In one embodiment, a
system for imaging an acquisition target or an
overlay or alignment
semiconductor target is disclosed. The
system includes a beam generator for directing at least one
incident beam having a
wavelength λ towards a periodic target having structures with a specific
pitch p. A plurality of output beams are scattered from the periodic target in response to the at least one
incident beam. The
system further includes an
imaging lens system for passing only a first and a second output beam from the target. The imaging system is adapted such that the angular separation between the captured beams, λ, and the
pitch are selected to cause the first and second output beams to form a sinusoidal image. The system also includes a sensor for imaging the sinusoidal image or images, and a controller for causing the beam generator to direct the at least one
incident beam towards the periodic target or targets, and for analyzing the sinusoidal image or images. In one application the
detector detects a sinusoidal image of an acquisition target with the same
pitch as the designed target and the controller analyzes the pitch of the sinusoidal image compared to
design data to determine whether the target has been successfully acquired. In a second application a first and second periodic target that each have a specific pitch p are imaged so that the
detector detects a first sinusoidal image of the first target and a second sinusoidal image of the second target and the controller analyzes the first and second sinusoidal image to determine whether the first and second targets have an
overlay or alignment error.