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358results about How to "Uniform removal" patented technology

Plasma Processing Apparatus

A plasma processing apparatus wherein a layer structure consisting of plural layers formed in stack one upon another on a semiconductor wafer placed on the sample holder located in the process chamber, is etched with plasma generated in the process chamber by supplying high frequency power to the electrode disposed in the sample holder, the apparatus comprising a ring-shaped electrode disposed above the electrode and around the periphery of the top portion of the sample holder, an outer circumferential ring of dielectric material disposed above the ring-shaped electrode and opposite to the plasma, and a power source for supplying power at different values to the ring-shaped electrode depending on the sorts of layers of the layer structure.
Owner:HITACHI HIGH-TECH CORP

Dry etch process

A method for conformal dry etch of a liner material in a high aspect ratio trench is achieved by depositing or forming an inhomogeneous passivation layer which is thicker near the opening of a trench bat thinner deep within the trench. The methods described herein use a selective etch following formation of the inhomogeneous passivation layer. The selective etch etches liner material faster than the passivation material. The inhomogeneous passivation layer suppresses the etch rate of the selective etch near the top of the trench (where it would otherwise be fastest) and gives the etch a head start deeper in the trench (where it would otherwise be slowest). This method may also find utility in removing bulk material uniformly from within a trench.
Owner:APPLIED MATERIALS INC

Detergent and bleach compositions

Detergent or bleach composition comprising a host-guest complex of diacyl and / or tetraacyl peroxide bleaching species in the form of an aggregate having a weight average particle size of at least 106 μm and an anti-deposition polymer.
Owner:THE PROCTER & GAMBLE COMPANY

Three-dimension laser fine machining system and method for crisp and hard materials

The invention provides a three-dimension laser fine machining system and method for crisp and hard materials. The method comprises the steps that a laser scanning machining scheme according to the model of a to-be-machined part, the model of a machining pattern and the machining requirements, specifically, the scheme comprises the process of determining the laser machining parameters and the process of determining the number of machining layers; scanning filling schemes corresponding to the machining layers are made in the pattern filling area; the laser focus is adjusted dynamically in the machining process, light spots are made to keep focusing in each machining position, and focus spots are uniform and coincident; the laser scanning filling schemes are changed every time one or more layers of materials are scanned and removed; and after one or more layers are scanned in the pattern filling area, laser contour scanning is conducted in the pattern contour area one or more times. The three-dimension laser fine machining system and method for the crisp and hard materials can achieve high-precision and efficient machining of the crisp and hard materials by making full use of the various advantages of fine light spot laser scanning machining.
Owner:苏州菲镭泰克激光技术有限公司

Cap layer removal in a high-k metal gate stack by using an etch process

In a replacement gate approach, the dielectric cap layers of the gate electrode structures are removed in a separate removal process, such as a plasma assisted etch process, in order to provide superior process conditions during the subsequent planarization of the interlayer dielectric material for exposing the sacrificial gate material. Due to the superior process conditions, the selective removal of the sacrificial gate material may be accomplished with enhanced uniformity, thereby also contributing to superior stability of transistor characteristics.
Owner:GLOBALFOUNDRIES US INC

Preparation technology of diethylene triamine pentacetic acid modified polyvinylidene fluoride separation membrane and resin

The invention provides a technology for preparing a diethylene triamine pentacetic acid modified polyvinylidene fluoride separation membrane by a physical blending/phase transition technology and a chemical grafting blending/ phase transition technology. The technology is as follows: reagents such as diethylene triamine pentacetic acid, polyvinylidene fluoride, melamine, dimethyl sulfoxide, acrylic acid, polyvinylpyrrolidone and the like are taken as raw materials; diethylene triamine pentacetic acid polyamino and polycarboxylic acid compound is uniformly mixed in a polyvinylidene fluoride separation membrane and resin respectively by the physical blending/phase transition technology and the chemical grafting blending/ phase transition technology. The technology improves the hydrophobic properties of the conventional polyvinylidene fluoride micro-filtration separation film and the resin, realizes metallic ions in waste water, and has the advantages of simple operation, uniform blending and the like. The diethylene triamine pentacetic acid modified polyvinylidene fluoride separation membrane and the resin increase the purification efficiency of drinking water, realize the resource utilization of the heavy metal in the industrial wastewater, and expand the application field of the polyvinylidene fluoride micro-filtration separation film.
Owner:YANSHAN UNIV

Substrate cleaning method, substrate cleaning system and program storage medium

InactiveUS20070267040A1Improve removalEnhance remove efficiencySemiconductor/solid-state device manufacturingElectrostatic cleaningEngineering
A substrate cleaning method can uniformly removing particles from substrates at a high removing efficiency. The substrate cleaning method includes the steps of immersing substrates W in a cleaning liquid in a cleaning tank 12, and generating ultrasonic waves in the cleaning liquid contained in the cleaning tank. A region in the cleaning tank toward which the cleaning liquid is supplied is varied with respect to a vertical level in the step of generating ultrasonic waves in the cleaning liquid while the cleaning liquid is being supplied into the cleaning tank.
Owner:TOKYO ELECTRON LTD

Sulfur purge control method for exhaust gas purifying system and exhaust gas purifying system

In an exhaust gas purifying system (1) which is equipped with a NOx occlusion reduction type catalyst (11) and an oxidation catalyst (12) set on the upstream side of the catalyst (11) and in which sulfur purge control for regenerating the sulfur-poisoned catalyst (11) is conducted, in conducting the sulfur purge control, the air fuel ratio control for sulfur purge is conducted after the temperature difference (ΔTIO) between the inlet side and outlet side of the catalyst (11) has been reduced to a prescribed level (ΔT0) or below by raising the exhaust temperature. According to the invention, the sulfur poison on the catalyst (11) can be uniformly removed in the sulfur-purge regeneration control, whereby the service life of the catalyst (11) can be protected from being shortened by sulfur poisoning. Further, the catalyst (11) can be protected from the thermal deterioration caused by partial temperature rise inside the catalyst (11) on its downstream side, so that the service life of the catalyst (11) can be protected from being shortened by thermal deterioration.
Owner:ISUZU MOTORS LTD

Method of laser drilling

In a method for the laser drilling of holes in a circuit substrate with the aid of a perforated mask, a laser beam is moved in the region of the perforated mask on a circular path. The center point of the region lies concentrically with respect to the set position of the respective hole in the mask. Further, the diameter of the region is smaller than the diameter of the hole. At the same time, the diameter of the laser beam spot is chosen to be large enough that it always covers the center point of the perforated mask during the circular motion. As a result, an energy distribution of the laser energy, which is as uniform as possible, is achieved in the region of the perforated mask.
Owner:HITACHI SEIKO

Fuel cell

In a fuel cell, a porous portion is formed in a separator. At a surface of the porous portion opposite to a surface where a reactant gas passage is formed, a cooling gas passage is formed. The cooling gas passage may be fluidly connected to a reactant gas supply passage for supplying reactant gas to the fuel cell. The cooling gas passage is controllable in flow amount. The porous portion is formed only in a separator portion where a downstream portion of the reactant gas passage is located. At a separator portion where an upstream portion of the reactant gas passage is located, a coolant passage is formed. A rib and a rib-bottom portion have a great porosity. A groove may be filled with porous material. The porous portion may be replaced by a water exchange portion. A portion of the separator other than the region of the porous portion may be made by porous material. Due to these, a fuel cell can be obtained where removal of product water is improved, product water can be utilized for humidifying gas, and product water can be uniformly removed.
Owner:TOYOTA JIDOSHA KK

Force control method for robotic abrasive belt grinding machining for blade

The invention discloses a force control method for robotic abrasive belt grinding machining for a blade. The force control method for robotic abrasive belt grinding machining for the blade comprises the following steps: modulation and processing for voltage signals; compensation for a converted force; and a force control strategy. The modulation and processing for the voltage signals comprises thefollowing steps: acquiring the voltage signals of six channels of a sensor; carrying out software filtering on the acquired voltage signals; and converting the filtered voltage signals to force signals. The compensation for the converted force comprises the own zero drift compensation of the sensor and gravity compensation for a robotic end load. The force control strategy comprises hybrid force-position control and PI/PD control. The force control method for robotic abrasive belt grinding machining for the blade is capable of increasing the efficiency of the grinding machining, avoiding thecase of low consistency of manual grinding machining, realizing constant-force grinding machining, and keeping a uniform and consistent removal amount of a surface material, thereby improving the surface consistency of the blade while improving the machining accuracy and surface quality.
Owner:HUAZHONG UNIV OF SCI & TECH

Bubble column-type fischer-tropsch synthesis slurry bed reaction system

A bubble column-type slurry bed reaction system is provided in which an operating system, which synthesizes liquid hydrocarbons by the Fischer-Tropsch (FT) synthesis reaction and separates and derives a catalyst and liquid hydrocarbon products from a slurry composed of gas, liquid and solid phases, can be simplified, and deterioration of catalyst particles caused by attrition and so forth can be reduced. In this FT synthesis reaction system, a bubble column-type slurry bed Fischer-Tropsch synthesis reaction process, in which synthesis gas supplied continuously from the bottom of a reactor and suspended catalyst particles are contacted to form liquid hydrocarbons, gaseous hydrocarbons and water, a process in which a slurry of suspended liquid products formed in the Fischer-Tropsch synthesis reaction process and catalyst particles moves from the reactor to the lower portion of a separation vessel through a downwardly inclined transfer pipe to separate the catalyst particles and gaseous products, a process in which the liquid products formed in the Fischer-Tropsch synthesis reaction process is sent to the separation vessel through a horizontal connecting pipe installed above the downwardly inclined transfer pipe and derived from its apex, a process in which liquid products are derived from the separation vessel, and a process in which a
slurry in which catalyst particles are concentrated is derived from the bottom of the separation vessel and circulated to the bottom of the reactor, are driven by the driving force of synthesis gas introduced from the bottom of the reactor and which rises through the slurry bed reactor without using an external drive power source for circulation, and the formed liquid hydrocarbon products, gaseous hydrocarbon products and water are separated and derived without using an external drive power source for separation.
Owner:INPEX CORP +4
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