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87results about How to "Reduction in yield" patented technology

System and method for managing and predicting crop performance

The invention provides a method of managing fertiliser and irrigation inputs for a crop, the method comprising obtaining management data for the crop, the management data including a planting date for the crop; obtaining weather data representative of the geographic area of the crop; obtaining soil description data representative of the geographic area of the crop; calculating an emergence date at least partly from the planting date; calculating a plurality of nitrogen deficit values at least partly from the emergence date and the soil description data, the nitrogen deficit values associated with respective dates each later than the emergence date; calculating a plurality of water deficit values at least partly from the emergence date and the weather data, the water deficit values associated with respective dates each later than the emergence date; and presenting on a display a schedule of recommended nitrogen application values, irrigation values and application dates, the schedule calculated at least partly from the nitrogen deficit values and the water deficit values.
Owner:NEW ZEALAND INST FOR CROP & FOOD RES

Substrates or assemblies having directly laser-fused frits, and/or method of making the same

InactiveUS20120207952A1Reduction in yieldPattern and/or coating process be complicateRadiation applicationsDecorative surface effectsOptoelectronicsMaterials science
Certain example embodiments relate to substrates or assemblies having laser-fused fits, and / or methods of making the same. In certain example embodiments, a pattern is formed or written on a stock glass sheet by laser fusing frit material to the glass sheet. An optional thin film coating is disposed on and supported by the stock glass sheet. The stock glass sheet with the pattern and the optional thin film coating is cut prior to heat treatment (e.g., heat strengthening and / or thermal tempering). A YAG or other type of laser source may be used to directly or indirectly heat the frit material, which may be wet applied to the substrate. In certain instances, the laser firing of the frit raises the temperature of the glass substrate to no more than 100 degrees C. and, preferably, the temperature is kept even lower.
Owner:GUARDIAN GLASS LLC
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