A method for forming a superhard amorphous carbon coating in vacuum
A technology of amorphous carbon and carbon coating, applied in coating, vacuum evaporation coating, metal material coating process, etc., can solve the problems of high internal compressive stress, substrate deformation, etc., and achieve improved performance and enhanced surface hardness , the effect of improving biocompatibility
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example 1
[0034] A sample, such as freshly cleaved single crystal NaCl, is fixed in an appropriate apparatus and positioned at a 30° angle relative to the carbon plasma stream. A 30 nm thick carbon film was coated by arc sputtering graphite cathodes in a pulse discharge, using the following parameters: the voltage applied across the capacitor bank with a capacitance of 2000 μF was 300 V; the discharge pulse duration was 0.75 ms; the discharge pulse repetition frequency was 1 Hz . Under these conditions, the average energy of carbon ions is 35 eV. The sample had an initial temperature of 293K and a final temperature of 313K. During the coating of the carbon film, the temperature change of this sample was 20K. When the carbon films were separated from the single crystal NaCl, they were studied by means of electron diffraction and three amorphous halos were determined. For a detailed structural study of the near-range ordering in the atomic arrangement of carbon atoms, the angular distr...
example 2
[0036]A ground sample of hardened carbon steel with dimensions of 20 x 20 x 10 mm is used; the sample is fixed on a special device for heat removal and positioned in a vacuum chamber at an angle of 45° to the carbon plasma flow. The sample is placed in a vacuum chamber, and the vacuum chamber is evacuated to 10 -3 Pa pressure. The sample was treated with titanium ions generated by an arc source of titanium plasma using a consumable cathode made of titanium. Titanium ions were electrostatically accelerated by applying an accelerating negative voltage of 1000 V to the device. The arc current was set to 75A. The processing time was 3 minutes. Then the potential was lowered to 70 V and a 50 nm thick layer of titanium was applied. Subsequently, a carbon coating with a thickness of 5 μm was applied by sputtering with a pulsed vacuum arc from a graphite cathode, with the following parameters: the applied voltage to a capacitor bank with a capacitance of 2000 μF was 300 V; The di...
example 3
[0039] A silicone plate sample is fixed on a rotating horizontal surface in a vacuum chamber. Evacuate the vacuum chamber to 10 -3 Pa pressure. The panel surface was treated by accelerated argon ions using the following discharge parameters: discharge current 100 mA, discharge voltage 2000 V; treatment time 1.5 minutes. A 170 nm thick layer of carbon was then sputtered by arc pulses using the following parameters: the applied voltage to a capacitor bank with a capacitance of 2000 μF was 300 V; the discharge pulse duration was 1.0 ms; the discharge pulse repetition rate was 3 Hz. Under these conditions, the average energy of carbon ions is 25 eV. The carbon plasma beam is deflected at an angle of 15° towards the surface of the carbon deposit by a magnetic field.
[0040] The internal compressive stress in the carbon deposit is 0.5 GPa, which is determined from the deformation value of the silicone plate. The coatings produced were free from delamination.
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