The invention relates to a method for photoengraving a graphical
sapphire substrate. The method comprises the following steps of: carrying out
spin coating treatment on a substrate to be photoengraved; aligning and mounting a
mask plate and the substrate and setting a projection ratio for projecting a graph of the
mask plate to the substrate through a lens control module; regionally projecting and exposing in the projection ratio according to the preset
exposure conditions; and developing and
processing the substrate. The invention also relates to a
system for photoengraving the graphical substrate, comprising a
spin coating module for carrying out the
spin coating treatment on the substrate to be photoengraved, a
mask mounting module for aligning and mounting the mask plate and the substrate, the lens control module for setting the projection ratio for projecting the graph of the mask plate to the substrate, an
exposure module for regionally projecting and exposing in the projection ratio according to the preset
exposure conditions and a developing module for developing and
processing the substrate. The method and the
system provided by the invention photoengrave the graphical substrate through
graphical projection in a non-
contact mode and avoid the defects of
low resolution, low production efficiency and low graphical consistency of the
system for photoengraving and exposing the graphical substrate.