Method for passivating cavity surface of semiconductor laser and semiconductor laser
A technology of lasers and semiconductors, applied in semiconductor lasers, lasers, laser components, etc., can solve the problems of cavity surface damage, affecting the output power and life of semiconductor lasers, etc., to improve reliability, solve bonding and passivation effects, and improve The effect of the reliability of the stable output
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[0026] The specific embodiments of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments.
[0027] In order to make the objectives, technical solutions and advantages of the present invention clearer, the embodiments of the present invention will be further described in detail below with reference to the accompanying drawings.
[0028] like figure 1 As shown, the passivation method for the cavity surface of the semiconductor laser provided by the embodiment of the present invention includes the following steps S1 to S8:
[0029] S1, the epitaxial wafer of the semiconductor laser is cleaved into bars in the air, loaded into a coating fixture, and then placed in a magnetron sputtering vacuum chamber.
[0030] S2, the hydrogen source in the magnetron sputtering vacuum chamber is turned on, and hydrogen plasma is generated by sputtering hydrogen with a radio frequency power of 100-150W, and the front cavity sur...
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