38 results about "Plasma cloud" patented technology

A method of producing a radiating plasma with an increased flux stability and uniformity is disclosed. The method comprises the steps of generating a primary target by urging a liquid under pressure through a nozzle; directing an energy pre-pulse onto the primary target to generate a secondary target in the form of a gas or plasma cloud; allowing the thus formed secondary target to expand for a predetermined period of time; and directing a main energy pulse onto the secondary target when the predetermined period of time has elapsed in order to produce a plasma radiating X-ray or EUV radiation. The pre-pulse has a beam waist size that is larger, in at least one dimension, than the corresponding dimension of the primary target.

A method and system for extracting radar scattering feature data based on plasma near-field testing are disclosed. An ISAR imaging principle is adopted in a microwave anechoic chamber simulating vacuum environment, and a one-dimensional scanning near-field test method is employed to test scattering performance of a tested target. A near-field scattering 2D image of the tested target is obtained, and near-field correction techniques are used to correct errors of influence error exerted by spherical waves on RCS performance tests. A scattering center is adopted to achieve far-field RCS extrapolation of the tested target, and radar scattering cross section far field data of the test target is obtained. Via the test and the data extraction method, overall target radar cross section data of a plasma-coated aircraft can be provided for a special environment that generates plasma clouds and for peculiar diffusion and ionization characteristics of plasma. A test angle covers a wide angle rangeof -30 degrees to 30 degrees, test accuracy is higher than 2dB, and therefore a test method is provided for plasma stealth technology research and stealth performance evaluation.

A device to place an incision into matter with a harmonious plasma cloud. A radiofrequency generator system produces pulsed or continuous electromagnetic waveform which is transmitted by an active transmitter incising electrode tip. This generated electromagnetic wave is utilized to initiate a plasma cloud with processes such as thermal ionization and a photoelectric effect which then trigger an Avalanche Effect for charged atomic particles at the surface of the active transmitter incising electrode tip. This electromagnetic wave is impedance matched, frequency matched, power matched and tuned to the plasma cloud in order to sustain and control a harmonious plasma cloud with reduced atomic particle turbulence and chaos. This harmonious plasma cloud forms a coating over the surface of the active transmitter electrode tip as well as acts to reduce the energy needed from the power amplifier of our plasma cutting device. The electromagnetic wave is also used to produce a Pinch Effect to compress, contour, shape and control the harmonious plasma cloud. The electromagnetic wave is furthermore used to trap and contain the plasma cloud without the need of a solid matter containment vessel according to the Magnetic Bottle Effect of physics and a generated centripetal electric field force that acts to pull plasma particles inward toward the activated incising electrode tip. The Tunnelling Effect of physical chemistry is utilized to focus and amplify the energy delivered to the harmonious plasma cloud while shielding matter surrounding the intended path of incision from potential electromagnetic radiation exposure. The invention is an efficient, effective, safe, clean and inexpensive device which can be used to place an incision in matter.

The invention relates to a method for plasma-assisted chemical vapour deposition for coating, or removing material from, the inner wall of a hollow body (42). A gas lance (44) is introduced into the hollow body (42), and a cavity plasma (45) is formed by applying an electrical high-frequency field to a high-frequency electrode (41), forming a plasma cloud arranged on the tip of the gas lance.

A device to place an incision into matter with a harmonious plasma cloud. A radiofrequency generator system produces pulsed or continuous electromagnetic waveform which is transmitted by an active transmitter incising electrode tip. This generated electromagnetic wave is utilized to initiate a plasma cloud with processes such as thermal ionization and a photoelectric effect which then trigger an Avalanche Effect for charged atomic particles at the surface of the active transmitter incising electrode tip. This electromagnetic wave is impedance matched, frequency matched, power matched and tuned to the plasma cloud in order to sustain and control a harmonious plasma cloud with reduced atomic particle turbulence and chaos. This harmonious plasma cloud forms a coating over the surface of the active transmitter electrode tip as well as acts to reduce the energy needed from the power amplifier of our plasma cutting device. The electromagnetic wave is also used to produce a Pinch Effect to compress, contour, shape and control the harmonious plasma cloud. The electromagnetic wave is furthermore used to trap and contain the plasma cloud without the need of a solid matter containment vessel according to the Magnetic Bottle Effect of physics and a generated centripetal electric field force that acts to pull plasma particles inward toward the activated incising electrode tip. The Tunnelling Effect of physical chemistry is utilized to focus and amplify the energy delivered to the harmonious plasma cloud while shielding matter surrounding the intended path of incision from potential electromagnetic radiation exposure. The invention is an efficient, effective, safe, clean and inexpensive device which can be used to place an incision in matter.

The invention provides a laser welding device. The laser welding device comprises a laser welding system and a gas protection system. The gas protection system comprises a adapter, a gas pipe, a gas source, a flexibly bent plastic pipe and a nozzle, wherein the adapter is connected to a welding head of the laser welding system; the adapter is connected with one end of the gas pipe; the gas sourceis connected with the other end of the gas pipe; one end of the flexibly bent plastic pipe communicates with one end of the gas pipe; the nozzle is arranged at the other end of the flexibly bent plastic pipe; and a adiabatic transition tube is arranged at the other end of the flexibly bent plastic pipe, and the nozzle is arranged at the other end of the flexibly bent plastic pipe through the adiabatic transition tube. Compared with the prior art, the laser welding device has the beneficial effects that inert gas space is formed nearby a laser action region, protection of follow-up gas of a complex path is realized, plasma cloud above a welding region is effectively blown down, the coupling effect of a laser beam and a metallic work is improved, and a weld joint still in a high temperaturestate is effectively protected.

A method and apparatus for acquiring a nanostructured coating on a metal surface by using an intense shock wave generated by continuous explosion of a laser-induced plasma is provided. The method comprises: irradiating a laser beam on a black paint surface of an upper opening of a high pressure resistant glass pipe having a black paint strip arranged therein; the black paint absorbing the light energy and producing a plasma; generating an initial plasma explosion shock wave; transmitting the initial plasma explosion shock wave in the high pressure resistant glass pipe; generating a plasma cloud reaching a lower opening of a glass catheter; and, the shock wave pressure outputted embedding nanoparticles into a surface of a workpiece. The apparatus comprises the high pressure-resistant glass pipe with a zigzagging switchback shape or a spiral and inverted cone shape.

A system comprises a processing chamber for maintaining a hydrogen plasma at low pressure. The processing chamber has a long, wide, thin geometry to favor deposition of thin-film silicon on sheet substrates over the chamber walls. The sheet substrates are moved through between ends. A pair of opposing radio frequency electrodes above and below the workpieces are electrically driven hard to generate a flat, pancaked plasma cloud in the middle spaces of the processing chamber. A collinear series of gas injector jets pointed slightly up on a silane-jet manifold introduce 100% silane gas at high velocity from the side in order to roll the plasma cloud in a coaxial vortex. A second such silane-jet manifold is placed on the opposite side and pointed slightly down to further help roll the plasma and maintain a narrow band of silane concentration. A silane-concentration monitor observes the relative amplitudes of the spectral signatures of the silane and the hydrogen constituents in the roll-vortex plasma and outputs a process control feedback signal that is used to keep the silane in hydrogen concentration at about 6-7%.

The invention relates to a dynamic tunable microstrip antenna used in a complex radio-wave environment and a tuning method thereof. A dielectric sheet tuning part is covered on the whole surface of a dielectric substrate of the microstrip antenna, and an emission signal working frequency band or a resonance point of the microstrip antenna can be selected and fine-tuned by only performing online detection and adjustment on the thickness of the dielectric sheet tuning part; or voltage is loaded at the two ends of one dimension, two dimensions or three dimensions selected arbitrarily from the three-dimensional direction of the dielectric sheet tuning part, and dielectric constants in the corresponding directions can be adjusted in real time by changing the loading voltage so as to enable the dielectric constants to be positioned in a resonance frequency band of the microstrip antenna. A layer of plasma cloud tuning part for simulating an outer-layer spatial environment is further arranged on the dielectric sheet tuning part, and the emission signal working frequency band or the resonance point of the microstrip antenna can be selected and fine-tuned by only performing online detection and selection on the thickness of the plasma cloud tuning part. The dynamic tunable microstrip antenna disclosed by the invention can dynamically tune the working frequency of the microstrip antenna in the complex radio-wave environment and has the advantages of simple structure, convenience in operation, stability in working, low cost, easiness in construction and small volume.

The invention discloses a microwave plasma processing device, comprising a microwave source, a microwave circulator, a power regulator, a rectangular waveguide, a tuner, an antenna, a reaction box, a gas mixing system, and a vacuum system. The microwave source is connected to the microwave circulator, and the microwave The exit end of the circulator is connected to the rectangular waveguide, and the power conditioner is connected to the exit end of the microwave circulator and the microwave source respectively. The power conditioner adjusts the excitation power of the microwave source according to the microwave output power. A tuner is set on the side wall of the rectangular waveguide, and the reaction box is installed in the rectangular waveguide. On the side of the end of the waveguide, the antenna is inserted into the rectangular waveguide and the top of the reaction box, the gas mixing system injects the working medium gas into the reaction box, and the vacuum system evacuates the reaction box and maintains a vacuum state; the plasma cloud in the reaction box is subjected to electromagnetic force. Inner loop.

The invention relates to a dual-furnace-chamber garbage treatment device. The dual-furnace-chamber garbage treatment device comprises an upper furnace chamber and a lower furnace chamber which are arranged at the top and the bottom, wherein a feeding opening is formed in the upper furnace chamber; a residue discharging opening and an air opening are formed in one side of the lower furnace chamber;a gas waste heat recycling pipeline and a swirler are arranged on the other side of the lower furnace chamber; the gas waste heat recycling pipeline is connected with an air discharging opening of aninduced draft fan; an air outlet of the induced draft fan is connected with a chimney; a circular truncated cone-shaped plasma reactor is arranged in the upper furnace chamber; the reactor is composed of a plurality of trapezoidal reaction strips which are spliced in a staggered manner; gaps are reserved between adjacent reaction strips; gas outlets are formed in the upper parts of two side wallsof the upper furnace chamber; gas inlets are formed in the lower parts of the side walls; the gas inlets are connected with the gas outlets through circulation pipes. The dual-furnace-chamber garbagetreatment device has the beneficial effects that plasma cloud is generated and is used for cracking the garbage, the cracked combustible mixed gas can achieve secondary combustion, the fuel is saved,the cost and the time for treating the garbage are reduced, and the pollution-free discharge is achieved.

The invention discloses a method for identifying a deviation state of incident laser in an online manner. The method is used for carbon dioxide laser welding on metal plates which are of sandwich structures. The method includes shooting light-induced plasma cloud images by the aid of a high-speed camera in welding procedures; computing feature parameters of the plasma cloud images; computing process statistic quantities of the feature parameters of the images in set time periods; determining comprehensive indexes by the aid of a principle component analysis process; judging a position deviation degree of the incident laser according to the comprehensive indexes. The method has the advantages that the position deviation state of the incident laser can be accurately and quickly judged in the dioxide laser welding procedures for the metal plates which are of the sandwich structures, devices are simple, interference on the laser welding procedures can be prevented, and the method can be widely applied to the field of carbon dioxide laser welding on metal plates which are of sandwich structures.

The invention discloses a pulsed laser forming method of a thin-walled corrugated tube and a special device for realizing the method. The method comprises the following steps: a pulsed laser beam 4 acts on an energy absorbing layer 6 covered on the surface of a thin-walled tube 7 so as to produce plasma cloud; the plasma cloud further absorbs laser energy and explode, the detonation wave thus produced causes impact force facing the tube wall under the action of a bushing 5 of a restraint layer, and the thin-walled tube 7 is machined into a corrugated tube by virtue of the axial translation and rotation of the thin-walled tube 7. The special device for realizing the method is composed of a laser generator system, a laser head system, a workpiece system, a workbench system and a motion control system. By the method, the metal and alloy materials made from steel, aluminum, copper and the like can be machined, and the non-metallic materials such as silicon and the like can also be machined. The method is especially suitable for manufacturing parts of micro electromechanical systems such as a micro sensor, a micro compensator and a micro connector.

The invention relates to a method for plasma-assisted chemical vapour deposition for coating, or removing material from, the inner wall of a hollow body (42). A gas lance (44) is introduced into the hThe invention relates to a method for plasma-assisted chemical vapour deposition for coating, or removing material from, the inner wall of a hollow body (42). A gas lance (44) is introduced into the hollow body (42), and a cavity plasma (45) is formed by applying an electrical high-frequency field to a high-frequency electrode (41), forming a plasma cloud arranged on the tip of the gas lance.ollow body (42), and a cavity plasma (45) is formed by applying an electrical high-frequency field to a high-frequency electrode (41), forming a plasma cloud arranged on the tip of the gas lance.

A method and system for extracting radar scattering characteristic data based on plasma near-field testing. By adopting the ISAR imaging principle in a microwave anechoic chamber simulating a vacuum environment and using a one-dimensional scanning near-field testing method, the scattering performance test of the measured target is carried out. Obtain the near-field scattering two-dimensional image of the target under test, and use the near-field correction technology to correct the influence error of the spherical wave on the RCS performance test, and then use the scattering center to realize the far-field RCS extrapolation of the target under test, and obtain the radar of the target under test Scattering cross-section far-field data. This method of testing and data extraction can give the overall target radar cross-section data of the plasma-enveloped aircraft according to the special environment in which the plasma cloud is generated, as well as the unique diffusion and ionization characteristics of the plasma, and the test angles cover- With a wide angle range of 30° to 30°, the test accuracy is better than 2dB, thus providing an experimental method for plasma stealth technology research and stealth performance evaluation.

The composite material comprising one C substrate and one homogeneous compact W coating attached firmly on the C substrate. The C substrate is preferably of composite C / C material or graphite, and the W coating is formed through deposition with purified W plate as target. The present invention has the advantages of high W coating depositing speed, complete coating of all surfaces of C substrate with W coating formed by high density plasma cloud between the W target and the C substrate, compact W coating without crack, and well combination between the W coating and the C substrate.

The invention discloses a method for quickly estimating channel characteristics and communication performance of space plasma clouds, comprising the following steps: Step 1, calculating the effective area of ​​space plasma clouds; Step 2, estimating the maximum multipath time of space plasma clouds Extension: Step 3, Estimating the maximum Doppler frequency shift of the space plasma cloud: Step 4, Estimating the channel coherence bandwidth of the space plasma cloud: Step 5, Estimating the channel coherence time of the space plasma cloud: Step 6, Estimating the space plasma The maximum communication rate of the plasma cloud: step 7, estimate the communication bit error rate of the space plasma cloud. The method disclosed in the present invention provides an estimation method for channel characteristics and communication system performance including maximum multipath delay, maximum Doppler frequency shift, coherent bandwidth, coherent time, maximum communication rate and communication bit error rate , aiming at the particularity of space plasma cloud channel, it has certain quickness and effectiveness.