63results about How to "For subsequent cleaning" patented technology

The invention discloses an aqueous grinding fluid applied to super precision grinding of hard and brittle materials and an application method thereof. The grinding liquid contains chelant 0.1-5, a pH value regulator 5-15, a suspending agent 0.2-5, a dispersion stabilizer 0.5-10, a lubricant 5-20, an antirusting agent 0.5-5, fungicide 0-2, a defoamer 0-2 and deionized water compensating the balance of total amount of 100 parts. Under an alkali condition, the aqueous grinding fluid applied to super precision grinding of hard and brittle materials is beneficial for grinding materials with various sizes, has good suspension property and dispersion stability; when the aqueous grinding fluid is used for super precision grinding of various different hard and brittle materials, especially high-hardness materials, scratches, etching pits and other defects are not produced easily; and the grinding speed is high, the subsequent cleaning is convenient; and the aqueous grinding fluid has excellent lubricating property and antirusting property when in matched use with the grinding materials, and the mixing liquid is uniform in color and has no sediment in 48 h. When the aqueous grinding fluid is used for grinding a wafer on a grinding machine, the ground wafer is subjected to water-added ultrasonic washing, and the wafer has good surface smooth finish, no scales, etching pits and other defects, and the surface roughness can be within 2 microns.

The invention discloses a paint stirring kettle, which comprises a kettle body, a kettle cover, a motor, a rotating shaft, a stirring paddle, a frame, a swing mechanism and a rubber sleeve. The lid of the kettle is closed on the body of the kettle, the lid of the kettle is provided with a feed port, the bottom of the body of the kettle is provided with a discharge port, and the frame includes two brackets and beams. The swing mechanism includes a first spring part and a telescopic device, and a plurality of first spring parts are distributed on both sides of the kettle body; one end of the first spring part is connected with the corresponding bracket, and the other end of the first spring part is connected with the kettle body; The fixed end of the device is arranged on the bracket, and the telescopic end of the telescopic device extends toward the position direction of the still body. The rubber sleeve is sleeved on the part of the rotating shaft protruding from the kettle cover and the output shaft of the motor, and the bottom of the rubber sleeve is sealed and connected to the kettle cover. The invention has the advantages of good stirring uniformity, high stirring effect, convenient follow-up cleaning and increased output.

The invention discloses washable stamping and drawing oil. The washable stamping and drawing oil is prepared from the following components in percentage by weight: 10 to 15 percent of base oil 150SN, 5 to 10 percent of high-viscosity self-emulsified ester, 3 to 5 percent of vulcanized aliphatic acid ester, 1 to 3 percent of sulfurized olefin, 30 to 40 percent of chlorinated paraffin, 1 to 5 percent of phosphate, 1 to 5 percent of calcium petroleum sulfonate, 5 to 15 percent of sodium petroleum sulfonate, 1 to 5 percent of tall oil fatty acid, 1 to 5 percent of iso-tridecanol polyoxyethylene ether, 1 to 5 percent of organic alcohol ether, 1 to 5 percent of pH buffering agent and 1 percent of corrosion inhibitor. The performance of the washable stamping and drawing oil disclosed by the invention can completely meet the service demand of a stamping and drawing process; the washable stamping and drawing oil can successfully replace the current pure oil type stamping and drawing oil and is easy to clean.

The invention discloses a method for manufacturing polycrystalline silicon solar cells with selective emitters. The method includes steps of (1), cleaning silicon wafers and etching textures of the silicon wafers; (2), growing active doping agents; (3), placing the silicon wafers in a diffusion furnace and cooling the diffusion furnace until the temperature of the diffusion furnace ranges from 500 DEG C to 550 DEG C; (4), feeding N<2> and O<2> into the diffusion furnace to perform oxidization after the temperature of the diffusion furnace is stable; (5), heating the diffusion furnace at the speed ranging from 5 DEG C / min to 10 DEG C / min until the temperature of the diffusion furnace ranges from 850 DEG C to 870 DEG C and feeding gas with a phosphorus source into the diffusion furnace to perform diffusion after the temperature of the diffusion furnace is stable; (6), keeping the temperature of the diffusion furnace unchanged, feeding N<2> and O<2> into the diffusion furnace to perform constant-temperature propulsion; (7), cooling and discharging; and (8), cleaning, etching, removing edges, coating anti-reflection films, performing screen printing and sintering so as to obtain the polycrystalline silicon solar cells with the selective emitters. The novel method for manufacturing the polycrystalline silicon solar cells with the selective emitters has the advantages that the manufacturing cost is low, the manufacturing time is short, and the method is compatible to an existing standard cell process and has an industrialization prospect.