1322 results about "Active oxygen" patented technology

Embodiments of the invention provide methods for forming hafnium materials, such as oxides and nitrides, by sequentially exposing a substrate to hafnium precursors and active oxygen or nitrogen species (e.g., ozone, oxygen radicals, or nitrogen radicals). The deposited hafnium materials have significantly improved uniformity when deposited by these atomic layer deposition (ALD) processes. In one embodiment, an ALD chamber contains an expanding channel having a bottom surface that is sized and shaped to substantially cover a substrate positioned on a substrate pedestal. During an ALD process for forming hafnium materials, process gases form a vortex flow pattern while passing through the expanding channel and sweep across the substrate surface. The substrate is sequentially exposed to chemical precursors that are pulsed into the process chamber having the vortex flow.

A low-foaming cleaning solution and dry particulate formulation which can be diluted with water, deionized water, or mixtures thereof, to form the cleaning solution. The cleaning solution has an alkaline pH, which is preferably from about 8 to about 11.5 and consists essentially of at least one low foaming surfactant in a concentration of from about 0.005% to about 40% w / w of the total solution, at least one active oxygen releasing compound in an amount effective to produce a hydrogen peroxide concentration of from about 0.005% to about 50% w / w of the total solution, at least one builder in a concentration of from about 0.001% to about 50% w / w of the total solution, and at least one diluent selected from the group consisting of water, deionized water, and mixtures thereof. The at least one surfactant is selected from the group consisting of C3-C8 alkane sulfonates, C3-C8 alkyl sulfates, C1-C7 alkyl naphthalene sulfonates, polyoxyethylene / polyoxypropylene block copolymers having a polyoxypropylene molecular weight of from about 1500 to about 8500, of which less than about 30% of the total molecular weight is due to the polyoxyethylene portion, and mixtures thereof. The at least one active oxygen releasing compound is selected from the group consisting of hydrogen peroxide, at least one source of hydrogen peroxide, and mixtures thereof.

A stabilized basic aqueous liquid detergent composition is disclosed. The composition comprises hydrogen peroxide, a hydrogen peroxide stabilizer or a mixture of hydrogen peroxide stabilizers, an anionic surfactant or mixture of anionic surfactants, a non-ionic surfactant or mixture of anionic surfactants, and a builder or a mixture of builders. The composition maintains a homogeneous single phase, maintains active oxygen level, and gives a high level of cleaning performance.