diamond-like carbon coating over an extended object, the coating having a high degree of thickness uniformity achieved by scanning the plasma flow over the surface of the object. The pulsed carbon plasma apparatus of the invention comprises a carbon plasma flow scanning device having at least one pair of deflecting coils, where the deflecting coils have, in the scanning plane, a different number of turns on opposite sides. The object may be made of metal, ceramic, glass or plastic. The coatings may be used to improve life and operating performance of tools and machine parts, and as decorative coatings.

A system and method of carburizing a surface region of an object includes subjecting a gas to electromagnetic radiation, generated from a radiation source (52), in the presence of a plasma catalyst (70) to initiate a plasma containing carbon. The method also includes exposing the surface region of the object to the plasma for a period of time sufficient to transfer at least some of the carbon from the plasma to the object through the first surface region.

The invention provides an organic light emitting diode (OLED), having a substrate, an anode layer of silver or gold, wherein the anode layer Is treated with CF₄ plasma to enhance the hole injection of the semitransparent anode layer.

The invention provides an enhanced cathodic arc source for arc plasma deposition. An improved cathodic arc source and method of DLC film deposition with a carbon containing directional-jet plasma flowproduced inside of cylindrical graphite cavity with depth of the cavity approximately equal to the cathode diameter. The generated carbon plasma expands through the orifice into ambient vacuum resulting in plasma flow strong self-constriction. The method represents a repetitive process that includes two steps: the described above plasma generation/deposition step that alternates with a recovery step. This step provides periodical removal of excessive amount of carbon accumulated on the cavity wall by motion of the cathode rod inside of the cavity in direction of the orifice. The cathode rod protrudes above the orifice, and moves back to the initial cathode tip position. The said steps periodically can be reproduced until the film with target thickness is deposited. Technical advantages include the film hardness, density, and transparency improvement, high reproducibility, long duration operation, and particulate reduction.

The invention relates to a device and method for depositing pure DLC (diamond-like carbon) by graphite cathode arc enhanced glow discharge. The invention aims to solve the problem that metal elementspollute DLC when the DLC is prepared by existing metal cathode arc enhanced glow discharge. A discharge path is constructed between a graphite cathode arc and an anode, carbon-containing gas is introduced into the discharge path, and the introduced carbon-containing gas is ionized by high-density electrons emitted by the graphite cathode arc and deposited on the surface of a workpiece to form thepure DLC. The proportion of ions to atoms in carbon-containing plasma can be controlled by changing a discharge mode between the cathode and the anode and adjusting discharge parameters. By the deviceand the method, the adverse effect of metal doping on tribological properties is avoided when the DLC is prepared by metal target enhanced glow discharge. The device and method are applied to the field of preparation of the DLC by plasma enhanced chemical vapor deposition.

The invention discloses a method for fabricating thin film circuits on a warped co-fired ceramic substrate in a polishing-free manner. The method comprises the following steps of 1), spraying the warped co-fired ceramic substrate with a BCB glue solution, and then performing solidification in a nitrogen atmosphere furnace according to a BCB solidification temperature curve; 2), spraying a solidified BCB medium layer with positive photoresist, exposing the positive photoresist over against a through hole column by using laser beams after pre-baking, performing development to remove the exposedpositive photoresist over against the through hole column, and performing post-baking on the photoresist; 3), etching a BCB medium by using oxygen/carbon tetrafluoride plasmas to expose the through hole column, and then removing a residual photoresist mask by using the oxygen plasmas or a photoresist removal solution; 4), based on the positive photoresist spraying and the laser beam photoetching,making a thin film circuit of a bottom layer; and 5), based on the positive photoresist spraying and the laser beam photoetching, making thin film circuits of subsequent layers.

The invention discloses an antibacterial and biocompatible bone implantation material and a preparation method and application thereof. The antibacterial and biocompatible bone implantation material comprises a bone implantation material body and a composite antibacterial layer formed on the surface of the bone implantation material body; the composite antibacterial layer is obtained by injectinga carbon-containing plasma or a silicon-containing plasma into a surface layer of the bone implantation material body to obtain a transition layer and then injecting a nitrogen-containing plasma or aphosphorus-containing plasma into the transition layer; the carbon-containing plasma, the silicon-containing plasma, the nitrogen-containing plasma and the phosphorus-containing plasma all do not contain hydrogen and oxygen; the relative surface potential of the antibacterial and biocompatible bone implantation material is 0.01-0.5 V. The antibacterial and biocompatible bone implantation materialand the preparation method and application thereof have the advantages that a plasma injection technology is adopted to construct the high potential surface, and the antibiosis and biosecurity are given to the surface of the bone implantation material.