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36results about How to "Reduce chance of defects" patented technology

Dynamic-temperature-field preparation method for large-size C-axis sapphire crystal

InactiveCN104120488AAddressing Chance IncreasesNo Bubbles Low Defect DensityPolycrystalline material growthBy pulling from meltCrucibleCrystal growth
The invention relates to a dynamic-temperature-field preparation method for large-size C-axis sapphire crystal. An employed crystal growth furnace heating body comprises an auxiliary heating body at the upper part of the outer side of a crucible, an auxiliary heating body at the outer side and a main heating body at the lower part of the bottom. A tungsten filament of the auxiliary heating body at the upper part of the outer side of the crucible employs a left part and a right part which are in connection in a parallel way. The power of the auxiliary heating bodies and the main heating body are respectively independently controlled by corresponding temperature control systems. By independently controlling the power of the three heating bodies and utilizing the dynamic temperature field method during crystal growth, temperature fields adaptive to demands of expelling bubbles, expanding shoulder and constant-diameter growth of a crystal are formed in the hearth when the crystal grows. In the constant-diameter growth stage, a horizontal growth interface is employed, the crucible wall temperature is close to the melt temperature, and thus no defect is generated caused by impact of a melt convecting to the middle on the crystal growth solid-liquid interface because of high crucible wall temperature. Heat radiation of the crystal is uniform, and thus the center axis does not have too many defects caused by concentrated heat radiation at the center axis. Therefore, the crystal has less defects, and high-quality C-axis sapphire crystal can be grown and obtained.
Owner:浙江特锐新能源有限公司

Preparation method of silicon epitaxial wafer for high-voltage power device

The invention discloses a preparation method of a silicon epitaxial wafer for a high-voltage power device. According to the method, a reaction cavity of the epitaxial equipment is purified and the content of impurities accumulated in the cavity is reduced by long-time purging of large-flow hydrogen before epitaxial growth; the nonlinear gradient heating is adopted, so that the stress accumulated in the heating stage is released in time, and the generation probability of defects is reduced; and the reaction rate is significantly improved by shortening the distance between a quartz bell jar anda base of the reaction cavity of the epitaxial equipment and adopting a large-flow trichlorosilane and hydrogen proportioning mode, and high-speed epitaxial growth is realized under the premise of ensuring good crystallization quality of the silicon epitaxial wafer. The problem of comprehensive control on thickness, resistivity and crystallization quality in the existing preparation process is overcome by adopting the method of sectional growth of the silicon epitaxial wafer layer. the prepared silicon epitaxial wafer has a bright surface, is free from dislocation, staggered layers, slip linesand fog defects, realizes the controllability of material indexes such as thickness, resistivity and defects and meets the use requirements of the high-voltage power device.
Owner:CHINA ELECTRONICS TECH GRP NO 46 RES INST

Lost foam casting coating for gray cast iron and preparation method of lost foam casting coating

InactiveCN104624922AVolume phase transition is stableReduce dosageFoundry mouldsFoundry coresDefoaming AgentsActive agent
The invention discloses a lost foam casting coating for gray cast iron and a preparation method of the lost foam casting coating. The lost foam casting coating comprises an aggregate, a binder, a suspending agent, a surfactant, a defoaming agent, water and a preservative, wherein recovered pill-cleaning dust is adopted as one part of the aggregate; the finally prepared coating is good in air permeability; a high-temperature gas can be rapidly and almost invariantly discharged out of a coat when a thick-walled casting is poured; carbon black and blowhole defects are reduced to the minimal extent; in addition, absence of an adhesive sand defect is also ensured; the lost foam casting coating can be mixed evenly by the preparation method disclosed by the invention; and later use is facilitated. The lost foam casting coating is suitable for preparation of the lost foam casting coating.
Owner:SHIJIAZHUANG MANDINGFU CASTING CO LTD

Selective laser melting device

The invention discloses a selective laser melting device. The selective laser melting device comprises a rigid powder laying device, a milling tool cutting device and a control device. The rigid powder laying device comprises a scraping knife mechanism, a guide rail mechanism, a power mechanism and an overcurrent detection mechanism. The power mechanism drives the scraping knife mechanism to movealong the guide rail mechanism. The overcurrent detection mechanism is arranged on the scraping knife mechanism and is connected with the control device. The milling tool cutting device comprises a mechanical arm and a milling tool. The control device is used for receiving and analyzing detection information transmitted by the overcurrent detection mechanism and controls the mechanical arm and themilling tool to realize the high point cutting action according to the detection information. The selective laser melting device conducts forced scraping on high points by means of the rigidity of ascraping knife in the powder laying process. If the high points are cut off by the scraping knife, the powder laying action can be completed smoothly. If the scraping knife gets stuck, cutting of thehigh points is realized through monitoring of the overcurrent detection mechanism and cutting of the milling tool cutting device. It is guaranteed that no high point exist in the manufacturing process. The defect rate of parts is greatly reduced. The precision of the parts is improved.
Owner:TSC LASER TECH DEV BEIJING CO LTD

Electromagnetic induction annular heating laser cladding nozzle device and laser cladding device

The invention provides an electromagnetic induction annular heating laser cladding nozzle device and a laser cladding device. The nozzle device comprises a connecting part, an induction coil fixing part, a ceramic inner ring, induction heating coils, an induction heating power supply, a thermocouple and a thermocouple power supply; the induction heating coils are arranged in the induction coil fixing part and is connected to the induction heating power supply; the ceramic inner ring is arranged in the induction coil fixing part, a powder flow channel is formed between the ceramic inner ring and the induction coil fixing part, a thermocouple mounting hole is formed in the ceramic inner ring, and a thermocouple is mounted in the thermocouple mounting hole and connected to the thermocouple power supply; and the connecting part is connected to the ceramic inner ring and the induction coil fixing part, a powder inlet channel communicated with the powder flow channel is formed in the connecting part, and a laser beam channel is formed in the center of the connecting part and the ceramic inner ring. According to the electromagnetic induction annular heating laser cladding nozzle device and the laser cladding device, laser cladding powder is preheated before the powder is converged into a laser beam focus area, and the laser cladding efficiency is improved.
Owner:SHAANXI TIANYUAN MATERIALS PROTECTION TECH

Antioxidant spraying device and process for seamless steel tube production

The invention discloses an antioxidant spraying device and an antioxidant spraying process for seamless steel tube production. The spraying device comprises an annular cavity punching machine, a firstpipeline and a second pipeline, wherein the annular cavity punching machine is formed by an ejection rod with an ejection head and a roller, the middle of the ejection rod is conducted, the first pipeline and the second pipeline are arranged in a through hole of the ejection rod, one of the first pipeline and the second pipeline is used as an antioxidant pipeline, the other pipeline is used as acooling water pipeline, an outlet of the antioxidant pipeline is opposite to the inner wall of a hollow capillary, and an outlet of the cooling water pipeline is opposite to the top end of the ejection rod. According to the antioxidant spraying device and the antioxidant spraying process for seamless steel tube production, the inner wall, on which an antioxidant is not sprayed, of the hollow capillary can be prevented from making contact with air, so that the probability of defects of the inner wall of the hollow capillary is reduced, the surface quality of the inner wall of a steel tube is increased, special stations for spraying the antioxidant are reduced, and the production rhythm is increased.
Owner:TAIYUAN HEAVY MACHINERY GRP ENG TECH R & D CO LTD

Method for improving banded structure of hot-formed steel plate

ActiveCN113755746AReduce the chance of banding defectsImprove band tissueProcess efficiency improvementSteel platesRare-earth element
The invention relates to a method for improving a banded structure of a hot-formed steel plate. The method comprises the steps of adjusting chemical components of the plate and optimizing the production process of the plate. The adjustment of the chemical components of the plate specifically comprises the step of adding a rare earth element RE into the plate. In addition, by controlling the content of harmful element components, the purity of molten steel, the controlled rolling and controlled cooling process, the cold rolling process and the annealing process, the generation probability of banded structure defects of the hot-formed steel product is further reduced. By adopting the technical scheme, the purity of molten steel can be improved, the structure of a steel plate can be refined, the generation of banded structure defects of a product can be reduced, and the requirements of high-quality steel types can be met without adding additional equipment and treatment means.
Owner:TANGSHAN IRON & STEEL GROUP +1

Semiconductor structure and method for forming semiconductor structure

The invention provides a semiconductor structure and a method for forming the semiconductor structure. The method comprises a step of providing a substrate which comprises a core region and a high-voltage region, wherein a pad oxide layer is on the core region and the high-voltage region, a step of removing the pad oxide layer, a step of forming a first dielectric layer at least on the high-voltage region after removing the pad oxide layer, a step of forming a hard mask layer on the first dielectric layer, and a step of forming isolation structures in the core region and the high-voltage region with the hard mask layer as a mask. The pad oxide layer is removed before forming the isolation structures, the number of times of the wet etching process after the subsequent formation of the isolation structures can be effectively reduced, the reduction of the probability of the occurrence of bridging and short circuit problems is facilitated, the probability of defects in a subsequently formed gate structure is reduced, and the improvement of the performance of the formed semiconductor structure is facilitated.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1

Photoresist processing system

ActiveCN110858542AReduce the chance of defectsEffective lift offSemiconductor/solid-state device manufacturingPhotoresistMaterials science
A photoresist processing system for processing a magnetic photoresist carried by a substrate, including a holding device and a magnetic device is disclosed. The holding device includes at least one combining section arranged to hold the substrate; the magnetic device is positioned on a specific position away from the combining section, wherein a magnetic field generated by the magnetic device hasa magnetic effect on the photoresist.
Owner:TAIZHOU GUANYU TECH CO LTD

A method for preparing silicon epitaxial wafers for high-voltage power devices

The invention discloses a method for preparing a silicon epitaxial wafer for a high-voltage power device. This method purifies the reaction chamber of the epitaxial equipment by long-time purging of large flow of hydrogen before epitaxial growth, and reduces the content of impurities accumulated inside the chamber; the non-linear gradient heating is adopted to release the stress accumulated in the heating stage in time, reducing the The probability of defect generation; by shortening the distance between the quartz bell jar and the pedestal of the reaction chamber of the epitaxial equipment, and adopting a large-flow ratio of trichlorosilane and hydrogen, the reaction rate is significantly improved, and the crystallization quality of the silicon epitaxial wafer is guaranteed. Realize high-speed epitaxial growth under the premise; by adopting the method of segmented growth of silicon epitaxial layer, the comprehensive control problems of thickness, resistivity and crystal quality in the existing preparation process are overcome; the surface of the silicon epitaxial wafer produced is bright and free of dislocations , stacking fault, slip line and fog defects, realize the controllability of material indicators such as thickness, resistivity and defects, and meet the use requirements of high-voltage power devices.
Owner:CHINA ELECTRONICS TECH GRP NO 46 RES INST

Method for improving quality of casting blank

PendingCN113399640AQuality improvementSolve the backlog of contradictionsWater flowEngineering
The invention discloses a method for improving the quality of a casting blank. The method comprises the following steps that the cooling water flow of a crystallizer is adjusted to 130 m<3>/h-140 m<3>/h; (2), according to the atomization effect, the nozzle model of each section is selected, wherein the nozzle model of a foot roller section is 3/8PZ10067QZ5, the nozzle model of a section I of a spraying section is 3/8PZ4565QZ2, the nozzle model of a section II of the spraying section is HPZ2.5-65QZ2, and the nozzle section of a section III of the spraying section is HPZ2.5-65QZ2; (3), the casting speed of 70# and 82B high-carbon steel is set to be 1.75+/-0.02 m/min; (4), electromagnetic stirring parameters of the crystallizer of the 70# and 82B high-carbon steel are set as follows that the current is 320 A, the frequency is 3.5 Hz, and the specific water flow is 0.78 L/kg; and (5), secondary cooling water distribution is conducted, specifically, section III water supply is closed, section II water is reduced to 5 m<3>/h-6 m<3>/h, and section I water is reduced to 10 m<3>/h-11 m<3>/h. According to the method, after processes such as casting machine secondary cooling nozzles, electric stirring parameters and water distribution are optimized, internal cracks and center segregation defects are effectively controlled, and the internal quality of the casting blank is further improved.
Owner:SHOUGANG SHUICHENG IRON & STEEL GRP
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