40 results about "Plasma column" patented technology

The invention is directed to an arrangement for monitoring the energy radiated by an EUV radiation source with respect to energy variations acting in an illumination beam path, wherein the radiation source has a plasma column emitting extreme ultraviolet radiation. The arrangement includes an energy monitoring unit, and a detection beam path. The detection beam path is separate from the illumination beam path and is arranged with the energy monitoring unit for detecting pulse energy, so that the illumination beam path is not impaired by the energy measurement. The detection beam path is matched to the illumination beam path with respect to bundle extension and optical losses.

An example particle accelerator includes a coil to provide a magnetic field to a cavity; a particle source to provide a plasma column to the cavity; a voltage source to provide a radio frequency (RF) voltage to the cavity to accelerate particles from the plasma column, where the magnetic field causes particles accelerated from the plasma column to move orbitally within the cavity; an enclosure containing an extraction channel to receive the particles accelerated from the plasma column and to output the received particles from the cavity; and a structure arranged proximate to the extraction channel to change an energy level of the received particles.

The invention relates to a device for producing novel plasma photonic crystal with five refractive indexes and a method for producing the novel plasma photonic crystal with five refractive indexes. The discharging condition is that the thickness of a discharging gap is 2.0mm, impressed voltage is 3.5-5.1kV, frequency is 55-60kHz, discharging gas is 99.1%-99.9%Ar, the remainder is air, air gap pressure is 0.6-0.8atm, temperature range is 285-320K, and humidity range is 70%-90%. According to the device and method, the conditions of the discharging gap, the impressed voltage amplitude and frequency, the content of argon and the like are changed, while the size of a water electrode is optimized, a temperature control adjusting device and a humidity control adjusting device are added, and four types of plasma channels formed by a plasma sheet, a thick plasma column and two types of plasma columns are obtained. The novel plasma photonic crystal structure with the five refractive indexes is formed by the plasma channels and a periodic arrangement self-organization in a non-discharging area. The novel plasma photonic crystal structure is more complex and has wider application prospects.

The invention discloses a generation method and device of a Z-pinch shell plasma column. The device comprises a vacuum plasma target chamber, a pulse current generator, an annular laser spot generation device and a digit delay generator, wherein a load high-voltage electrode and a load ground electrode matched with the load high-voltage electrode are installed inside the vacuum plasma target chamber; a hole is formed in the load ground electrode; a transparent window is formed in the wall of the vacuum plasma target chamber; the load high-voltage electrode, the hole in the load ground electrode and the transparent window are coaxially arranged; the pulse current generator and the input end of the annular laser spot generation device are connected with the digit delay generator; the output end of the pulse current generator is connected with the load high-voltage electrode; a light outlet of the annular laser spot generation device and the transparent window are coaxially arranged. The method and device avoid an uneven structure and the like of a guide plasma caused in the process of forming the shell plasma column through cold and solid materials, and at the same time, the load structure is simpler, installation is convenient, and parameters are adjusted conveniently.

An electron-beam induced plasmas is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.

The present invention discloses a programmable plasma dielectric antenna. The antenna comprises a patch antenna and a dielectric resonator. The dielectric resonator comprises at least two layers of solid-state FR-4 dielectrics, wherein the solid-state FR-4 dielectrics are arranged in an up-and-down manner; and multiple gas-state plasma column dielectrics. An upper layer FR-4 dielectric is provided with at least two upper layer FR-4 dielectric perforations, a lower layer FR-4 dielectric is provided with at least two lower layer FR-4 dielectric perforations, the plasma column dielectrics are embedded in the upper layer FR-4 dielectric perforations and the lower layer FR-4 dielectric perforations, and each of the upper layer plasma column dielectrics and lower layer plasma column dielectrics is connected with an excitation power supply via control lines separately. By using a double terminal excitation mode controlled by an independent power supply, excitation states of every plasma column dielectric are controlled; voltages of every excitation power supply are changed to control plasma frequency of the plasma column dielectrics, so that the reconstruction of the working state and frequency of the programmable plasma dielectric antenna is realized. The programmable plasma dielectric antenna has the advantages of simple structure, easiness for mass production, adjustable frequency and unlimited working bandwidth.

An example particle accelerator includes the following: a voltage source to provide a radio frequency (RF) voltage to a cavity to accelerate particles from a plasma column, where the cavity has a magnetic field causing particles accelerated from the plasma column to move orbitally within the cavity; an extraction channel to receive the particles accelerated from the plasma column and to output the received particles from the cavity; and a regenerator to provide a magnetic field bump within the cavity to thereby change successive orbits of the particles accelerated from the plasma column so that, eventually, particles output to the extraction channel. The magnetic field is at least 6 Tesla and the magnetic field bump is at most 2 Tesla.

The invention relates to a tunable optical switch based on array plasma columns. The tunable optical switch based on the array plasma columns solves the technical problems that Fano resonance frequency is uncontrollable and the adjustable degree of freedom is small when Fano resonance is adjusted through geometric parameters, so that the optical switch can realize continuous dynamic adjustabilityof a resonance peak without changing the structural geometric parameters, and a multi-threshold optical switch is realized. The tunable optical switch based on the array plasma columns adopts a technical scheme that the tunable optical switch comprises a super surface with the thickness being less than the working wavelength, the super surface is in a regular geometric shape, and at least three plasma columns are distributed in the super surface in parallel at equal intervals; the plasma columns are made of a cladding quartz tube and filled inert gas; and a Mie scattering coefficient of a single plasma column is obtained by using a Mie scattering theory so as to determine the Mie resonance frequency, then the plasma columns are arrayed to obtain Bragg scattering, and the Mie scattering andthe Bragg scattering are enabled to interfere with each other to generate a Fano resonance phenomenon. The tunable optical switch based on the array plasma columns solves the problems well, and can be applied to the field of optical switches.

The invention provides a microplasma photonic crystal for reflecting, transmitting and/or storing incident electromagnetic energy includes a periodic array of elongate microtubes confining microplasma therein and having a column-to-column spacing, average electron density and plasma column diameter selected to produce a photonic response to the incident electromagnetic energy entailing the increase or suppression of crystal resonances and/or shifting the frequency of the resonances. The crystal also includes electrodes for stimulating microplasma the elongated microtubes Electromagnetic energy can be interacted with the periodic array of microplasma to reflect, transmit and/or trap the incident electromagnetic energy.