Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method and system for extracting radar scattering feature data based on plasma near-field testing

A characteristic data and radar scattering technology, applied in radio wave measurement system, radio wave reflection/re-radiation, measurement device, etc., can solve the problem of difficulty in obtaining performance data of plasma stealth targets, limited distance between the measured object and the measurement antenna, etc. question

Active Publication Date: 2018-04-20
BEIJING AEROSPACE INST OF THE LONG MARCH VEHICLE +1
View PDF5 Cites 22 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in plasma measurement, the distance between the measured object and the measuring antenna is always limited, and the electromagnetic waves incident on the test area are almost spherical waves, and the plasma will spread to the position of the antenna mouth. The existing RCS test method Difficult to obtain performance data on plasma stealth targets

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and system for extracting radar scattering feature data based on plasma near-field testing
  • Method and system for extracting radar scattering feature data based on plasma near-field testing
  • Method and system for extracting radar scattering feature data based on plasma near-field testing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0062] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0063] The present invention is a method and system for extracting radar scattering characteristic data based on plasma near-field testing. By adopting the ISAR imaging principle in a microwave anechoic chamber simulating a vacuum environment, and using a one-dimensional scanning near-field testing method, the scattering performance of the measured target is measured. Test, obtain the near-field scattering two-dimensional image of the target under test, and use the near-field correction technology to correct the influence error of the spherical wave on the RCS performance test, and then use the scattering center to realize the far-field RCS extrapolation of the target under test, and obtain the target under test Radar cross section far-field data. This method of testing and data extraction can provide the overall target radar cross-se...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A method and system for extracting radar scattering feature data based on plasma near-field testing are disclosed. An ISAR imaging principle is adopted in a microwave anechoic chamber simulating vacuum environment, and a one-dimensional scanning near-field test method is employed to test scattering performance of a tested target. A near-field scattering 2D image of the tested target is obtained, and near-field correction techniques are used to correct errors of influence error exerted by spherical waves on RCS performance tests. A scattering center is adopted to achieve far-field RCS extrapolation of the tested target, and radar scattering cross section far field data of the test target is obtained. Via the test and the data extraction method, overall target radar cross section data of a plasma-coated aircraft can be provided for a special environment that generates plasma clouds and for peculiar diffusion and ionization characteristics of plasma. A test angle covers a wide angle rangeof -30 degrees to 30 degrees, test accuracy is higher than 2dB, and therefore a test method is provided for plasma stealth technology research and stealth performance evaluation.

Description

technical field [0001] The invention relates to a method and system for extracting radar scattering characteristic data based on plasma near-field testing, and belongs to the technical field of plasma stealth performance testing. Background technique [0002] Plasma has the characteristics of ionization, diffusibility, and easy flow. When electromagnetic waves propagate in plasma, electromagnetic waves will interact with ions and electrons in plasma, showing reflection, refraction, absorption and other effects. By wrapping the plasma around the object, the radar scattering characteristics of the object to electromagnetic waves can be changed. Therefore, the plasma can be used for the radar stealth of the object. [0003] How to obtain radar scattering characteristic data of plasma-coated objects is an urgent problem to be solved in the field of stealth testing technology. Due to the diffusion characteristics and easy flow of plasma, after the plasma source generates plasma,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01S13/90G01S7/41
CPCG01S7/411G01S13/904G01S13/9064G01S13/9017
Inventor 王明亮刘佳琪莫锦军白文浩邬润辉张生俊艾夏穆磊王伟东刘鑫刘洪艳高路赵巨岩周岩龚晓刚
Owner BEIJING AEROSPACE INST OF THE LONG MARCH VEHICLE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com