448 results about "Coating deposition" patented technology

A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.

A process for the thermal deposition coating of a workpiece, said process comprising the steps of: (c) thermally depositing a coating on a metallic surface of a workpiece from a deposition head wherein at least one condition selected from the group of: coating deposition rate onto said surface, relative motion between the surface and said deposition head, and cryogenic coolant application rate onto said workpiece is controllable; (d) substantially simultaneously measuring temperatures at a plurality of locations over the metallic surface of the workpiece; (c) determining an average temperature of the temperatures measured in step (b); (d) comparing the average temperature to a preselected minimum temperature and a preselected maximum temperature for the workpiece; and (e) adjusting at least one of the controllable conditions if said average temperature is not between the preselected minimum temperature and the preselected maximum temperature for the workpiece. Standard deviations of all temperature readings and controlling the relative motion speed between the thermal coating deposition head and the workpiece provide another improvement for obtaining temperature uniformity over the workpiece surface.

A method and apparatus for ultrasonic assisted deposition of a release agent onto a workpiece is disclosed. The release agent can be any fluorinated or non-fluorinated phosphorous-containing organic acid. The workpiece can be any workpiece desired to be coated with the release agent, such as a surface needing an anti-stick coating required in a plastic casting or injection mold. Metal oxide workpiece surfaces strongly bond to fluorinated phosphorus-containing organic acids. In particular, the present invention can deposit anti-stick coatings onto smooth or porous surfaces, such as anodized aluminum and its alloys, using ultrasonic assisted deposition

A low-temperature friction-based coating method termed friction stir fabrication (FSF) is disclosed, in which material is deposited onto a substrate and subsequently stirred into the substrate using friction stir processing to homogenize and refine the microstructure. This solid-state process is capable of depositing coatings, including nanocrystalline aluminum and/or metal matrix composites and the like, onto substrates such as aluminum at relatively low temperatures. A method of making rod stock for use in the FSF process is also disclosed.

The present invention relates to methods, devices, and coatings, wherein active agent release is determined by deposition rate of a coating or material. In an embodiment, the invention includes a method for coating a medical device, including identifying active agent elution rates for a coating composition applied to substrates at a plurality of coating deposition rates, selecting one of the coating deposition rates, and applying the coating composition to the medical device at the selected deposition rate. In an embodiment, the invention includes a combination including a medical device and a composition for coating the surface of a medical device with an active agent in a manner that permits the coated surface to release the active agent over time when implanted in vivo.

This invention provides an artificial sphincter including a component coated on at least one contacting surface with a polymeric material, the polymeric coating adapted to expand and return to an original configuration and to prevent or inhibit wear or abrasion of the contacting surface. The polymeric material is parylene in some embodiments. The component adapted for inflation and deflation may be a cuff formed from silicon and adapted to surround a urethra or a rectum. Also provided by the present invention is a method of depositing a coating to a surface of an inflatable component by providing a vacuum chamber system having an inner chamber positioned within an outer chamber. At least one coating material is introduced into at least one of the inner and outer chambers to deposit a coating onto an exposed surface of the component. This invention also provides methods of masking portions of surfaces of an inflatable component to prevent a coating from being deposited on the masked portion.

The present invention provides a method for the formation of an organic coating on a substrate. The method includes: providing a substrate in a vacuum; providing at least one vaporized organic material comprising at least one component from at least one source, wherein the vaporized organic material is capable of condensing in a vacuum of less than about 130 Pa; providing a plasma from at least one source other than the source of the vaporized organic material; directing the vaporized organic material and the plasma toward the substrate; and causing the vaporized organic material to condense and polymerize on the substrate in the presence of the plasma to form an organic coating.

The present invention is directed towards the holding of medical devices during manufacture to enable the application of therapeutic and/or protective coatings. More specifically, the present invention provides medical device holders that securely retain stents and other medical devices during the application of a coating while minimizing compressive and tensile forces applied to the stents. The invention avoids disruptions to coating quality due to holder blockage during coating deposition. The invention discloses an improved device containing a mandrel and frame that may improve coating uniformity by eliminating shadowing from the frame of the medical device holder when applying coatings to stents and other medical devices.

The invention relates to a CrTiAlSiN nano composite coating, a cutter deposited with the same and a preparation method thereof. The composite coating comprises a bonding layer, a supporting layer and a main wear layer, wherein the bonding layer consists of Cr, the supporting layer consists of CrN, and the main wear layer is a CrSiN/TiAlSiN nano multilayered composite coating formed by alternating CrSiN layers and TiAlSiN layers or an nc-CrTiAlN/a-Si3N4 nanocrystalline composite coating formed by embedding nanocrystalline CrTiAlN into amorphous Si3N4. The bonding layer is deposited on a cutter matrix, and then the supporting layer and the main wear layer are deposited to obtain the cutter deposited with the coating. The obtained CrTiAlSiN nano composite coating has the advantages of high hardness, low friction coefficient and strong adhesive force; and the cutter deposited with the coating has higher surface hardness, stronger film-matrix adhesive force and good wear-resisting property and high temperature resistance.

Methods and coaters for applying films onto a substrate (e.g., a large-area glass substrate) are disclosed. Certain embodiments involve a coater for applying thin films onto a sheet-like substrate. The coater in some embodiments has a transport system adapted for conveying the substrate along a path of substrate travel extending through the coater. The substrate transport system in certain embodiments includes an upward coating deposition gap. The coater preferably has a source of coating material adapted for delivering coating material upwardly through such gap and onto a bottom major surface of the substrate as the substrate is conveyed along a desired portion of the path of substrate travel, which portion of the path of substrate travel extends over the upward coating deposition gap.

We disclose a method of applying a sculptured layer of material on a semiconductor feature surface using ion deposition sputtering, wherein a surface onto which the sculptured layer is applied is protected to resist erosion and contamination by impacting ions of a depositing layer, said method comprising the steps of: a) applying a first portion of a sculptured layer with sufficiently low substrate bias that a surface onto which said sculptured layer is applied is not eroded away or contaminated in an amount which is harmful to said semiconductor device performance or longevity; and b) applying a subsequent portion of said sculptured layer with sufficiently high substrate bias to sculpture a shape from said the first portion, while depositing additional layer material. The method is particularly applicable to the sculpturing of barrier layers, wetting layers, and conductive layers upon semiconductor feature surfaces and is especially helpful when the conductive layer is copper. In the application of a barrier layer, a first portion of barrier layer material is deposited on the substrate surface using standard sputtering techniques or using an ion deposition plasma, but in combination with sufficiently low substrate bias voltage (including at no applied substrate voltage) that the surfaces impacted by ions are not sputtered in an amount which is harmful to device performance or longevity. Subsequently, a second portion of barrier material is applied using ion deposition sputtering at increased substrate bias voltage which causes resputtering (sculpturing) of the first portion of barrier layer material, while enabling a more anisotropic deposition of newly depositing material. A conductive material, and particularly a copper seed layer applied to the feature may be accomplished using the same sculpturing technique as that described above with reference to the barrier layer.