45results about How to "Reduce standing wave effect" patented technology

Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused reflection of lower film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

A magnetic head incorporates: a medium facing surface; a coil; a pole layer; first and second shields disposed to sandwich the pole layer therebetween; a first gap layer disposed between the first shield and the pole layer; a second gap layer disposed between the second shield and the pole layer; and a substrate. The first shield is located closer to the substrate than the second shield. The magnetic head further incorporates an antireflection film disposed between the first shield and the first gap layer or between the first gap layer and the pole layer. The pole layer is formed by frame plating.

Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

The present invention relates to a fluoropolymer for photoresist, a top anti-reflection film composition comprising the same, and its application in photoresist. The structural formula of the fluoropolymer for photoresist is as follows: CF2(CF3)CF2-[O-CF(CF3)CF2]n-O-CF(CF3)COO-R, wherein n is in the range of 1-8 , R is one or more of H, NH4 or other similar structures; based on the weight of the whole polymer, the content a of the polymer component with n≦1 is 0-12%, and the polymer group with n is 2 The content b of the component is 55-80%, the content c of the polymer component where n is 3 is 15-30%, the content d of the polymer component where n is 4 is 0-15%, and the polymer with n≥5 The content e of the component is 0-8%, and b+c≥80%, and a, d and e are 0 at the same time or any one of them is 0 or not 0 at the same time. In the present invention, by controlling the content distribution of polymer components with different molecular weights in the fluoropolymer, a fluoropolymer that meets the specific composition requirements of the present invention is obtained. The fluoropolymer is easy to degrade, has low toxicity, is environmentally friendly, and can be used for A top antireflection with a lower index of refraction is prepared.

The invention discloses a plane Faraday shielding system for restraining the parasitic capacitive coupling during discharge of the RF inductive coupling. The characteristic is that it's composed of two parts, which is embedded in the plane Faraday shielding and embedded ignition breakdown. The Faraday shield has a type of two-piece separations with a comb-shaped structure in the crack of metal pieces. The breakdown voltage is induced by the coupling antenna, and set to the ignition electrode through RF resonance and network-controlling. An unbalanced magnetron configuration composed of a group of permanent magnets enhances ignition and discharge, and transports plasma to the discharge zone.

The objective of the present invention is to provide a resin for forming an upper antireflective film and a composition for forming an upper antireflective film that can reduce a standing wave effect satisfactorily and lead excellent solubility in an alkaline developer in lithography and a method for forming a resist pattern. Specifically, the resin for forming an upper antireflective film has at least one unit selected from a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), has a weight average molecular weight of 1,000 to 100,000 as measured by GPC method, and is soluble in an alkaline developer. (In the formulae (1) and (2), R1 to R14 independently represent a hydrogen atom, —OH, —COOH or —SO3H, provided that all of R1 to R7 or R8 to R14 do not represent a hydrogen atom in a molecule.)

The invention provides a PECVD apparatus. The apparatus comprises a cavity, a wafer carrier, a plurality of radio frequency electrodes, a transmission device and a lifting device. The cavity is provided with a gas inlet and a gas outlet, and is also provided with a first transmission hole and a second transmission hole; the wafer carrier includes a plurality of carrying plates vertically arranged in a spaced manner along a fore-and-aft direction, and the wafer carrier can vertically move between an upper portion position and a lower portion position in a reaction chamber; and the radio frequency electrodes are arranged at the top of the reaction chamber and are perpendicular to the top surface, the radio frequency electrodes are arranged in a spaced manner along a fore-and-aft direction, and the radio frequency electrodes are correspondingly inserted into a space between adjacent carrying plates when the wafer carrier is positioned in the upper position of the reaction chamber. The PECVD apparatus has the advantages of productivity increase, occupied area reduction, processing difficulty and cost reduction, weakening of the standing wave effect on the radio frequency electrodes, and film surface quality improvement.

The invention discloses an inductive coupling plasma coil which comprises two groups of radio-frequency coils formed in a back-bending mode. A plane S-shaped parallel connection way is adopted in space structures of two groups of the radio-frequency coils, and two groups of the radio-frequency coils are strictly symmetrical in space distribution so that the directions of radio frequency current of the same coil position are the same. The invention further discloses an inductive coupling plasma injection device provided with the inductive coupling plasma coil. According to the inductive coupling plasma coil and the injection device, on one hand, standing wave effect in the coil can be reduced and uniformity of plasma can be increased, and on the other hand, impedance matching can be well achieved, coupling effect of the plasma is increased, the probability of chip pollution caused by sputtering of a quartz window due to over-high voltage is lowered, the uniform high-density plasma of a large area can be generated in a reaction cavity of a large area, and therefore requirements of laboratory rooms and industry in the micro electronics field are met.

The invention provides a plasma processing device. The device comprises a first pole plate and a second pole plate which are oppositely arranged, wherein the first pole plate comprises a plurality of first sub-pole plates; gaps are arranged among the first sub-pole plates; the first sub-pole plates are respectively connected with a plasma excitation power supply; the second pole plate comprises a plurality of second sub-pole plates; the second sub-pole plates correspond to the first sub-pole plates one to one; gaps are arranged among the second sub-pole plates; and the shapes of the second sub-pole plates are the same as or similar to the shapes of the corresponding first sub-pole plates and the centers of the second sub-pole plates align with the centers of the first sub-pole plates. The device has the following advantages: the standing wave effects of the sub-pole plates can be reduced; and meanwhile, the problem of poorer uniformity of the airflow from the centers to the edges of the large-area pole plates can be avoided.

Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

Provided is a reflector topological structure-based acoustochemical treatment device for attenuating the standing wave effect. The acoustochemical treatment device includes an acoustochemical reactionvessel, wherein ultrasonic arrays are adhered to a bottom surface A of the acoustochemical reaction vessel and two side surfaces B and C, which are arranged perpendicular to the bottom surface A andintersect the bottom surface A, of the acoustochemical reaction vessel; ultrasonic radiation surfaces are formed by the bottom surface A and the two side surfaces B and C, and reflectors are installedon three ultrasonic reflection surfaces F, D and E which are arranged opposite to the three ultrasonic radiation surfaces A, B and C; the reaction vessel can be made according to the height of the reflector topological structure so as to radiate waves with an integral multiple of a quarter of the wavelength of ultrasonic waves, so that the wave loop of a standing wave which spreads in the direction of the ultrasonic radiation is overlapped with the wave; a liquid level sensor is installed inside the reaction vessel, and a single-chip microcomputer is used for controlling switching valves of aliquid inlet and liquid outlet of the reaction vessel and controlling the volume of reaction liquid in the sealed reaction vessel and the ultrasonic processing time. Through the reflector topologicalstructure-based acoustochemical treatment device for attenuating the standing wave effect, the intensity and distribution of a sound field in the reaction vessel can be improved obviously, the standing wave effect can be attenuated effectively, and the efficient treatment of the reaction liquid or to-be-processed products can be achieved.