Method for preparing diamond-like carbon film by pulsed discharge deposition

A technology of diamond film and pulse discharge, which is applied in metal material coating process, gaseous chemical plating, coating, etc., to achieve the effect of improving structure morphology, reducing internal stress, and increasing carbon ion density

Inactive Publication Date: 2012-10-17
陈卫
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved in the present invention is to overcome the respective defects of the existing physical vapor deposition method and chemical vapor deposition method, and provide a method that can increase the deposition rate of DLC films, increase the adhesion of the film, reduce the internal stress of the film, and improve the surface roughness. Method for preparing diamond-like carbon thin films by pulse discharge deposition

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Example 1: After the metal workpiece is cleaned and dried by conventional ultrasonic waves, it is placed on the rotating bracket in the coating chamber in time, and then the vacuum degree in the coating chamber is evacuated to 3×10 -3 Pa, and then argon gas was introduced into the coating chamber with a pressure of 6×10 -1 Pa, start the rotating bracket, and turn on the ion cleaning source, the voltage is 2000V, a glow discharge is generated, the current is 45mA, a large amount of Ar+ is generated to bombard the surface of the workpiece, after ion cleaning for 10 min, the pulse arc discharge with graphite as the cathode electrode is started , the voltage is 380V, the pulse frequency is 12Hz, methane gas is introduced into the coating chamber, and the flow rate is 6sccm. The carbon ions formed by the pulse discharge and the high-energy neutral atoms of carbon collide with the methane gas molecules to generate new carbon ions and fly to the workpiece. A diamond-like film ...

Embodiment 2

[0015] Example 2: After cleaning and drying ceramic workpieces with conventional ultrasonic waves, they are placed on the rotating bracket in the coating chamber in time, and then the direct air in the coating chamber is evacuated to 3×10 -3 Pa, and then argon gas is introduced into the chamber, and the pressure is 6×10 -1 Pa, start the rotating bracket, and turn on the ion cleaning source, the voltage is 2500V, a glow discharge is generated, the current is 45mA, and a large amount of Ar+ is generated to bombard the surface of the workpiece. After 12 minutes of ion cleaning, the pulse arc discharge with graphite as the cathode electrode is turned on. The voltage is 220V, the pulse frequency is 12Hz, and ethane gas is introduced into the coating chamber with a flow rate of 6 sccm, thereby forming a diamond-like carbon film on the surface of the workpiece.

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PUM

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Abstract

The invention discloses a method for preparing a diamond-like carbon film by pulsed discharge deposition and belongs to the technical field of metal or nonmetal surface modification treatment. According to the method, DLC deposition is carried out on the surface of a workpiece by the adoption of pulsed arc discharge with graphite as the cathodic electrode and combined PVD and CVD methods for decomposition and ionization of hydrocarbon gas. The method comprises main operational steps of: ultrasonic cleaning, vacuum-pumping, ion cleaning and DLC deposition. During the ion cleaning process, argon is blown in. During the DLC deposition process, arc discharge pulse frequency is 5-35Hz, and voltage is 200-400V. A hydrocarbon gas which is blown in is preferably methane, ethane or propane. Through special pulsed arc discharge, high-speed and high-energy carbon plasma beam and the blown hydrocarbon gas molecules undergo impact ionization to increase carbon ion density and enhance diffraction performance. Therefore, DLC deposition speed is raised, adhesion is increased, internal stress is minimized, and precision and performance are improved.

Description

technical field [0001] The invention relates to a vacuum coating method applied to metal or non-metal surface modification treatment, especially a method for preparing a diamond-like film by pulse discharge deposition formed on the surface of a workpiece. Background technique [0002] Diamond-like carbon-DLC film (Diamond like carbon-DLC) is an amorphous carbon film. When there are more diamond phases (the bonded form of carbon is SP3) than graphite phases (the bonded form of carbon is SP2), the film layer shows Similar to diamond characteristics, the hardness reaches 75GPa, and the wear resistance rate is 1.3×10 -7 cm 3 / Nm, so it is called diamond-like carbon film. The preparation of the DLC film mainly includes physical vapor deposition (PVD) and chemical vapor deposition (CVD) methods, which use evaporating ionized graphite targets and decomposing ionized hydrocarbon gases respectively to obtain carbon ions with considerable energy hitting the surface of the substrate ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/27C23C16/515
Inventor 陈伟
Owner 陈卫
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