The invention provides a sodium-doped molybdenum plane sputtering target material. The sodium-doped molybdenum plane sputtering target material comprises molybdenum and sodium, wherein molybdenum atoms account for 90-99%, and the remaining is sodium atoms. The invention further provides a preparation method of the sodium-doped molybdenum plane sputtering target material. The sodium-doped molybdenum plane sputtering target material provided by the invention can greatly improve the conversion efficiency of a copper indium gallium selenium thin film battery, reduce production cost and realize large-scale industrialization of the copper indium gallium selenium thin film batteries by doping a sodium element in a molybdenum back electrode. According to the preparation method, molybdenum trioxide, sodium hydroxide and the molybdenum metal are taken as raw materials, and the sodium-doped molybdenum plane sputtering target material is prepared through reaction, ball milling, screening, hot pressing and other processes; the preparation method has the advantages of simple processes and low cost and is suitable for industrial production; and as for the prepared target material, the relative density is high and can be above 95%, the oxygen density is high and can achieve 250ppm, and the size is small and can achieve 60-100mu m.