The invention relates to a method to generate three
refraction rates
plasma photonic crystal, which uses the following
discharge device to reach the goal: the basic structure of
discharge device includes two symmetric closed
dielectric containers, and between the two containers setting the
discharge gap, in the containers, setting discharge
electrode fuses, and importing the water into the containers to form the discharge electrodes; by changing the discharge conditions, including changing the applied
voltage frequency and amplitude, and the discharge gap shape border and
aspect ratio, discharging will produce three
refraction rates
plasma photonic crystal structure with different cycles, and different lattice constants. Since the
electronic density in the
plasma channel has the three orders of 1015cm, theoretical studies indicating that such high
electronic density is enough to enable the plasma
photonic crystal having
band gap structure, to prevent the spread of certain frequency lights, and having frequency-selective optical switching function, which has a broad application prospects in the industrial field.