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193 results about "Particle source" patented technology

Particle Source. The particle source provides the particles that are to be accelerated. Particles can be electrons, protons, positrons (the first antimatter particle -- like an electron, but positively charged), ions, and nuclei of heavy atoms such as gold.

On site programmable gate array single particle effect test method

InactiveCN101458299ATest accurateEliminate external interferenceContactless circuit testingTest roomGate array
The invention provides a test method for field programmable gate array single particle effect, relating to an integrated circuit technology. The invention comprises the following steps: 1) the package of FPGA is removed, and FPGA is arranged on a test circuit board; 2) FPGA is configured, and then SRAM data are read back and recorded; 3) the test circuit board is arranged in a test room and a particle source emits single particles to bombard FPGA; 4) SRAM data are read back and recorded; 5) data of steps 2) and 4) are compared, and reversed digits of SRAM are determined; 6) when the reversal times reach a preset value or after the period of time without reversal reaches a preset time value, the particle source is changed, FPGA is electrified again, the FPGA is confirmed to return to the initial state, and then steps 3) and 5) are repeated; 7) the data are processed: the reversal section of the LET value is calculated and a reversal curve is generated. The method can precisely test the impact of the single particle effect and eliminate external interferences, thus ensuring the correction and reliability of the test results.
Owner:CHENGDU SINO MICROELECTRONICS TECH CO LTD

Beam Transport System and Method for Linear Accelerators

InactiveUS20090224700A1Great kinetic energyLinear acceleratorsTransport systemParticle beam
A charged particle beam transport system and method for linear accelerators includes a lens stack having two electrodes serially arranged along an acceleration axis between a charged particle source, and a linear accelerator. After producing and extracting a bunch of charged particles (i.e. particle beam) from the particle source, a voltage difference between the two electrodes is ramped in time to longitudinally compress the particle beam to be shorter than the pulsewidth of acceleration pulses produced in the accelerator. Additional electrodes may be provided in the lens stack for performing transverse focusing of the charged particle bunch and controlling a final beam spot size independent of the current and energy of the particle beam. In a traveling wave accelerator embodiment having a plurality of independently switchable pulse-forming lines, beam transport can also be controlled by triggering multiple adjacent lines simultaneously so that the physical size of the accelerating electric field is longer than the charged particle bunch, as well as by controlling trigger timing of the pulse-forming lines to perform alternating phase focusing.
Owner:LAWRENCE LIVERMORE NAT SECURITY LLC

Particle beam system having a mirror corrector

The invention relates to a particle beam system comprising a particle source (1), a mirror corrector (9, 21 to 25), and an objective lens (16). The mirror corrector comprises an electrostatic mirror (9) and a magnetic beam deflector (21, 22, 23, 24, 25), which is arranged between the particle source (1) and the electrostatic mirror (9) as well as between the electrostatic mirror (9) and the objective lens (16). The magnetic beam deflector (21, 22, 23, 24, 25) is free from dispersion for each single pass. The magnetic beam deflector (21, 22, 23, 24, 25) also comprises quadrupoles and / or quadrupole components, which are provided in such a manner that a maximum of two planes, which are conjugated with regard to the diffraction plane (28) of the objective lens (16), occur on the entire path length between the first outlet from the magnetic beam deflector (21, 22, 23, 24, 25) and from the objective lens (16).
Owner:LEO ELEKTRONENMIKROSKOPIE

Lithium ion battery cathode material of which nano particles embedded into carbon nanosheet and preparation method of lithium ion battery cathode material

The invention discloses a lithium ion battery cathode material of which nano particles are embedded into a carbon nanosheet and a preparation method of the lithium ion battery cathode material, which belong to the technical field of electrochemistry. According to the method, water-soluble organic matter (glucose, saccharose, fructose, citric acid, sodium citrate and the like) is used as a carbon source, commercial submicron particles (such as metallic tin, stibium, germanium, nonmetallic silicon and the like) are used as a particle source, sodium chloride is used as a template, the carbon source, the submicron particles and the sodium chloride are added into a ball milling tank for ball milling according to a proper proportion, and a mixture is dried and calcined. A simple ball milling method and a pyrolysis method are used for preparing the lithium ion battery cathode material of which the nano particles are uniformly embedded into the carbon nanosheet. According to the lithium ion battery cathode material of which the nano particles are uniformly embedded into the carbon nanosheet, the specific surface area is large, the surface is of a porous structure, the preparation method is simple, and the lithium ion battery cathode material has good circulation and rate performance.
Owner:GUANGXI NORMAL UNIV

Non-contact angle measuring apparatus, mission critical inspection apparatus, non-invasive diagnosis/treatment apparatus, method for filtering matter wave from a composite particle beam, non-invasive measuring apparatus, apparatus for generating a virtual space-time lattice, and fine atomic clock

A non-contact angle measuring apparatus includes a matter-wave and energy (MWE) particle source and a detector. The MWE particle source is used for generating boson or fermion particles. The detector is used for detecting a plurality peaks or valleys of an interference pattern generated by 1) the boson or fermion particles corresponding to a slit, a bump, or a hole of a first plane and 2) matter waves' wavefront-split associated with the boson or fermion particles reflected by a second plane, wherein angular locations of the plurality peaks or valleys of the interference pattern, a first distance between a joint region of the first plane and the second plane, and a second distance between the detector and the slit are used for deciding an angle between the first plane and the second plane.
Owner:KEN WENG DAH +1
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